SUPPORTING UNIT AND APPARATUS FOR TREATING SUBSTRATE

    公开(公告)号:US20230060901A1

    公开(公告)日:2023-03-02

    申请号:US17892244

    申请日:2022-08-22

    Abstract: The inventive concept provides a support unit for supporting a substrate. The support unit for supporting the substrate includes a first plate; heating elements provided at the first plate for controlling a temperature of respective region of the substrate; a power supply module configured to generate at least two powers having a different frequency; a power line transmitting a power generated by the power supply module to the heating elements; and filters installed at the power line to selectively filter a power supplied to the heating elements.

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