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公开(公告)号：US20240295763A1
公开(公告)日：2024-09-05
申请号：US18515795
申请日：2023-11-21
Applicant: Meta Platforms Technologies, LLC
Inventor： Kenneth Alexander Diest , Spencer Allan Wells , Zhaohui Yang , Nihar Ranjan Mohanty , Richard Farrell , Jilin Yang , Ehsan Arbabi
CPC classification number: G02F1/05 , C03C17/23 , C30B29/30 , C30B29/32 , G02B6/34 , G03F7/0002 , G03F7/0005 , C03C2217/228 , C03C2217/23 , C03C2217/92
Abstract: A device includes a pair of electrodes and a dynamic material disposed between the pair of electrodes, the dynamic material including a crystalline microstructure configured to change between at least two states in response to a change in an electric field between the two electrodes. A material includes tetragonal lead magnesium niobate-lead titanate (PMN-PT) and at least one lanthanide series element. A method includes doping a lead magnesium niobate-lead titanate material with at least one lanthanide series element, and processing the PMN-PT material to form tetragonal PMN-PT. A further method includes forming a low refractive index nanostructured grating over a carrier substrate, forming a high refractive index layer over the low refractive index grating to produce a nanostructured coupling element, forming an adhesive layer over the nanostructured coupling element, and affixing the nanostructured coupling element to a high index waveguide.
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公开(公告)号：US20230314794A1
公开(公告)日：2023-10-05
申请号：US18159842
申请日：2023-01-26
Applicant: Meta Platforms Technologies, LLC
Inventor： Joshua Andrew Kaitz , Pasqual Rivera , Guangbi Yuan , Nihar Ranjan Mohanty , John Sporre , Vivek Gupta
CPC classification number: G02B27/0006 , G02B27/017
Abstract: The disclosed method for recovering optical properties of transparent substrates may include performing a post-etching annealing process on a transparent substrate. The method may also include applying a plasma treatment to the transparent substrate, performing an atomic layer etching treatment on the transparent substrate, and/or performing a cleaning process. Various other methods, devices, and systems are also disclosed.
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公开(公告)号：US11579364B2
公开(公告)日：2023-02-14
申请号：US17849065
申请日：2022-06-24
Applicant: Meta Platforms Technologies, LLC
Inventor： Matthew E. Colburn , Giuseppe Calafiore , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty
IPC: G02B6/124 , G02B5/18 , G02B27/01 , H01J37/305 , H01L21/321 , H01L21/027 , G02B6/12 , G02B6/34
Abstract: A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.
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公开(公告)号：US11455031B1
公开(公告)日：2022-09-27
申请号：US15997473
申请日：2018-06-04
Applicant: Meta Platforms Technologies, LLC
Inventor： Robin Sharma , Andrew John Ouderkirk , Matthew E. Colburn , Qi Zhang , Giuseppe Calafiore , John Goward , Karol Constantine Hatzilias , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty , Selso Luanava
Abstract: Disclosed herein are techniques for eye illumination for eye position tracking. An illuminator for eye tracking includes a substrate configured to be placed in front of an eye of a user and a light source positioned on a surface of the substrate. The light source is configured to be positioned within a field of view of the eye of the user. A maximum dimension of the light source in a plane parallel to an emission surface of the light source is less than 500 μm.
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公开(公告)号：US11709422B2
公开(公告)日：2023-07-25
申请号：US17024081
申请日：2020-09-17
Applicant: Meta Platforms Technologies, LLC
Inventor： Elliott Franke , Nihar Ranjan Mohanty , Ankit Vora , Austin Lane , Matthew E. Colburn
CPC classification number: G03F7/0005 , G02B6/0016 , G02B6/0038 , G02B6/0065 , G02B27/0172 , G03F7/091 , G03F7/11 , G03F7/12 , G02B2027/0178
Abstract: Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.
