公开(公告)号：US20230173520A1

公开(公告)日：2023-06-08

申请号：US18059681

申请日：2022-11-29

Applicant: SEMES CO., LTD.

Inventor： Hae Kyung KIM ,  Dae Sung KIM ,  Woo Sin JUNG

IPC: B05B12/08 ,  G03F7/16

CPC classification number: B05B12/081 ,  G03F7/16

Abstract: Provided is a pressurizing apparatus that pressurizes a photoresist. In an embodiment, the pressurizing apparatus includes: a housing including a wall surface defining an internal space; a film separating the internal space into a first space and a second space; a first inlet which is in communication with the first space; a second outlet which is in communication with the first space; and a pressurization gas inlet which is in communication with the second space, and in the housing, a transverse section of the internal space has a large width of a first direction and a small width of a second direction perpendicular to the first direction, and the width of the internal space in the second direction includes a section which is narrowed toward a second side which is the other side from a first side which is one side in the first direction.