Apparatus for machining
    11.
    发明授权
    Apparatus for machining 失效
    加工设备

    公开(公告)号:US5014581A

    公开(公告)日:1991-05-14

    申请号:US378746

    申请日:1989-07-12

    IPC分类号: B23B27/12

    摘要: A rotary machining system is presented which uses a housing, a combined spindle and cutting disk, a source of high pressure fluid, a hydraulic line, a needle valve, a carbide ball and a carbide socket to machine superalloys and other difficult-to-machine materials and alloys at high speeds. The hydraulic lines and fluid source provide high pressure fluid through an aperture of the carbide socket into the housing to float the spindle. This fluid acts as a hydrostatic thrust bearing as it separates the spindle from the walls of the housing. Since the spindle and cutting disk are a single unit which are not physically attached to a roller bearing mechanism, they may be quickly and easily inserted and removed to minimize the "down time"0 of the system when the cutting disk needs to be replaced or ground to a sharp edge.

    摘要翻译: 提出了一种旋转加工系统,其使用壳体,组合主轴和切割盘,高压流体源,液压管线,针阀,碳化物球和碳化物插座来加工超级合金和其他难以加工的 材料和合金。 液压管线和流体源将高压流体通过碳化物插座的孔提供到壳体中以使主轴浮动。 当流体静力推力轴承将主轴与壳体的壁分离时,该流体用作静液压推力轴承。 由于主轴和切割盘是单个单元,其物理上不连接到滚子轴承机构,所以它们可以快速且容易地插入和移除,以便在切割盘需要更换时最小化系统的“停机时间”0, 接地到锋利的边缘。

    Method and apparatus for magnetic float polishing
    13.
    发明授权
    Method and apparatus for magnetic float polishing 失效
    磁浮法研磨方法及装置

    公开(公告)号:US07252576B1

    公开(公告)日:2007-08-07

    申请号:US11358686

    申请日:2006-02-21

    IPC分类号: B24B1/00

    CPC分类号: B24B1/005 B24B11/02 F16C33/32

    摘要: A method of polishing workpieces in a magnetic float polishing chamber comprising a lower chamber piece and an upper chamber piece which is removably receivable in the lower chamber piece and is connected to a powered spindle for rotating the upper chamber piece in the polishing operation. The method preferably comprises one or more of the steps of (a) geometrically aligning the upper chamber piece with the powered spindle by machining the upper chamber piece in-situ, (b) machining the contact surface of the upper chamber piece in-situ between various polishing runs, and (c) mounting the lower chamber piece in a manner effective for causing the lower piece to automatically self-align coaxially with the upper chamber piece.

    摘要翻译: 一种在磁浮浮抛光室中抛光工件的方法,包括下室件和可拆卸地容纳在下室件中的上室件,并连接到用于在抛光操作中旋转上室件的动力主轴。 该方法优选地包括以下步骤中的一个或多个步骤:(a)通过原位机械加工上部腔体部件,(b)在上部腔体部件的接触表面之间原位加工 各种抛光运行,以及(c)以有效地使下部件与上部腔体部件同轴自动自对准的方式安装下部腔体部件。

    Magnetic float polishing processes and materials therefor
    14.
    发明授权
    Magnetic float polishing processes and materials therefor 失效
    磁浮抛光工艺及其材料

    公开(公告)号:US5931718A

    公开(公告)日:1999-08-03

    申请号:US940254

    申请日:1997-09-30

    摘要: A methodology for finishing of HIP'ed Si.sub.3 N.sub.4 balls from the as-received condition by magnetic fluid polishing. It involves mechanical removal of material initially using harder abrasives with respect to the work material (of different materials of progressively lower hardnesses and finer grain sizes) followed by final chemo-mechanical polishing (CMP) using preferably a softer abrasive for obtaining superior finish with minimal surface or subsurface defects, such as scratches, microcracks, or pits on the Si.sub.3 N.sub.4 balls. High material removal rates (1 .mu.m/min) with minimal subsurface damage is obtained with harder abrasives, such as B.sub.4 C or SiC (relative to Si.sub.3 N.sub.4) due to the use of a flexible support system, small polishing loads (1N/ball), and fine abrasives but high polishing speeds (compared to conventional polishing) by rapid accumulation of minute amounts of material removed by microfracture. Final polishing of the Si.sub.3 N.sub.4 balls using a softer abrasive, such as CeO.sub.2 (that chemo-mechanically react with the Si.sub.3 N.sub.4 work material) results in high quality Si.sub.3 N.sub.4 balls of bearing quality with a superior surface finish and damage-free surface.

    摘要翻译: 通过磁性流体抛光从接收状态完成HIP的Si3N4球的方法。 它涉及最初使用较硬的研磨剂相对于工作材料(具有逐渐降低的硬度和更细的晶粒尺寸的不同材料的材料)进行机械去除,然后使用优选较软的研磨剂以最小的最终化学机械抛光(CMP)获得优异的光洁度 表面或次表面缺陷,例如Si3N4球上的划痕,微裂纹或凹坑。 由于使用柔性支撑系统,较小的抛光载荷(1N /球),较硬的磨料(例如B4C或SiC(相对于Si3N4))可获得具有最小表面损伤的高材料去除率(1μm/ min) 和细磨料,但抛光速度高(与传统抛光相比),通过微量骨料去除微量材料的快速积聚。 使用更软的磨料(如CeO2(与Si3N4工作材料进行化学机械反应))对Si3N4球进行最终抛光,导致高品质的Si3N4球轴承质量,具有优异的表面光洁度和无损伤表面。

    Polycrystalline diamond and CBN cutting tools
    15.
    发明授权
    Polycrystalline diamond and CBN cutting tools 失效
    多晶金刚石和CBN切割工具

    公开(公告)号:US4797138A

    公开(公告)日:1989-01-10

    申请号:US48176

    申请日:1987-05-11

    申请人: Ranga Komanduri

    发明人: Ranga Komanduri

    摘要: A cutting tool comprised of a polycrystalline layer of diamond or cubic boron nitride which has a cutting edge and at least one straight edge wherein one face of the polycrystalline layer is adhered to a substrate of cemented carbide and wherein a straight edge is adhered to one side of a wall of cemented carbide which is integral with the substrate, the thickness of the polycrystalline layer and the height of the wall being substantially equivalent.

    摘要翻译: 一种切割工具,包括金刚石或立方氮化硼的多晶层,其具有切割边缘和至少一个直边缘,其中多晶层的一个面粘附到硬质合金的基底,并且其中直边缘粘附到一侧 与基底成一体的硬质合金壁,多晶层的厚度和壁的高度基本相等。