公开(公告)号：US20230314794A1

公开(公告)日：2023-10-05

申请号：US18159842

申请日：2023-01-26

Applicant: Meta Platforms Technologies, LLC

Inventor： Joshua Andrew Kaitz ,  Pasqual Rivera ,  Guangbi Yuan ,  Nihar Ranjan Mohanty ,  John Sporre ,  Vivek Gupta

IPC: G02B27/00 ,  G02B27/01

CPC classification number: G02B27/0006 ,  G02B27/017

Abstract: The disclosed method for recovering optical properties of transparent substrates may include performing a post-etching annealing process on a transparent substrate. The method may also include applying a plasma treatment to the transparent substrate, performing an atomic layer etching treatment on the transparent substrate, and/or performing a cleaning process. Various other methods, devices, and systems are also disclosed.

公开(公告)号：US11714045B2

公开(公告)日：2023-08-01

申请号：US17382134

申请日：2021-07-21

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Gangadhara Raja Muthinti ,  Vivek Gupta

IPC: G01N21/21 ,  G01B11/06

CPC classification number: G01N21/211 ,  G01B11/0625 ,  G01N2021/213 ,  G01N2201/12

Abstract: Various embodiments set forth techniques for characterizing films on optically clear substrates using ellipsometry. In some embodiments, a spectroscopic ellipsometer is configured to generate a light beam that has a relatively small spot size and is substantially absorbed by an optically clear substrate, thereby reducing or eliminating reflections from an interface between the substrate and air. Optical simulations can be performed to determine values for various parameters associated with the ellipsometer that minimize the reflections from the interface between the substrate and air and maximize reflections from an interface between a film and the substrate. In addition, graded films that include multiple layers can be analyzed using models of multiple layers.

公开(公告)号：US20220317346A1

公开(公告)日：2022-10-06

申请号：US17216969

申请日：2021-03-30

Applicant: META PLATFORMS TECHNOLOGIES, LLC

Inventor： Elliott Franke ,  Nihar Ranjan Mohanty ,  Vivek Gupta ,  Geraud Jean-Michel Dubois

IPC: G02B5/18

Abstract: A multilayer architecture includes an amorphous optical layer, a crystalline optical layer overlying the amorphous optical layer, and a barrier layer located between the amorphous optical layer and the crystalline optical layer. The barrier layer may be configured to mediate the structure of the later-formed amorphous optical layer. For instance, a low absorption barrier layer may be formed over the crystalline optical layer within the multilayer architecture and accordingly inhibit crystallization within a subsequently formed optical layer, thus providing phase separation between the neighboring optical layers and a desired refractive index gradient within the multilayer architecture without adversely affecting the optical path length therethrough. Such a multilayer structure may be configured as a light retention layer, antireflective coating, bandpass filter, etc.