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14 条记录 (耗时 0.032 秒)

    Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
    7.
    发明授权
    Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates 失效
    用于平版印刷版的低挥发性取代的2-苯基-4,6-双（卤代甲基）-1,3,5-三嗪

    公开(公告)号：US5561029A

    公开(公告)日：1996-10-01

    申请号：US430461

    申请日：1995-04-28

    申请人： Maurice J. Fitzgerald ,  Frederick R. Kearney ,  Rong-Chang Liang ,  William C. Schwarzel ,  Donna J. Guarrera ,  John M. Hardin ,  John C. Warner

    发明人： Maurice J. Fitzgerald ,  Frederick R. Kearney ,  Rong-Chang Liang ,  William C. Schwarzel ,  Donna J. Guarrera ,  John M. Hardin ,  John C. Warner

    IPC分类号： C08F2/44 ,  C08F2/50 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031

    CPC分类号： G03F7/0295 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/127

    摘要： The present invention sets forth the incorporation of a substituted 2-phenyl-4,6-bis (trichloromethyl)-1,3,5-triazine in photoresists of lithographic printing plates for the purpose of promoting their shelf-life, room light stability, and developability. The present invention provides a photocurable composition comprising at least a photopolymerizable ethylenically unsaturated monomer having at least one terminal ethylenic group and capable of forming a polymer upon exposure to actinic radiation; and an s-triazine capable of initiating free radical polymerization of the photopolymerizable ethylenically unsaturated monomer and being represented by the following general formula [I]: ##STR1## wherein R.sub.1 is either OR.sub.4 or NR.sub.5 R.sub.6, wherein R.sub.5 and R.sub.6 may or may not be identical with each other, either R.sub.5 or R.sub.6 may represent hydrogen, and wherein R.sub.4 and at least one of R.sub.5 and R.sub.6 represent a ballast group capable of preventing the substantial volatilization of the s-triazine from the photoresist composition, the ballast group being a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, the substituted or unsubstituted alkyl group having at least 4 carbon atoms, the substituted or unsubstituted aryl group having at least 6 carbon atoms; R.sub.2 and R.sub.3 may or may not be identical with each other and each represent hydrogen, halogen, phenyl, a substituted or unsubstituted alkyl group, or an alkoxyl group; X and Y may or may not be identical with each other and each represent chlorine or bromine; and m and n may or may not be identical with each other and are each an integer of 0, 1, or 2. Desirable compositions will further comprise at least one photooxidizable leuco triarylmethane dye.

    摘要翻译： 本发明阐述了取代的2-苯基-4,6-双（三氯甲基）-1,3,5-三嗪在平版印刷版的光致抗蚀剂中的引入，以促进其保质期，室内光稳定性， 和可开发性。 本发明提供一种可光固化组合物，其包含至少一种具有至少一个末端烯属基并可在暴露于光化辐射时形成聚合物的可光聚合的烯属不饱和单体; 和能够引发可光聚合的烯键式不饱和单体的自由基聚合并由以下通式[I]表示的均三嗪：其中R 5或R 6可以彼此相同或不同，R 5或R 6可以 表示氢，并且其中R 4和R 5和R 6中的至少一个表示能够防止光刻胶组合物中s-三嗪显着挥发的压载基团，该镇流基为取代或未取代的烷基，或取代或未取代的 具有至少4个碳原子的取代或未取代的烷基，取代或未取代的具有至少6个碳原子的芳基; R 2和R 3可以彼此相同或不同，分别代表氢，卤素，苯基，取代或未取代的烷基或烷氧基; X和Y可以相同也可以不相同，分别表示氯或溴; 并且m和n可以彼此相同也可以不相同，并且各自为0,1或2的整数。期望的组合物还将包含至少一种可光氧化的无色三芳基甲烷染料。

    On-press developable lithographic printing plate precursor
    8.
    发明授权
    On-press developable lithographic printing plate precursor 失效
    印刷机上可印刷的平版印刷版前体

    公开(公告)号：US5620827A

    公开(公告)日：1997-04-15

    申请号：US469475

    申请日：1995-06-06

    申请人： Chieh-Min Cheng ,  Anthony C. Giudice ,  John M. Hardin ,  Rong-Chang Liang ,  Leonard C. Wan

    发明人： Chieh-Min Cheng ,  Anthony C. Giudice ,  John M. Hardin ,  Rong-Chang Liang ,  Leonard C. Wan

    IPC分类号： G03F7/004 ,  B41C1/10 ,  B41N1/14 ,  G03F7/00 ,  G03F7/36 ,  G03C1/72

    CPC分类号： G03F7/36 ,  G03F7/002 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24

    摘要： A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.

    摘要翻译： 用于印刷机的平版印刷版原版在曝光于光化辐射之后具有极少的或没有额外的处理，包括印版基板，能够成像光降解或光硬化的聚合抗蚀剂层，以及能够覆盖的多个微囊化显影剂 从而促进从聚合物抗蚀剂的暴露或未曝光区域的洗涤。 微囊化的显影剂可以整合到聚合物抗蚀剂层中，或者可以形成沉积在聚合物抗蚀剂层顶上的单独的层，或者可以涂覆到能够与常规印刷版面对面接触的单独的片材载体上。