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Patent Agency Ranking
公开(公告)号：US20240329290A1
公开(公告)日：2024-10-03
申请号：US18529322
申请日：2023-12-05
Applicant: Meta Platforms Technologies, LLC
Inventor： Richard Farrell , Bo Zhao , Siddharth Buddhiraju , Nihar Ranjan Mohanty , Keith Rozenburg , Zhaohui Yang
CPC classification number: G02B6/0016 , G02B6/0035 , G02B6/0065 , G02B27/0172 , G02B2027/0178
Abstract: A bilayer binary 2D surface relief grating includes a primary grating layer having an array of primary grating elements, and a secondary grating layer having an array of secondary grating elements overlying the primary grating layer, where the secondary grating elements are at least partially laterally offset from the primary grating elements. A method of manufacturing such a surface relief grating includes forming a low refractive index layer over a substrate, the low refractive index layer including a primary sub-layer having an array of primary openings and a secondary sub-layer overlying the primary sub-layer and having an array of secondary openings, where the secondary openings are at least partially laterally offset from the primary openings, and forming a high refractive index layer within the primary and secondary openings.
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公开(公告)号：US20230168508A1
公开(公告)日：2023-06-01
申请号：US17717669
申请日：2022-04-11
Applicant: Meta Platforms Technologies, LLC
Inventor： Robin Sharma , Afsoon Jamali , Ming Lei , Sho Nakahara , Nihar Ranjan Mohanty , Karol Constantine Hatzilias , Carl Chancy
CPC classification number: G02B27/0172 , G02F1/163 , G02F1/157 , G02B2027/0178
Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming element disposed on the optical path, where the dimming element includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. A display layer is disposed on the optical path between the eyeward side of the optical assembly and the dimming element. The display layer is configured to direct visible display light toward the eyeward side and also to direct activation light to the dimming element, where the activation light is within the range of light wavelengths to activate a darkening of the photochromic material to dim the visible scene light.
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公开(公告)号：US20230168507A1
公开(公告)日：2023-06-01
申请号：US17717644
申请日：2022-04-11
Applicant: Meta Platforms Technologies, LLC
Inventor： Robin Sharma , Afsoon Jamali , Ming Lei , Sho Nakahara , Nihar Ranjan Mohanty , Karol Constantine Hatzilias , Carl Chancy
CPC classification number: G02B27/0172 , G02F1/0126 , G02B2027/0118
Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming element disposed on the optical path, wherein the dimming element includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. An illuminator, coupled to an edge of the dimming element, is configured to selectively emit an activation light within the range of light wavelengths to activate a darkening of the photochromic material to dim the visible scene light.
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公开(公告)号：US20250085475A1
公开(公告)日：2025-03-13
申请号：US18463855
申请日：2023-09-08
Applicant: Meta Platforms Technologies, LLC
Inventor： Richard Farrell , Nihar Ranjan Mohanty
Abstract: Systems and methods for manufacturing an optical waveguide may include singulating a waveguide blank from a substrate to a substantially final shape; after singulating the waveguide blank, apply an optical grating over the waveguide blank; and after singulating the waveguide blank, apply at least one coating to the waveguide blank.
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公开(公告)号：US20230168524A1
公开(公告)日：2023-06-01
申请号：US17717658
申请日：2022-04-11
Applicant: Meta Platforms Technologies, LLC
Inventor： Robin Sharma , Afsoon Jamali , Ming Lei , Sho Nakahara , Nihar Ranjan Mohanty , Karol Constantine Hatzilias , Carl Chancy
CPC classification number: G02F1/0126 , G02B27/0172 , G02B2027/0118 , G02B2027/0178
Abstract: An optical assembly is configured to receive visible scene light at the backside of the optical assembly and to direct the visible scene light on an optical path toward the eyeward side. The optical assembly includes a dimming layer disposed on the optical path and includes a photochromic material that is configured to darken in response to exposure to a range of light wavelengths. An illumination layer is also disposed on the optical path and is configured to propagate an evanescent activation light within the illumination layer. The illumination layer is also configured to leak the evanescent activation light towards the dimming layer to activate a darkening of the photochromic material of the dimming layer to dim the visible scene light.
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