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公开(公告)号：US20230066695A1
公开(公告)日：2023-03-02
申请号：US17870835
申请日：2022-07-22
Applicant: SEMES CO., LTD.
Inventor： Sang Uk SON , Yong Tak HYUN , Dae Sung KIM
IPC: B41J2/045
Abstract: Provided are a nozzle inspection method and a nozzle inspection apparatus capable of accurately detecting a defect in an inkjet head nozzle within a short time. The nozzle inspection method comprises discharging a plurality of droplets into a first region of interest of a substrate using a first nozzle to form an inspection pattern, and determining whether the first nozzle is defective based on the inspection pattern.
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公开(公告)号：US20230073867A1
公开(公告)日：2023-03-09
申请号：US17940207
申请日：2022-09-08
Applicant: SEMES CO., LTD. , SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
Inventor： Jung Suk GOH , A Rah CHO , Woo Sin JUNG , Dae Sung KIM , Hae Kyung KIM , Hyungmin PARK , Jungjin LEE , Linfeng PIAO , Jubeom LEE
IPC: G03F7/16
Abstract: Provided is a liquid supplying apparatus including: a trap tank for receiving a liquid from a storage bottle in which the liquid is stored and accommodating the received liquid; a pipe for connecting the storage bottle and the trap tank; and a valve installed on the pipe and for opening and closing a flow path of the pipe, in which the valve is installed closer to the storage bottle than the trap tank.
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公开(公告)号：US20230215745A1
公开(公告)日：2023-07-06
申请号：US17990819
申请日：2022-11-21
Applicant: SEMES CO., LTD.
Inventor： Woo Sin JUNG , Young CHOI , Dae Sung KIM , Hae Kyung KIM , Dongwoon PARK
IPC: H01L21/67
CPC classification number: H01L21/6715
Abstract: A liquid trap tank and a liquid supply unit for the liquid trap tank are provided. The liquid trap tank includes a tank body which has an accommodating space formed therein to accommodate a liquid and has an inlet portion formed on one side and an outlet portion formed on an opposite side; and a liquid supply unit coupled to the inlet of the tank body to supply the liquid from the outside of the tank body to the accommodating space, wherein the liquid supply unit comprises an inlet pipe portion coupled to the inlet portion to introduce the liquid into the accommodating space and a flow directing portion connected to the inlet pipe portion and configured to induce a flow of the liquid to suppress generation of air bubbles due to a drop of the liquid passing through the inlet pipe portion.
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公开(公告)号：US20230201844A1
公开(公告)日：2023-06-29
申请号：US18145952
申请日：2022-12-23
Applicant: SEMES CO., LTD
Inventor： A Rah CHO , Woo Sin JUNG , Hae Kyung KIM , Dae Sung KIM
CPC classification number: B05B1/005 , B05B12/088 , B05B15/20 , B05B15/50
Abstract: Provided is an equipment for treating a substrate. The substrate treating equipment may include: a nozzle supplying a chemical solution to a substrate; and a chemical solution supply apparatus supplying the chemical solution to the nozzle, and the chemical solution supply apparatus may include a pump member, an extraction nozzle provided on a flow path through which the chemical solution is introduced into the pump member and spraying the chemical solution by a spray scheme, and a control unit controlling an operation of the pump member.
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公开(公告)号：US20230008351A1
公开(公告)日：2023-01-12
申请号：US17859900
申请日：2022-07-07
Applicant: SEMES CO., LTD.
Inventor： Sang Eun NOH , Dae Sung KIM , Ho Jin JANG
IPC: G03F7/16
Abstract: Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes: a first process chamber having a first treating space therein; a second process chamber having a second treating space therein; and an exhaust unit configured to exhaust atmospheres of the first treating space and the second treating space, in which the exhaust unit includes an integrated exhaust line in which a pressure reduction unit is installed, a first exhaust line configured to connect the first process chamber and a first point of the integrated exhaust line, a second exhaust line configured to connect the first process chamber and a second point of the integrated exhaust line, and an interference alleviation unit configured to alleviate exhaust interference between the first process chamber and the second process chamber.
