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1.发明公开公开(公告)号：US20240343996A1
公开(公告)日：2024-10-17
申请号：US18633061
申请日：2024-04-11
申请人： ECOLAB USA INC.
CPC分类号： C11D1/722 , C11D3/0073 , C11D3/08 , C11D3/10 , C11D3/2086 , C11D3/33 , C11D3/3761 , C11D17/0073
摘要： Solid cleaning compositions having optimal dissolution rate of about 1 gram over 1-10 minutes and stability are disclosed. Solid cleaning compositions contain alcohol alkoxylate surfactants with EO of 6 or less and PO of 2 or greater, an alkalinity source(s), a builder, and optional additional functional ingredients are disclosed. Methods of providing concentrate and/or use solutions of the solid cleaning compositions and methods of use thereof are also provided.
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公开(公告)号：US20240271060A1
公开(公告)日：2024-08-15
申请号：US18433969
申请日：2024-02-06
发明人： Takumi NAMIKI , Jun IIOKA
CPC分类号： C11D3/2072 , C11D3/0073 , C11D3/042 , C11D3/2082 , C11D3/30 , C11D2111/22
摘要： There is provided an aqueous cleaning liquid containing hydrofluoric acid and at least one kind of chelating compound selected from the group consisting of a β-diketone compound and a compound containing a total of two or more carboxy groups or hydroxyl groups in a molecule, where the aqueous cleaning liquid is used in a case of cleaning a substrate that contains aluminum oxide in a surface layer.
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公开(公告)号：US20240231237A9
公开(公告)日：2024-07-11
申请号：US18400807
申请日：2023-12-29
申请人： FUJIFILM Corporation
IPC分类号： G03F7/42 , C11D3/00 , C11D7/04 , C11D7/20 , C11D7/26 , C11D7/32 , C11D7/34 , C11D7/50 , H01L21/02
CPC分类号： G03F7/425 , C11D3/0073 , C11D7/04 , C11D7/20 , C11D7/261 , C11D7/3209 , C11D7/3218 , C11D7/3227 , C11D7/3281 , C11D7/34 , C11D7/5004 , C11D7/5009 , C11D7/5022 , G03F7/423 , G03F7/426 , H01L21/02063 , H01L21/02068 , C11D2111/22
摘要： A treatment liquid for a semiconductor device includes an alkanolamine; a hydroxylamine; an organic solvent; Ca; Fe; and Na, wherein the content of the alkanolamine in the treatment liquid is 0.1% to 5% by mass, the content of the hydroxylamine in the treatment liquid is 0.1% to 30% by mass, and each of the mass ratio of Ca, Fe, and Na with respect to the content of the alkanolamine and the hydroxylamine in the treatment liquid is 10−12 to 10−4.
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公开(公告)号：US20240182823A1
公开(公告)日：2024-06-06
申请号：US18522458
申请日：2023-11-29
发明人： CONNY ERNA ALICE JOOS , JOHAN SMETS , ARIEL LEBRON , JENNIFER BETH ALLISON , MATTIA COLLU , SUSANA FERNANDEZ PRIETO , OLAV PIETER DORA TONY KEIJZER , LINSHENG FENG , SONIA MARCELA MALAGON GOMEZ , MEAGAN MARIE KOCHEL
CPC分类号： C11D3/505 , B01J13/16 , C11D3/0073 , C11D3/223 , C11D11/0017 , C11D17/0013 , C11D17/0039
摘要： A treatment composition that includes a treatment adjunct and a population of core/shell delivery particles, where the shell is made from an acid-treated chitosan and a cross-linking agent, where the acid-treated chitosan results from treating chitosan with a weak acid, or even a mixture of a strong acid and a weak acid. Related methods of making and using such compositions.
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5.发明公开公开(公告)号：US20240141262A1
公开(公告)日：2024-05-02
申请号：US18548903
申请日：2022-03-03
申请人： Chevron U.S.A. Inc.
