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    Inductive plasma processor having coil with plural windings and method of controlling plasma density
    13.
    发明授权
    Inductive plasma processor having coil with plural windings and method of controlling plasma density 有权

    公开(公告)号：US07096819B2

    公开(公告)日：2006-08-29

    申请号：US09821027

    申请日：2001-03-30

    申请人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    发明人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    IPC分类号： C23C16/00 ,  H01L21/00

    CPC分类号： H01J37/32174 ,  H01J37/321

    摘要： An inductive plasma processor includes a multiple winding radio frequency coil having plural electrically parallel, spatially concentric windings (1) having different amounts of RF power supplied to them, and (2) arranged to produce electromagnetic fields having different couplings to different regions of plasma in the chamber to control plasma flux distribution incident on a processed workpiece. The coil is powered by a single radio frequency generator via a single matching network. Input and output ends of each winding are respectively connected to input and output tuning capacitors. In a first embodiment, the location of maximum inductive coupling of the radio frequency to the plasma and the current magnitude in each winding are respectively mainly determined by values of the output and input capacitors. By adjusting all the input and output capacitors simultaneously, the current to a winding can be varied while the current to the other winding can be maintained constant as if these windings were completely de-coupled and independent. Therefore, the capacitors can control the plasma density in different radial and azimuthal regions. In another embodiment, a relatively low frequency drives the coil whereby each winding has a relatively short electrical length, causing substantially small standing wave current and voltage variations. The output capacitor for each winding adjusts current magnitude, to eliminate the need for the input capacitors and reduce operational complexity.

    High-resolution variable optical attenuator with mechanical adjustment
    14.
    发明授权
    High-resolution variable optical attenuator with mechanical adjustment 失效

    公开(公告)号：US06580868B2

    公开(公告)日：2003-06-17

    申请号：US09812358

    申请日：2001-03-19

    申请人： Jian J. Chen ,  Jianhua Wang

    发明人： Jian J. Chen ,  Jianhua Wang

    IPC分类号： G02B600

    CPC分类号： G02B26/02 ,  G02B6/266

    摘要： A mechanically-adjustable variable optical attenuator includes a beam attenuator shaped as a concave quasi-cone. The beam attenuator has a sharp tip and a base, and can be rotationally symmetric with respect to a central axis extending between the tip and the base. The beam attenuator is positioned with its central axis perpendicular to the direction of the light beam to be attenuated. The extent of the beam attenuator obstructing the light beam is varied by moving the beam attenuator into and out of the light beam. The inwardly-curving, quasi-cone shape of the beam attenuator allows achieving a high resolution while limiting the beam attenuator size.

    Use of acid washing to provide purified silicon crystals
    16.
    发明授权
    Use of acid washing to provide purified silicon crystals 有权
    使用酸洗提供纯化的硅晶体

    公开(公告)号：US08480991B2

    公开(公告)日：2013-07-09

    申请号：US12670263

    申请日：2008-07-23

    申请人： Scott Nichol ,  Jian J. Chen

    发明人： Scott Nichol ,  Jian J. Chen

    IPC分类号： C01B33/02

    CPC分类号： C30B9/10 ,  C01B33/037 ,  C30B29/06

    摘要： A method for purifying silicon wherein silicon is crystallized from a solvent metal. The method comprises the steps of providing a molten liquid containing silicon, a solvent metal and impurities, cooling the molten liquid to form first silicon crystals and a first mother liquor, separating the first silicon crystals from the first mother liquor, contacting the first silicon crystals with compound which will dissolve the first mother liquor and separating the washed crystals from the wash solution.

    摘要翻译： 一种纯化硅的方法，其中硅从溶剂金属中结晶。 该方法包括以下步骤：提供含有硅，溶剂金属和杂质的熔融液体，冷却熔融液体以形成第一硅晶体和第一母液，将第一硅晶体与第一母液分离，使第一硅晶体 用化合物溶解第一母液并将洗涤的晶体与洗涤溶液分离。

    Tilted-translation variable optical attenuator
    19.
    发明授权
    Tilted-translation variable optical attenuator 失效
    倾斜变换光衰减器

    公开(公告)号：US06904223B1

    公开(公告)日：2005-06-07

    申请号：US10408073

    申请日：2003-04-04

    申请人： Zuyun Fang ,  Jianhua Wang ,  Jian J. Chen

    发明人： Zuyun Fang ,  Jianhua Wang ,  Jian J. Chen

    IPC分类号： G02B6/00 ,  G02B6/26

    CPC分类号： G02B6/266

    摘要： In a preferred embodiment, a motorized variable optical attenuator comprises an input fiber collimator; an output fiber collimator disposed substantially along the first collimator; and a right-angle reflector movable relative to the input collimator and the output collimator along a translation direction forming a non-zero angle with a direction of a light beam emitted by the input collimator. The reflector comprises two mutually-perpendicular reflective surfaces for sequentially reflecting the light beam emitted by the input collimator to the output collimator. A variable attenuation imparted by the attenuator on the light beam is determined by a position of the reflector relative to the input collimator and the output collimator, along the translation direction. The reflector preferably comprises a right-angle prism adhered to a nut mounted on a threaded axle driven by a stepper motor. The attenuator can achieve stable, ripple-free attenuation characteristics at insertion losses beyond −40 dB.

    摘要翻译： 在优选实施例中，电动可变光衰减器包括输入光纤准直器; 基本上沿着所述第一准直仪设置的输出光纤准直器; 以及直角反射体，其相对于输入准直器和输出准直器沿着与由输入准直仪发射的光束的方向成非零角度的平移方向移动。 反射器包括两个相互垂直的反射表面，用于将由输入准直仪发射的光束顺序反射到输出准直器。 由衰减器在光束上赋予的可变衰减由反射器相对于输入准直仪和输出准直器沿平移方向的位置确定。 反射器优选地包括附接到安装在由步进马达驱动的螺纹轴上的螺母的直角棱镜。 衰减器可以在插入损耗超过-40 dB时实现稳定的无纹波衰减特性。

    Chamber configuration for confining a plasma
    20.
    发明授权
    Chamber configuration for confining a plasma 有权

    公开(公告)号：US06872281B1

    公开(公告)日：2005-03-29

    申请号：US09676269

    申请日：2000-09-28

    申请人： Jian J. Chen ,  Mukund Srinivasan ,  Eric H. Lenz

    发明人： Jian J. Chen ,  Mukund Srinivasan ,  Eric H. Lenz

    IPC分类号： H05H1/46 ,  B01J19/08 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065 ,  C23C16/00 ,  C23F1/00

    CPC分类号： H01J37/32871 ,  H01J37/32082 ,  H01J37/32623

    摘要： A plasma confining assembly for minimizing unwanted plasma formations in regions outside of a process region in a process chamber is disclosed. The plasma confining assembly includes a first confining element and second confining element positioned proximate the periphery of the process region. The second confining element is spaced apart from the first confining element. The first confining element includes an exposed conductive surface that is electrically grounded and the second confining element includes an exposed insulating surface, which is configured for covering a conductive portion that is electrically grounded. The first confining element and the second confining element substantially reduce the effects of plasma forming components that pass therebetween. Additionally, the plasma confining assembly may include a third confining element, which is formed from an insulating material and disposed between the first confining element and the second confining element, and proximate the periphery of the process region. The third confining element further reduces the effects of plasma forming components that pass between the first confining element and the second confining element.