THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    12.
    发明申请
    THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME 审中-公开
    薄膜晶体管及其制造方法

    公开(公告)号:US20150084035A1

    公开(公告)日:2015-03-26

    申请号:US14261935

    申请日:2014-04-25

    Abstract: A thin film transistor includes: a substrate; an oxide semiconductor layer disposed on the substrate; a source electrode and a drain electrode each connected to the oxide semiconductor layer and facing each other with respect to the oxide semiconductor layer; an insulating layer disposed on the oxide semiconductor layer; and a gate electrode disposed on the insulating layer. The insulating layer includes a first layer that includes silicon oxide (SiOx), a second layer that is a hydrogen blocking layer, and a third layer that includes silicon nitride (SiNx). The first, second and third layers are sequentially stacked.

    Abstract translation: 薄膜晶体管包括:基板; 设置在所述基板上的氧化物半导体层; 源电极和漏电极,各自连接到氧化物半导体层并且相对于氧化物半导体层彼此面对; 设置在所述氧化物半导体层上的绝缘层; 以及设置在所述绝缘层上的栅电极。 绝缘层包括包含氧化硅(SiOx)的第一层,作为氢阻挡层的第二层和包括氮化硅(SiNx)的第三层。 顺序堆叠第一层,第二层和第三层。

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