公开(公告)号：US11509260B1

公开(公告)日：2022-11-22

申请号：US16171115

申请日：2018-10-25

Applicant: Meta Platforms Technologies, LLC

Inventor： Nihar Ranjan Mohanty ,  Ningfeng Huang

IPC: H02S40/20 ,  F21V8/00

Abstract: Techniques related to reclamation of energy leaking from waveguides are disclosed. One or more photovoltaic cells may receive light leaking from a waveguide at a first surface of the wave guide. The first surface may be opposite to a second surface at which an in-coupling element is located. The light leaking from the waveguide results from inefficiency in redirecting incoming light for propagation within the waveguide. The one or more photovoltaic cells may generate electric power from the light leaking from the waveguide.

公开(公告)号：US20220326436A1

公开(公告)日：2022-10-13

申请号：US17849065

申请日：2022-06-24

Applicant: Meta Platforms Technologies, LLC

Inventor： Matthew E. Colburn ,  Giuseppe Calafiore ,  Matthieu Charles Raoul Leibovici ,  Nihar Ranjan Mohanty

IPC: G02B6/124 ,  G02B27/01 ,  H01J37/305 ,  H01L21/321 ,  H01L21/027 ,  G02B5/18

Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

公开(公告)号：US20220317346A1

公开(公告)日：2022-10-06

申请号：US17216969

申请日：2021-03-30

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Elliott Franke ,  Nihar Ranjan Mohanty ,  Vivek Gupta ,  Geraud Jean-Michel Dubois

IPC: G02B5/18

Abstract: A multilayer architecture includes an amorphous optical layer, a crystalline optical layer overlying the amorphous optical layer, and a barrier layer located between the amorphous optical layer and the crystalline optical layer. The barrier layer may be configured to mediate the structure of the later-formed amorphous optical layer. For instance, a low absorption barrier layer may be formed over the crystalline optical layer within the multilayer architecture and accordingly inhibit crystallization within a subsequently formed optical layer, thus providing phase separation between the neighboring optical layers and a desired refractive index gradient within the multilayer architecture without adversely affecting the optical path length therethrough. Such a multilayer structure may be configured as a light retention layer, antireflective coating, bandpass filter, etc.