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    Cleaning composition with rapid foam collapse
    14.
    发明授权
    Cleaning composition with rapid foam collapse 有权

    公开(公告)号：US10138443B2

    公开(公告)日：2018-11-27

    申请号：US15038548

    申请日：2014-11-21

    Applicant: ROHM AND HAAS COMPANY

    Inventor： Andrea C. Keenan ,  Jan E. Shulman ,  Theodore Tysak

    IPC: C11D1/66 ,  C11D1/72 ,  C11D3/20 ,  C11D11/00 ,  B08B3/04 ,  C11D3/18

    Abstract: An aqueous cleaning composition including: a surfactant; a first compound that is immiscible with water and has Hansen solubility parameters of 10 MPa0.5≤δD≤22 MPa0.5, 0≤δP≤14 MPa0.5, and 0≤δH≤14 MPa0.5; and a second compound that is miscible with water and has Hansen solubility parameters of 10 MPa0.5≤δD≤22 MPa0.5, 0≤δP≤10 MPa0.5, and 0≤δH≤14 MPa0.5, wherein the surfactant, the first compound, and the second compound are each independently included in an amount of 0.01 to 30 weight percent, based on a total weight of the cleaning composition.

    DISPERSANT COPOLYMERS HAVING HIGH COMPATIBILITY WITH SURFACTANTS
    15.
    发明申请
    DISPERSANT COPOLYMERS HAVING HIGH COMPATIBILITY WITH SURFACTANTS 有权
    具有与表面活性剂高度兼容性的分散共聚物

    公开(公告)号：US20150315528A1

    公开(公告)日：2015-11-05

    申请号：US14649980

    申请日：2013-12-04

    Applicant: Rohm and Haas Company ,  Dow Global Technologies LLC

    Inventor： Marianne P. Creamer ,  Jan E. Shulman ,  Eric P. Wasserman

    IPC: C11D3/37 ,  C08F222/10

    CPC classification number: C11D3/3757 ,  C08F2/06 ,  C08F8/14 ,  C08F220/06 ,  C08F220/20 ,  C08F222/10 ,  C08F2220/1833 ,  C08F2220/1891 ,  C08F2220/1883

    Abstract: A polymeric dispersant comprising: (a) from 50 to 95 wt % polymerized residues of monomer (A): wherein R1 is hydrogen, methyl, ethyl or COOX; R2 is hydrogen, methyl or ethyl; R3 is hydrogen, methyl or ethyl; and X is hydrogen, sodium, potassium, ammonium or a combination thereof; (b) from 1 to 20 wt % polymerized residues of monomer (B): wherein R4, R5, and R6 are independently hydrogen, methyl or ethyl; R7 is C8-C30 alkyl or C8-C30 aralkyl; and (c) from 3 to 30 wt % polymerized residues of monomer (C): wherein R8, R9, and R10 are independently hydrogen, methyl or ethyl; R11 and R12 are independently hydrogen, C1-C8 alkyl or hydroxymethyl; and n is an integer from 1 to 3.

    Abstract translation: 包括：（a）50至95重量％的单体（A）的聚合残基：其中R1是氢，甲基，乙基或COOX; R2是氢，甲基或乙基; R3是氢，甲基或乙基; X是氢，钠，钾，铵或它们的组合; （b）1至20重量％的单体（B）的聚合残基：其中R 4，R 5和R 6独立地为氢，甲基或乙基; R7是C8-C30烷基或C8-C30芳烷基; 和（c）3至30重量％的单体（C）的聚合残基：其中R8，R9和R10独立地为氢，甲基或乙基; R 11和R 12独立地是氢，C 1 -C 8烷基或羟甲基; n为1〜3的整数。

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