VIBRATION MEASUREMENT DEVICE
    12.
    发明申请

    公开(公告)号:US20210096085A1

    公开(公告)日:2021-04-01

    申请号:US17044571

    申请日:2018-12-13

    Abstract: A vibration measurement device 10 includes an excitation unit (signal generator 11 and vibrator 12) for exciting an elastic wave to an inspection target S, an illumination unit (wavelength stabilized laser beam source 13 and illumination light lens 14) for performing stroboscopic illumination to a measurement region of a surface of the inspection target S using a wavelength stabilized laser beam source 13, a displacement measurement unit (speckle-sharing interferometer 15) for collectively measuring a displacement of each point of the measurement region in the back-and-forth direction by speckle interferometry or speckle-sharing interferometer. By using the wavelength stabilized laser beam source 13, an interference image can be obtained even when the inspection target S has large surface irregularities.

    DEFECT INSPECTION APPARATUS
    13.
    发明申请

    公开(公告)号:US20210080399A1

    公开(公告)日:2021-03-18

    申请号:US16920148

    申请日:2020-07-02

    Abstract: A defect inspection apparatus generates a surface layer inspection image which is an image representing displacement of an inspection target in a measurement region based on an intensity pattern of interfered laser light. The defect inspection apparatus is configured to generate an appearance inspection image which is an image of an outer surface of the measurement region based on an intensity pattern of incoherent light.

    System and Method for Quantum Absorption Spectroscopy

    公开(公告)号:US20240319081A1

    公开(公告)日:2024-09-26

    申请号:US18607867

    申请日:2024-03-18

    CPC classification number: G01N21/31

    Abstract: The quantum optical system changes a phase of quantum interference occurring between a plurality of physical processes, in each of which a quantum entangled photon pair of a signal photon and an idler photon is generated. Each of a plurality of pixels outputs a detection signal of the signal photon in a state where a sample is arranged in an optical path of the idler photon. A processor calculates an absorption spectroscopy characteristic based on an interferogram indicating a variation in a signal intensity acquired from each of the plurality of pixels in accordance with the change in the phase of the quantum interference. The processor: applies a processing to reduce phase difference of the interferogram among the plurality of pixels; spatially integrates, over the plurality of pixels, the interferogram having gone through the processing to reduce phase differences; and calculates the absorption spectroscopy characteristic based on the integrated interferogram.

    DEFECT DETECTION DEVICE AND DEFECT DETECTION METHOD

    公开(公告)号:US20230236111A1

    公开(公告)日:2023-07-27

    申请号:US18077213

    申请日:2022-12-07

    CPC classification number: G01N21/1702 G01N21/88 G01N2021/1706

    Abstract: In a defect detection device (10), an input receiver (161) receives an input, by a user, of information concerning the kind and size of a defect expected to be present in or on a test object. An exciter (11, 12) induces an elastic wave in the test object, with the frequency of the elastic wave being variable. A measurer (15) optically measures a vibration state of the surface of the test object caused by the elastic wave. A wavelength determiner (164) determines the wavelength of the elastic wave induced in the test object, based on the vibration state obtained by the measurer. A frequency selector (165) selects an appropriate frequency from a plurality of frequencies, based on the kind and size of the expected defect as well as the wavelength acquired for each of the plurality of frequencies by the wavelength determiner by varying the frequency of the elastic wave.

    Defect Inspection Apparatus and Defect Inspection Method

    公开(公告)号:US20230085940A1

    公开(公告)日:2023-03-23

    申请号:US17793649

    申请日:2020-10-09

    Abstract: A defect inspection apparatus (100) is configured to approximate a difference value or an absolute value (Ia) of the difference value between a pixel value in at least three captured images (A) captured by an imager in at least three different phases of an elastic wave and a pixel value in a reference image (Aave) separate from the captured images (A) so as to acquire an approximate value for defect inspection corresponding to an amount of change in the pixel value in the captured images (A).

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