-
公开(公告)号：US20190249320A1
公开(公告)日：2019-08-15
申请号：US16329418
申请日：2017-08-07
Applicant: THINK LABORATORY CO., LTD.
Inventor： Tatsuo SHIGETA
CPC classification number: C25D1/08 , B01D39/10 , B01D2239/10 , C25D1/10 , G02B5/20
Abstract: Provided are a method of producing a mesh filter, which is capable of forming more minute holes than by punching processing, and which makes it possible, by forming meshes of different openings on the same base material, to appropriately change a flow rate or a light amount with the various opening sizes, and a mesh filter.The method of producing a mesh filter includes a step of producing a mesh filter by continuously plating a platable metal using a roll with a DLC pattern, wherein a mesh filter-shaped resist pattern is obtained by forming multiple mesh filter-shaped resist patterns of different openings on the same cylindrical metal base material.
-
公开(公告)号：US20180311877A1
公开(公告)日：2018-11-01
申请号：US15772042
申请日：2016-10-27
Inventor： Mohamed Sultan Mohiddin SAIFULLAH , Siew Ling Karen CHONG , Yee Chong LOKE , Alvin CHENG , Nicholas LEONG
CPC classification number: B29C45/37 , B81C99/009 , B81C2201/0153 , B82Y40/00 , C23C14/14 , C23C14/34 , C25D1/10 , G03F7/0002
Abstract: An injection mold insert with hierarchical structures and a method for method of making such injection mold inserts are provided. The method includes imprinting a primary imprint structure on an article and imprinting a secondary imprint structure on the primary imprint structure on the article. The secondary imprint structure includes a plurality of shapes, each of the plurality of shapes being substantially smaller than shapes of the primary imprint structure. The method further includes bonding the article to a substrate, sputter-coating the article with a metal film as an electroforming seed layer, and electroforming the injection mold insert over the article. Finally, the method includes dissolving the article to define the injection mold insert having a negative replica of the primary and secondary imprint structures.
-
公开(公告)号：US20180154556A1
公开(公告)日：2018-06-07
申请号：US15881936
申请日：2018-01-29
Applicant: NALUX CO., LTD.
Inventor： Kazuya YAMAMOTO , Takeshi YAMAMOTO
CPC classification number: B29C33/3842 , B29C33/42 , B29C33/424 , B29K2905/08 , C25D1/10 , C25D3/12 , G02B1/118 , G02B5/0221 , G02B5/0268 , G02B5/0294 , H01J37/32412 , H01J2237/334
Abstract: A method for manufacturing a mold according to the first aspect of the present invention includes the steps of: placing a base material of semiconductor or metal that reacts with sulfur hexafluoride in a reactive ion etching apparatus; supplying a mixed gas of sulfur hexafluoride and oxygen thereto; making the base material undergo a plasma dry-etching process such that oxides are scattered on a surface of the base material, etching advances on the surface of the base material while the oxides function as etching masks, and thereby a fine surface roughness is formed on the surface of the base material; and irradiating the fine surface roughness with an ion beam such that shapes of protrusions of the fine surface roughness can be adjusted.
-
公开(公告)号：US09972810B2
公开(公告)日：2018-05-15
申请号：US15196055
申请日：2016-06-29
Applicant: Samsung Display Co., Ltd.
Inventor： Youngmin Moon , Sungsoon Im , Kyuhwan Hwang , Minho Moon
IPC: H01L21/00 , H01L51/56 , B23K26/382 , C25D1/10 , C25D1/20 , G03F7/20 , H01L51/00 , B23K101/36
CPC classification number: H01L51/56 , B23K26/382 , B23K2101/36 , C25D1/08 , C25D1/10 , C25D1/20 , C25D3/562 , G03F7/20 , H01L27/3244 , H01L51/0011 , H01L2227/323
Abstract: A method of manufacturing a mask assembly includes forming, via an electroforming process, a base material including at least one opening on an electrode plate; and reprocessing the at least one opening using a laser to form at least one reprocessed opening.
-
5.发明授权公开(公告)号：US09845543B2
公开(公告)日：2017-12-19
申请号：US14582678
申请日：2014-12-24
Applicant: EMOT CO., LTD.
Inventor： Kyung Wook Lee , Kyung Yul Lee , Jun Sang Jeong
CPC classification number: C25D1/10 , B23P15/24 , B29C33/3857 , C23C18/1657 , C25D1/006
Abstract: According to an embodiment of the present invention, a method for producing a duplicate of a nano-pattern texture of a surface of an object through electroforming using an imprint mold comprises selecting the object having the nano-pattern texture, disposing the selected object and pretreating a surface of the object by washing, drying and then forming a nano-thin film thereto to block transfer of impurities, metallizing a surface of the plastic mold through, e.g., vapor deposition, spraying, and wet silver mirror reaction, and performing a first electroforming of the surface of the plastic mold, and repeating to thus manufacture a plurality of metal module master molds.
