公开(公告)号：US20220204810A1

公开(公告)日：2022-06-30

申请号：US17621918

申请日：2020-06-26

Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.

Inventor： Shunsuke KATAGIRI ,  Takuya SUZUKI ,  Seiji SHIKA ,  Yune KUMAZAWA

IPC: C09D179/08 ,  C08G73/12 ,  B32B27/36 ,  B32B27/08 ,  H05K1/03

Abstract: The resin composition of the present invention contains a maleimide compound (A) represented by the following formula (1); and a photo initiator (B) having an absorbance of 0.1 or more at a wavelength of 405 nm (h-line). In the formula (1), R1, R2, and R3 each independently represent an alkyl group or an alkoxy group which may have a hydrogen atom, a halogen atom, a hydroxyl group, or a substituent, R4 represents an alkylene group, an alkenylene group, an alkoxylene group, or an arylene group which may have a substituent, and R5 and R6 each independently represent a hydrogen atom, a linear or branched alkyl group having 1 to 6 carbon atoms, or a linear or branched alkenyl group having 1 to 6 carbon atoms.

公开(公告)号：US20210206892A1

公开(公告)日：2021-07-08

申请号：US17271745

申请日：2019-08-28

Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.

Inventor： Yune KUMAZAWA ,  Takuya SUZUKI ,  Seiji SHIKA

IPC: C08F22/40 ,  C08F2/50 ,  H05K3/46 ,  H05K1/02 ,  H05K1/03 ,  G03F7/028 ,  C08K5/5397

Abstract: A resin composition of the present invention contains: a maleimide compound (A) having a maleimide functional group equivalent of 300 g/eq. or more, and a transmittance of 1% or more at a wavelength of 405 nm (h-line); a maleimide compound (B) having a maleimide functional group equivalent of less than 300 g/eq.; and a photo initiator (C) having an absorbance of 0.1 or more at a wavelength of 405 nm (h-line).