DEPOSITION MASK AND DEPOSITION APPARATUS HAVING THE SAME
    14.
    发明申请
    DEPOSITION MASK AND DEPOSITION APPARATUS HAVING THE SAME 审中-公开
    沉积掩模和沉积装置

    公开(公告)号:US20140209025A1

    公开(公告)日:2014-07-31

    申请号:US14012917

    申请日:2013-08-28

    Inventor: Jeongwon HAN

    Abstract: A deposition apparatus includes a deposition chamber, a deposition source, and a deposition mask. The deposition source is disposed in the deposition chamber and provides a deposition material to a deposition substrate. The deposition mask includes a body portion and a carbon layer. The carbon layer is disposed on a first surface making contact with the deposition mask and includes at least one of carbon nanotube or graphene.

    Abstract translation: 沉积设备包括沉积室,沉积源和沉积掩模。 沉积源设置在沉积室中并将沉积材料提供给沉积基板。 沉积掩模包括主体部分和碳层。 碳层设置在与沉积掩模接触的第一表面上,并且包括碳纳米管或石墨烯中的至少一种。

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