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11.发明授权Method for manufacturing magnetic recording medium and magnetic recording medium 失效磁记录介质和磁记录介质的制造方法公开(公告)号：US08475949B2
公开(公告)日：2013-07-02
申请号：US13236726
申请日：2011-09-20
IPC分类号： G11B5/66
摘要： A magnetic recording medium is presented that includes protruded magnetic patterns formed on a substrate, and a nonmagnetic material filled in recesses between the magnetic patterns in which an oxygen concentration thereof is higher at a surface side than at a substrate side. The nonmagnetic material is at least one selected from the group consisting of Si, SiC, SiC—C, SiOC, SiON, Si3N4, Al, AlxOy, Ti and TiOx.
摘要翻译： 提出了一种磁记录介质，其包括形成在基板上的突出的磁图案，以及填充在表面侧的氧浓度高于基板侧的磁性图案之间的凹部中的非磁性材料。 非磁性材料是选自Si，SiC，SiC-C，SiOC，SiON，Si 3 N 4，Al，Al x O y，Ti和TiO x中的至少一种。
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公开(公告)号：US08012361B2
公开(公告)日：2011-09-06
申请号：US12705421
申请日：2010-02-12
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，去除残留在第一硬掩模的突起上的第二硬掩模，以及通过离子束照射去除在凹部中暴露的磁记录层。
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公开(公告)号：US08002997B2
公开(公告)日：2011-08-23
申请号：US12544606
申请日：2009-08-20
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
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14.发明申请Patterned media and method of manufacturing the same, and magnetic recording apparatus 有权图案化介质及其制造方法，以及磁记录装置公开(公告)号：US20100302679A1
公开(公告)日：2010-12-02
申请号：US12805471
申请日：2010-08-02
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/59655 , G11B5/743 , G11B5/855
摘要： A patterned media has a substrate, and a magnetic recording layer on the substrate including protruded magnetic patterns and a nonmagnetic material filled in between the protruded magnetic patterns. In the patterned media, a depth Db and a depth Da, which are defined that Db is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a first central part between the magnetic patterns adjacent to each other in a cross-track direction or a down-track direction, and Da is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a second central part in a portion surrounded by the magnetic patterns, have a relationship that the depth Da is greater than the depth Db.
摘要翻译： 图案化介质具有基板，并且在基板上的磁记录层包括突出的磁图案和填充在突出磁图案之间的非磁性材料。 在图案化介质中，深度Db和深度Da被定义为Db是从磁图案的表面到填充在彼此相邻的磁图案之间的第一中心部分的非磁性材料的表面的深度 交叉轨道方向或向下轨道方向，并且Da是从磁图案的表面到填充在由磁图案包围的部分中的第二中心部分中的非磁性材料的表面的深度，具有如下关系： 深度Da大于深度Db。
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公开(公告)号：US20100214695A1
公开(公告)日：2010-08-26
申请号：US12705490
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 通过第一蚀刻气体去除残留在图案化抗蚀剂的凹部中的残留物，利用第一蚀刻气体，使用图案化抗蚀剂作为掩模蚀刻第二硬掩模，以将图案转移到第二硬掩模，蚀刻第一 通过不同于使用第二硬掩模的第一蚀刻气体作为掩模的第二蚀刻气体将硬掩模转印到第一硬掩模，并且执行离子束蚀刻以使暴露在凹部中的磁记录层失活 并移除第二个硬掩模。
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公开(公告)号：US20090202865A1
公开(公告)日：2009-08-13
申请号：US12431671
申请日：2009-04-28
CPC分类号： G11B5/855
摘要： According to one embodiment, a magnetic recording medium includes magnetic patterns made of a ferromagnetic recording layer containing Co, and a nonmagnetic layer which separates the magnetic patterns and has a lower Co concentration than the magnetic patterns.
