公开(公告)号：US10964889B2

公开(公告)日：2021-03-30

申请号：US15671250

申请日：2017-08-08

Applicant: Samsung Display Co., Ltd.

Inventor： Dongseob Jeong

IPC: H01L51/00 ,  H01L21/67 ,  C23C14/04 ,  C23C16/04 ,  H01L21/3213 ,  H01L51/56 ,  B05C21/00

Abstract: A deposition mask includes a first area defining a clamping portion at ends of the deposition mask and to which a force is applied to extend the deposition mask in a length direction thereof, a recess area adjacent to the first area and defining a recess at the ends; and a pattern portion including a plurality of pattern holes through which a deposition material passes. Along the length direction, a plurality of first pattern portions are arranged in the first area and a plurality of second pattern portions arranged in the recess area. The force applied extends the first area and does not extend the recess area. The force not applied defines non-extended positions of the pattern portions, and for the non-extended positions of the first and second pattern portions, a first distance between adjacent first pattern portions is less than a second distance between adjacent second pattern portions.

公开(公告)号：US20180083192A1

公开(公告)日：2018-03-22

申请号：US15671250

申请日：2017-08-08

Applicant: Samsung Display Co., Ltd.

Inventor： Dongseob Jeong

IPC: H01L51/00 ,  H01L21/3213 ,  C23C14/04 ,  C23C16/04 ,  B05C21/00 ,  H01L51/56

CPC classification number: H01L51/0011 ,  B05C21/005 ,  C23C14/042 ,  C23C16/042 ,  H01L21/32139 ,  H01L21/67 ,  H01L51/0014 ,  H01L51/56

Abstract: A deposition mask includes a first area defining a clamping portion at ends of the deposition mask and to which a force is applied to extend the deposition mask in a length direction thereof, a recess area adjacent to the first area and defining a recess at the ends; and a pattern portion including a plurality of pattern holes through which a deposition material passes. Along the length direction, a plurality of first pattern portions are arranged in the first area and a plurality of second pattern portions arranged in the recess area. The force applied extends the first area and does not extend the recess area. The force not applied defines non-extended positions of the pattern portions, and for the non-extended positions of the first and second pattern portions, a first distance between adjacent first pattern portions is less than a second distance between adjacent second pattern portions.