Abstract:
An image color adjusting method and an electronic device thereof are provided. The image color adjusting method includes following steps: obtaining multiple groups of first pixel data of an image in a first color space, and performing a color space transforming process for the first pixel data to obtain multiple groups of second pixel data of the image in a CIELAB color space, wherein each of the second pixel data includes a luminance component L*, a first color component a* and a second color component b*; adjusting the first color component and the second color component of the second pixel data to obtain multiple groups of third pixel data, and performing a color space transforming process for the third pixel data to obtain multiple groups of fourth pixel data corresponding to the third pixel data in the first color space.
Abstract:
Provided is a repair machine based glass substrate re-marking method, including (1) providing a repair machine and a digital micro-mirror device, in which the repair machine includes a main body, a carrier panel, a control unit, a storage unit, and a laser head; (2) mounting the digital micro-mirror device to the laser head and electrically connecting the digital micro-mirror device to the control unit; (3) placing a glass substrate to be marked on the carrier panel, the glass substrate having a photo-resist layer; (4) operating the control unit to retrieve a corresponding template pattern document from the storage unit and transmitting a template pattern signal of the template pattern document to the digital micro-mirror device; and (5) operating the laser head to emit a laser beam, which is projected by the digital micro-mirror device to the glass substrate to effect exposure of the photo-resist layer on the glass substrate.
Abstract:
A system and method for measuring the thickness of an ultra-thin multi-layer film on a substrate is disclosed. A physical model of an ultra-thin multilayer structure and Auger electron emission from the nano-multilayer structure is built. A mathematical model for the Auger Electron Spectroscopy (AES) measurement of the multilayer thin film thickness is derived according to the physical model. Auger electron spectroscopy (AES) is first performed on a series of calibration samples. The results are entered into the mathematical model to determine the parameters in the mathematical equation. The parameters may be calibrated by the correlation measurements of the alternate techniques. AES analysis is performed on the ultra-thin multi-layer film structure. The results are entered into the mathematical model and the thickness is calculated.