MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME
    13.
    发明申请
    MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    多层布线结构及其制造方法

    公开(公告)号:US20130186679A1

    公开(公告)日:2013-07-25

    申请号:US13735813

    申请日:2013-01-07

    CPC classification number: H05K3/4038 H05K1/115 H05K3/403

    Abstract: The multilayer wiring structure includes: a substrate; a connection hole formed to pass through one surface and another surface of the substrate; and electrode wirings formed on the substrate, wherein the electrode wirings includes: a plurality of first wirings formed on one surface of the substrate; a plurality of second wirings formed on another surface of the substrate; and a plurality of connection wirings formed on an inner surface of the connection hole and electrically connecting the plurality of first wirings and the plurality of second wirings, respectively.

    Abstract translation: 多层布线结构包括:基板; 形成为穿过基板的一个表面和另一个表面的连接孔; 以及形成在所述基板上的电极布线,其中所述电极布线包括:形成在所述基板的一个表面上的多个第一布线; 形成在所述基板的另一表面上的多个第二布线; 以及形成在所述连接孔的内表面上并分别电连接所述多个第一配线和所述多个第二配线的多个连接配线。

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