-
Patent Agency Ranking
公开(公告)号：US09718267B2
公开(公告)日：2017-08-01
申请号：US14377739
申请日：2013-02-08
Applicant: Photo Stencil, LLC
Inventor： William E. Coleman , Brad Keiser
CPC classification number: B41F15/34 , B41C1/14 , B41F15/00 , B41N1/24 , C25D1/10 , H01L31/022425 , Y02E10/50
Abstract: A method is disclosed for electroforming metal screen. The method deposits photoresist over a mandrel, and then exposes the photoresist with light through a plurality of openings in a photo tool to form hardened resist pillars. Unexposed photoresist is removed without affecting the resist pillars. The method then electroforms the metal screen in areas free of the hardened resist pillars such that the metal screen forms apertures defined by each of the resist pillars, a space between at least two of the resist pillars defining a support bar that forms at a reduced thickness as compared to portions of the metal screen that are not between the resist pillars. Finally, the method detaches the metal screen from the mandrel.
-
公开(公告)号：US20170162833A1
公开(公告)日：2017-06-08
申请号：US15196055
申请日：2016-06-29
Applicant: Samsung Display Co., Ltd.
Inventor： Youngmin MOON , Sungsoon IM , Kyuhwan HWANG , Minho MOON
CPC classification number: H01L51/56 , B23K26/382 , B23K2101/36 , C25D1/08 , C25D1/10 , C25D1/20 , C25D3/562 , G03F7/20 , H01L27/3244 , H01L51/0011 , H01L2227/323
Abstract: A method of manufacturing a mask assembly includes forming, via an electroforming process, a base material including at least one opening on an electrode plate; and reprocessing the at least one opening using a laser to form at least one reprocessed opening.
-
公开(公告)号：US20170106567A1
公开(公告)日：2017-04-20
申请号：US15265727
申请日：2016-09-14
Applicant: KTX CORPORATION
Inventor： Katsuya SATO
CPC classification number: B29C33/04 , B29C33/0083 , B29C33/3842 , B29C33/56 , B29C45/7312 , B29C2045/7325 , B29K2905/00 , B29K2995/0005 , C25D1/00 , C25D1/02 , C25D1/08 , C25D1/10 , C25D7/04
Abstract: A mold includes a mold body, a porous conductive sheet and an electroformed metal. The porous conductive sheet is placed on a back surface of the mold body, has a plurality of through holes, and is conductive at least at its surface. The electroformed metal is electrodeposited on the back surface of the mold body and on the porous conductive sheet so as to fill and close the through holes of the porous conductive sheet. In the mold, an inner surface of the electroformed metal forms at least a part of an inner surface of a fluid passage through which fluid for temperature control flows.
-
公开(公告)号：US20170029969A1
公开(公告)日：2017-02-02
申请号：US15200647
申请日：2016-07-01
Inventor： Jinsoo Joo , Young Ki Hong
Abstract: Disclosed is a method for manufacturing anodic metal-oxide nanoporous templates with high-yield and in an environmentally-friendly manner. The method includes anodizing a metal specimen and detaching nanoporous anodic oxide layers, which are formed on more than one surface of the metal specimen due to the anodizing, from the metal specimen, wherein the detaching of the nanoporous anodic oxide layers from the metal specimen includes applying a reverse bias to the metal specimen in the same acidic electrolyte used for anodization.
Abstract translation: 公开了一种以高产率和环保的方式制造阳极金属氧化物纳米多孔模板的方法。 该方法包括阳极氧化金属样品并从金属样品分离形成在金属样品的多于一个表面上的纳米多孔阳极氧化层，其中纳米多孔阳极氧化层从金属试样中分离包括 在用于阳极氧化的相同酸性电解质中对金属样品施加反向偏压。
-
公开(公告)号：US09441309B2
公开(公告)日：2016-09-13
申请号：US14135745
申请日：2013-12-20
Inventor： Mikael Fredenberg , Patrik Möller , Peter Wiwen-Nilsson , Cecilia Aronsson , Matteo Dainese
IPC: C25D1/00 , C25D1/10 , C25D5/02 , B81C99/00 , C25D5/10 , C25F3/14 , H01L21/288 , H01L21/3213 , H01L21/768 , H05K3/07 , H05K3/24 , H05K3/46 , C23C14/34 , C25D5/50 , C25D7/12 , H05K3/10
CPC classification number: C25D5/02 , B81C99/0085 , C23C14/34 , C23C14/3414 , C25D1/003 , C25D1/10 , C25D5/022 , C25D5/10 , C25D5/50 , C25D7/12 , C25D7/123 , C25F3/14 , H01L21/2885 , H01L21/32134 , H01L21/76838 , H01L21/76843 , H01L21/76852 , H01L21/76873 , H01L21/76877 , H01L21/76885 , H05K3/07 , H05K3/108 , H05K3/241 , H05K3/4647 , H05K2203/0117 , H05K2203/0733 , Y10T156/10
Abstract: An electrode for forming an electrochemical cell with a substrate and a method of forming said electrode. The electrode comprises a carrier provided with an insulating layer which is patterned at a front side. Conducting material in an electrode layer is applied in the cavities of the patterned insulating layer and in contact with the carrier. A connection layer is applied at the backside of the carrier and in contact with the carrier. The periphery of the electrode is covered by the insulating material.
-
-
-
-
-
-
-
-
-
Search Results
629
records
(took 0.024 seconds)
