摘要:
A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group, followed by loss of a proton from the secondary acid generator to form an unstable intermediate, which then fragments with loss of the second leaving group, accompanied by either (a) loss of a second proton; or (b) addition of a proton-containing nucleophile, followed by loss of a proton, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.
摘要:
Acid can be generated by exposing a superacid precursor to actinic radiation effective to generate superacid from the superacid precursor and heating the superacid in admixture with a secondary acid generator capable of undergoing thermal decomposition to produce a secondary acid. The superacid catalyzes decomposition of the secondary acid generator, thus increasing the quantity of strong acid present in the medium. The resultant secondary acid can be used to effect a color change in an acid-sensitive material, so providing an imaging process.
摘要:
There are described thermal imaging members and thermal imaging methods utilizing unsymmetrical rhodamine compounds. The rhodamine color-forming compounds exhibit a first color when in a crystalline form and a second color, different from the first color, when in an amorphous form.
摘要:
There are described novel rhodamine dye compounds and imaging members and imaging methods, including thermal imaging members and imaging methods, utilizing the compounds. The dye compounds exhibit a first color when in the crystalline form and a second color, different from the first color, when in the liquid, amorphous form.
摘要:
There are described novel rhodamine dye compounds and imaging members and imaging methods, including thermal imaging members and imaging methods, utilizing the compounds. The dye compounds exhibit a first color when in the crystalline form and a second color, different from the first color, when in the liquid, amorphous form.
摘要:
A self-developing diffusion transfer photographic film unit which includes a latent image which becomes visible upon photographic processing of the film unit. The latent image is formed with a chemical compound such as an indicator dye and the visible image formed from the latent image as a result of photographic processing may be transient or permanent. Also described are diffusion transfer photographic methods.
摘要:
Squarylium compounds of the formula: wherein Q1 and Q2 are each independently a pyrylium, thiopyrylium, selenopyrylium, benzpyrylium, benzthiopyrylium or benzselenopyrylium nucleus, and R1 and R2 are each independently an aliphatic or cycloaliphatic group, can be prepared by reacting a squaric acid derivative of the formula: with a compound of the formula Q2CH2R2 in the presence of a base. The derivatives of Formula II may be prepared by condensing a 2,3,4,4-tetrahalocyclobut-2-en-1-one with a compound of the formula Q1CH2R1 in the presence of a base to produce a compound of the formula: wherein Q1 and R1 are as defined above, and X represents chlorine or bromine, and hydrolyzing the compound of Formula III. Alternatively, the derivatives of Formula II may be prepared by reacting a diester, monoacid chloride monoester or diacid chloride of squaric acid with a compound of the formula Q1CH2R1 in the presence of a base, followed by hydrolysis of the resultant monoacid chloride or monoester derivative of the compound of Formula II to the parent compound.
摘要:
A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group to form a cation which electrophilically adds to an unsaturated reagent bearing a proton at the site of addition and a proton-containing nucleophilic grouping at an adjacent site, following which said proton on the reagent is lost and the second leaving group is displaced by said nucleophilic grouping, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.
摘要:
A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group to form a cation which electrophilically adds to an unsaturated reagent bearing a proton at the site of addition and a proton-containing nucleophilic grouping at an adjacent site, following which said proton on the reagent is lost and the second leaving group is displaced by said nucleophilic grouping, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.
摘要:
A process for generation of acid uses a medium comprising a first acid-generating component capable of generating a first acid, and a secondary acid generator, this secondary acid generator being capable of thermal decomposition to form a secondary acid, the thermal decomposition of the secondary acid generator being catalyzed by the first acid. At least part of the medium is exposed to so as to cause formation of the first acid from the first acid-generating component; and the medium is then heated to cause, in the exposed part of the medium, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The secondary acid generator has a first site bearing a first leaving group and a second site bearing a second leaving group, the first leaving group being capable of protonation by the first acid, with expulsion of the first leaving group to form a cation which electrophilically adds to an unsaturated reagent bearing a proton at the site of addition and a proton-containing nucleophilic grouping at an adjacent site, following which said proton on the reagent is lost and the second leaving group is displaced by said nucleophilic grouping, the second leaving group, in combination with a proton, forming the secondary acid. Preferred variants of the process are of the types described in U.S. Pat. Nos. 5,286,612; 5,334,489; 5,395,736; 5,441,850 and 5,453,345.