BACKLIGHT UNIT AND DISPLAY DEVICE HAVING THE SAME
    11.
    发明申请
    BACKLIGHT UNIT AND DISPLAY DEVICE HAVING THE SAME 有权
    背光单元及其显示装置

    公开(公告)号:US20110128465A1

    公开(公告)日:2011-06-02

    申请号:US12858067

    申请日:2010-08-17

    申请人: Sung Young Park

    发明人: Sung Young Park

    IPC分类号: G02F1/13357 G09F13/04

    摘要: A backlight unit and a display device having a backlight unit that comprises a panel guide mold, a bottom cover, and a light supply unit, where the panel guide mold and the bottom cover are configured to provide sufficient stiffness and structural stability so that the width of the bezel is very small. The panel guide mold comprises a plurality of first mold units and a plurality of second mold units, where each of the plurality of second mold units is disposed between two of the first mold units, and the plurality of first mold units are offset in an outward direction relative to the plurality of second mold units. The bottom cover comprises a plurality of first sidewalls, each being aligned with a corresponding first mold unit, and a plurality of second sidewalls, where each is disposed between two of the first sidewalls and coupled to a corresponding second mold unit.

    摘要翻译: 一种背光单元和具有背光单元的显示装置,包括面板引导模,底盖和供光单元,其中面板引导模和底盖被构造成提供足够的刚度和结构稳定性,使得宽度 的表圈非常小。 面板引导模具包括多个第一模具单元和多个第二模具单元,其中多个第二模具单元中的每一个设置在两个第一模具单元之间,并且多个第一模具单元偏离向外 方向相对于多个第二模具单元。 底盖包括多个第一侧壁,每个第一侧壁与对应的第一模具单元和多个第二侧壁对准,其中每个侧壁均设置在两个第一侧壁之间并且联接到相应的第二模具单元。

    Backlight unit and display device having the same
    14.
    发明授权
    Backlight unit and display device having the same 有权
    背光单元和具有相同的显示装置

    公开(公告)号:US08319910B2

    公开(公告)日:2012-11-27

    申请号:US12858067

    申请日:2010-08-17

    申请人: Sung Young Park

    发明人: Sung Young Park

    IPC分类号: G02F1/1333

    摘要: A backlight unit and a display device having a backlight unit that comprises a panel guide mold, a bottom cover, and a light supply unit, where the panel guide mold and the bottom cover are configured to provide sufficient stiffness and structural stability so that the width of the bezel is very small. The panel guide mold comprises a plurality of first mold units and a plurality of second mold units, where each of the plurality of second mold units is disposed between two of the first mold units, and the plurality of first mold units are offset in an outward direction relative to the plurality of second mold units. The bottom cover comprises a plurality of first sidewalls, each being aligned with a corresponding first mold unit, and a plurality of second sidewalls, where each is disposed between two of the first sidewalls and coupled to a corresponding second mold unit.

    摘要翻译: 一种背光单元和具有背光单元的显示装置,包括面板引导模,底盖和供光单元,其中面板引导模和底盖被构造成提供足够的刚度和结构稳定性,使得宽度 的表圈非常小。 面板引导模具包括多个第一模具单元和多个第二模具单元,其中多个第二模具单元中的每一个设置在两个第一模具单元之间,并且多个第一模具单元偏离向外 方向相对于多个第二模具单元。 底盖包括多个第一侧壁,每个第一侧壁与对应的第一模具单元和多个第二侧壁对准,其中每个侧壁均设置在两个第一侧壁之间并且联接到相应的第二模具单元。

    MANUFACTURING CROSS-STRUCTURES OF NANOSTRUCTURES
    15.
    发明申请
    MANUFACTURING CROSS-STRUCTURES OF NANOSTRUCTURES 有权
    制造纳米结构的交叉结构

    公开(公告)号:US20100028814A1

    公开(公告)日:2010-02-04

    申请号:US12238306

    申请日:2008-09-25

    IPC分类号: G03F7/20 G03B27/42

    摘要: Techniques for manufacturing cross-structures of nanostructures, such as nanowires and carbon nanotubes are provided. In one embodiment, a method for manufacturing cross-structures of nanostructures include providing a substrate, patterning a first mask layer on the substrate, adsorbing first nanostructures onto surface regions of the substrate where the first mask layer does not exist, removing the first mask layer from the substrate, patterning a second mask layer on the substrate to which the first nanostructures are adsorbed, and adsorbing second nanostructures onto the surface regions of the substrate where the second mask layer does not exist, under conditions effective to manufacture cross-structures of nanostructures on the substrate.

    摘要翻译: 提供了用于制造纳米结构的交叉结构的技术,例如纳米线和碳纳米管。 在一个实施例中,一种用于制造纳米结构的交叉结构的方法包括:提供衬底,在衬底上图案化第一掩模层,将第一纳米结构吸附到不存在第一掩模层的衬底的表面区域上,去除第一掩模层 在衬底上形成第二掩模层,在其上吸附有第一纳米结构的衬底上,在有效制造纳米结构的交叉结构的条件下,将第二纳米结构吸附到不存在第二掩模层的衬底的表面区域上 在基板上。