摘要翻译： 根据一个实施例，磁记录介质包括由包含Co的铁磁记录层制成的磁图案和分离磁图案并且具有比磁图案低的Co浓度的非磁性层。
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公开(公告)号：US20090166323A1
公开(公告)日：2009-07-02
申请号：US12400288
申请日：2009-03-09
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes depositing a magnetic recording layer and a sacrifice layer on a substrate, patterning the sacrifice layer and magnetic recording layer to form protruded magnetic patterns and sacrifice patterns, depositing a nonmagnetic material in recesses between the magnetic patterns and sacrifice patterns and on the sacrifice patterns, and etching back the nonmagnetic material.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在基片上沉积磁记录层和牺牲层，图案化牺牲层和磁记录层以形成突出的磁图并牺牲图案，将非磁性材料沉积在凹陷中 在磁图案和牺牲图案之间以及牺牲图案上，并且蚀刻非磁性材料。
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18.发明申请公开(公告)号：US20090162704A1
公开(公告)日：2009-06-25
申请号：US12400224
申请日：2009-03-09
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming protruded magnetic patterns on a substrate, depositing a nonmagnetic material in recesses between the magnetic patterns and on the magnetic patterns, and etching back the nonmagnetic material using an oxygen-containing etching gas while reforming a surface of the nonmagnetic material.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在基片上形成突出的磁图案，在非磁性材料之间的磁性图案之间的凹槽中和非磁性材料上沉积非磁性材料，并使用含氧蚀刻 气体同时重整非磁性材料的表面。
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19.发明申请Substrate for magnetic recording medium, magnetic recording medium, and magnetic recording apparatus 有权用于磁记录介质的基板，磁记录介质和磁记录装置公开(公告)号：US20070053107A1
公开(公告)日：2007-03-08
申请号：US11397892
申请日：2006-04-05
申请人： Kaori Kimura , Masatoshi Sakurai , Akira Kikitsu , Yoshiyuki Kamata , Satoshi Shirotori , Hiroyuki Hieda
发明人： Kaori Kimura , Masatoshi Sakurai , Akira Kikitsu , Yoshiyuki Kamata , Satoshi Shirotori , Hiroyuki Hieda
IPC分类号： G11B5/82
摘要： It is possible to improve the recording and reproducing S/N ratio, the reproduction signal intensity, and the degree of high density recording. There are provided a plurality of recording tracks formed on a substrate, each recording track being formed of a magnetic material, and non-recording sections formed on the substrate, each non-recording section separating adjacent recording tracks, each recording track including a plurality of recording sections and connecting sections for connecting the recording sections adjacent thereto in a track longitudinal direction, and each connecting section having a cross-sectional area in a track width direction that is smaller than a cross-sectional area in a track width direction of adjacent recording sections.
摘要翻译： 可以改善记录和再现S / N比，再现信号强度和高密度记录程度。 提供了形成在基板上的多个记录轨道，每个记录磁道由磁性材料形成，而非记录部分形成在基板上，每个非记录部分分隔相邻的记录磁道，每个记录磁道包括多个 记录部分和连接部分，用于在轨道纵向方向上连接与其相邻的记录部分，并且每个连接部分在轨道宽度方向上的横截面积小于相邻记录的轨道宽度方向上的横截面积 部分。
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公开(公告)号：US20120251655A1
公开(公告)日：2012-10-04
申请号：US13492681
申请日：2012-06-08
IPC分类号： B29C59/02
CPC分类号： G11B7/261 , B29C33/424 , B29C2033/426 , B82Y10/00 , B82Y40/00 , C25D1/10 , G03F7/0002 , G11B7/263 , H01F41/34
摘要： According to one embodiment, a stamper is described with a surface that comprises patterns of protrusions and recessed. The arithmetic average roughness Ra of the surface is 1 nanometer (nm) or more and 5 nm or less.
摘要翻译： 根据一个实施例，用包括突起图案和凹陷的表面描述压模。 表面的算术平均粗糙度Ra为1nm以上且5nm以下。
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