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11.发明授权Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors 有权用于将基底暴露于紫外线辐射同时监测UV源和反射器的劣化的装置和方法公开(公告)号：US07589336B2
公开(公告)日：2009-09-15
申请号：US11686897
申请日：2007-03-15
IPC分类号： C23C16/453 , B05C11/10
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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12.发明申请APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION USING A REFLECTOR HAVING BOTH ELLIPTICAL AND PARABOLIC REFLECTIVE SECTIONS 有权使用具有两个ELLIPTICAL和PARABOLIC反射部分的反射器将基板暴露于紫外线辐射的装置和方法公开(公告)号：US20120003398A1
公开(公告)日：2012-01-05
申请号：US12976746
申请日：2010-12-22
申请人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
发明人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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13.发明授权Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections 有权使用具有椭圆形和抛物面反射部分的反射器将衬底暴露于UV辐射的装置和方法公开(公告)号：US07909595B2
公开(公告)日：2011-03-22
申请号：US11686901
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
发明人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
IPC分类号： B29C35/08
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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14.发明授权Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors 有权使用不对称反射器将基板暴露于UV辐射的装置和方法公开(公告)号：US07692171B2
公开(公告)日：2010-04-06
申请号：US11686900
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Tom K. Cho , Hichem M'Saad , Scott A. Hendrickson , Dustin W. Ho , Thomas Nowak
发明人： Andrzei Kaszuba , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Tom K. Cho , Hichem M'Saad , Scott A. Hendrickson , Dustin W. Ho , Thomas Nowak
CPC分类号： G21K1/062 , B82Y10/00 , G21K2201/061 , G21K2201/064 , G21K2201/067 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。
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公开(公告)号：US07354288B2
公开(公告)日：2008-04-08
申请号：US11145258
申请日：2005-06-03
申请人： Kazutoshi Maehara , Visweswaren Sivaramakrishnan , Kentaro Wada , Mark A. Fodor , Andrzei Kaszuba
发明人： Kazutoshi Maehara , Visweswaren Sivaramakrishnan , Kentaro Wada , Mark A. Fodor , Andrzei Kaszuba
IPC分类号： H01R4/60
CPC分类号： C23C16/4586 , H01L21/68757
摘要： A substrate support comprises a ceramic disc with an electrode that is chargeable through an electrode terminal. An electrical connector connects an external power source to the electrode terminal. The electrical connector has a pair of opposing pincer arms, a groove sized to fit around the electrode terminal, and a pair of through holes to receive a tightening assembly capable of tightening the opposing pincer arms about the electrode terminal.
摘要翻译： 衬底支撑件包括具有可通过电极端子充电的电极的陶瓷盘。 电连接器将外部电源连接到电极端子。 电连接器具有一对相对的钳形臂，尺寸适于围绕电极端子的凹槽和一对通孔，用于接收能够围绕电极端子紧固相对的夹持臂的紧固组件。
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公开(公告)号：US20060272774A1
公开(公告)日：2006-12-07
申请号：US11145258
申请日：2005-06-03
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： C23C16/4586 , H01L21/68757
摘要： A substrate support comprises a ceramic disc with an electrode that is chargeable through an electrode terminal. An electrical connector connects an external power source to the electrode terminal. The electrical connector has a pair of opposing pincer arms, a groove sized to fit around the electrode terminal, and a pair of through holes to receive a tightening assembly capable of tightening the opposing pincer arms about the electrode terminal.
摘要翻译： 衬底支撑件包括具有可通过电极端子充电的电极的陶瓷盘。 电连接器将外部电源连接到电极端子。 电连接器具有一对相对的钳形臂，尺寸适于围绕电极端子的凹槽和一对通孔，用于接收能够围绕电极端子紧固相对的夹持臂的紧固组件。
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