CPC分类号： C11D7/08 , B63B57/02 , C11D3/0073 , C11D2111/16 , C11D2111/42
摘要： A process to remove impurities from a surface of a cargo tank of a vessel used to transport liquid hydrocarbons includes using an active chemical solution to dissolve at least a portion of the impurities or the matrix in which they are embedded deposited n the surface of the cargo tank. The process also includes allowing the active chemical solution to subsequently remove embedded impurities from the surface.
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公开(公告)号：US20240076577A1
公开(公告)日：2024-03-07
申请号：US18503355
申请日：2023-11-07
申请人： ECOLAB USA INC.
CPC分类号： C11D3/30 , C11D1/22 , C11D3/0057 , C11D3/0073 , C11D3/08 , C11D3/10 , C11D3/2034 , C11D3/43 , C11D11/0023 , C11D11/0041
摘要： The invention relates to a non-corrosive degreasing concentrate and ready to use formulation. In particular, non-corrosive compositions capable of removing polymerized grease as effectively as some alkali metal hydroxide (i.e. caustic) based degreasers without requiring the use of personal protective equipment are disclosed.
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公开(公告)号：US11898123B2
公开(公告)日：2024-02-13
申请号：US17458671
申请日：2021-08-27
发明人： Emil A. Kneer , Thomas Dory , Atsushi Mizutani
CPC分类号： C11D3/33 , C11D3/0047 , C11D3/0073 , C11D3/28 , C11D3/3409 , C11D3/43 , C11D11/0047
摘要： This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.
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公开(公告)号：US11834633B2
公开(公告)日：2023-12-05
申请号：US16946944
申请日：2020-07-13
申请人： ECOLAB USA INC.
发明人： Hilina Emiru , Victor Fuk-Pong Man
IPC分类号： C11D1/12 , C11D1/90 , C11D1/92 , C11D3/22 , C11D3/30 , C11D3/37 , C11D3/43 , B08B3/04 , B08B3/08 , C11D1/94 , C11D3/00 , C11D11/00 , C11D17/00
CPC分类号： C11D3/3765 , B08B3/08 , C11D1/94 , C11D3/0073 , C11D3/0094 , C11D3/221 , C11D3/222 , C11D3/43 , C11D11/0023 , C11D17/0043
摘要： Alkaline sprayable aqueous compositions for cleaning, sanitizing and disinfecting are disclosed. In particular, the sprayable compositions include an alkali soluble emulsion polymer, an alkalinity source, a foaming agent, and water. Beneficially, the sprayable cleaning compositions have reduced misting and are environmentally safe for users to apply. Further the compositions exhibit less running on non-horizontal surfaces than acrylamide-based compositions.
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公开(公告)号：US20230348818A1
公开(公告)日：2023-11-02
申请号：US18309159
申请日：2023-04-28
申请人： ECOLAB USA INC.
发明人： Steven Lundberg , Jesse Ray Murphy , Jack Lehman , John Mansergh
CPC分类号： C11D3/0042 , C11D11/0023 , C11D3/0073 , C11D3/3757 , C11D3/33 , C11D3/06
摘要： Warewash detergent compositions with reducing agents to overcome corrosion challenges in stainless steel dish machines subject to conditions from chlorine sanitizing rinse steps (or other oxidizing chlorine containing compositions) are provided. Detergent compositions or booster compositions used in combination with detergents beneficially containing a reducing agent that reacts with chlorine introduced in sanitizing rinse steps that follow detergent cleaning steps are provided. Methods for ware washing using the detergent compositions with reducing agents and methods for reducing residual chlorine in a ware washing cycle are also provided.
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公开(公告)号：US20190241845A1
公开(公告)日：2019-08-08
申请号：US16361637
申请日：2019-03-22
发明人： Tomonori Takahashi , Bing Du , William A. Wojtczak , Thomas Dory , Emil A. Kneer
IPC分类号： C11D11/00 , H01L21/027 , H01L21/02 , H01L21/311 , C11D7/32 , C11D3/00 , C11D7/50
CPC分类号： C11D11/0047 , C11D3/0073 , C11D7/3218 , C11D7/3245 , C11D7/3281 , C11D7/5022 , H01L21/0206 , H01L21/02063 , H01L21/02068 , H01L21/02071 , H01L21/0273 , H01L21/31133
摘要： This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
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