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Patent Agency Ranking
公开(公告)号：US20220102169A1
公开(公告)日：2022-03-31
申请号：US17486060
申请日：2021-09-27
Applicant: SEMES CO., LTD.
Inventor： Dae Sung KIM , Sang Eun NOH , Ho Jin JANG , Jae Hoon PARK
IPC: H01L21/67 , H01L21/687 , H01L21/673 , H01L21/02
Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus comprising: a treating vessel including an outer cup and an inner cup placed in an inner side of the outer cup, the inner cup and the outer cup in combination defining a recollecting route for a recollecting a liquid; a rotatable spin head placed within the treating vessel on which a cleaning jig is placed; wherein the treating vessel comprises a first protrusion protruding from an inner side surface of the outer cup to direct a cleaning liquid scattering from the cleaning jig toward a surface of the inner cup.
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公开(公告)号：US20210114068A1
公开(公告)日：2021-04-22
申请号：US17073338
申请日：2020-10-17
Applicant: SEMES CO., LTD.
Inventor： Woo Sin JUNG , Sang Eun NOH , Dae Sung KIM
Abstract: A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.
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公开(公告)号：US20240427250A1
公开(公告)日：2024-12-26
申请号：US18750169
申请日：2024-06-21
Applicant: SEMES CO., LTD.
Inventor： Jae Ho LEE , Jong Gu LEE , Dae Sung KIM , Jae Hyun LIM , Nak Hyun SONG
Abstract: Disclosed is an apparatus for treating a substrate, the apparatus including: a housing having an inner space; a plurality of outer cups arranged in a row in the inner space, each having a processing space; a spin chuck for supporting and rotating a substrate in each of the processing spaces; and a treatment solution nozzle provided in a plurality to correspond to the plurality of outer cups, respectively, and for supplying a treatment solution onto the substrate supported by the spin chuck, in which the outer cup includes a sidewall surrounding the spin chuck, the sidewall includes a first region and a second region located adjacent to each other along a circumferential direction thereof, and the outer cup includes a first protrusion installed in the first region while extending upwardly on a top end of the sidewall.
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公开(公告)号：US20240017284A1
公开(公告)日：2024-01-18
申请号：US18138038
申请日：2023-04-22
Applicant: SEMES CO., LTD.
Inventor： Dae Sung KIM , Jae Hyun LIM , Kyo Sang YOON , Ho Jin JANG , A Rah CHO
IPC: B05C9/08
CPC classification number: B05C9/08
Abstract: An apparatus for processing a substrate includes a processing vessel disposed in a process chamber and including a processing space in which a substrate is accommodated; a liquid supply line configured to process the substrate by supplying processing liquid to the substrate in the processing space; an exhaust line connected to the processing vessel and configured to exhaust gas in the processing space; a spraying portion disposed on the exhaust line and configured to spray cleaning liquid to remove contaminants accumulated in the exhaust line; and a washing liquid discharge line branched from the exhaust line and including a suction portion therein to suction cleaning liquid waste including contaminants removed from the exhaust line by the cleaning liquid and to discharge the cleaning liquid waste to the outside.
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10.发明公开公开(公告)号：US20230211612A1
公开(公告)日：2023-07-06
申请号：US18091187
申请日：2022-12-29
Applicant: SEMES CO., LTD.
Inventor： Dai Geon YOON , Soo Hong LEE , Dong Hwa LEE , Ji Hyeon KIM , Sang Hwa LEE , Dae Sung KIM
IPC: B41J2/175
CPC classification number: B41J2/17513 , G02B5/207
Abstract: Provided are an apparatus for providing a substrate processing liquid having an optimal structure in the correlation between securing internal agitation fluidity and recovery of sloshing, and a substrate processing system including the same. The apparatus for providing substrate processing liquid comprises a storage tank for storing substrate processing liquid, and a partition wall installed inside the storage tank and for dividing an internal space of the storage tank, wherein the apparatus is connected to a substrate processing apparatus for discharging the substrate processing liquid onto a substrate to provide the substrate processing liquid to the substrate processing apparatus, wherein the partition wall includes a plurality of holes formed passing through one surface and the other surface.
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