公开(公告)号：US20110159318A1

公开(公告)日：2011-06-30

申请号：US12959726

申请日：2010-12-03

Applicant: Jun ENDO ,  Tetsuya Nakashima

Inventor： Jun ENDO ,  Tetsuya Nakashima

IPC: G11B5/735

CPC classification number: G11B5/7315 ,  C03B17/064 ,  C03B18/02 ,  C03B21/02 ,  C03B23/023 ,  C03C3/087 ,  C03C3/093 ,  C03C3/11

Abstract: A glass substrate for an information recording medium, comprising an alkali aluminosilicate glass, wherein the β—OH value is at least 0.20 mm−1.

Abstract translation: 一种用于信息记录介质的玻璃基板，包括碱铝硅酸盐玻璃，其中所述的-OH值为至少0.20mm-1。

公开(公告)号：US20110008649A1

公开(公告)日：2011-01-13

申请号：US12833410

申请日：2010-07-09

Applicant: Masahiko TAMURA ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

Inventor： Masahiko TAMURA ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

IPC: G11B5/73 ,  B24B7/24 ,  B24B1/00 ,  G11B5/84

CPC classification number: G11B5/8404 ,  B24B37/042 ,  B24B37/08 ,  C03C19/00 ,  G11B5/7315

Abstract: The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.

Abstract translation: 本发明涉及一种用于信息记录介质的玻璃基板的制造方法，该方法包括：研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤，用含有氧化铈磨料的浆料研磨圆形玻璃板，其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异（SiO 2 -Al 2 O 3）为62％ 摩尔或更少; 该方法还包括：随后的氧化铈抛光步骤，用硫酸浓度为20质量％以上且80质量％以下的清洗液清洗圆形玻璃板的清洗工序， 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量％以上且10质量％以下，在清洗工序后，对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。

公开(公告)号：US20100255350A1

公开(公告)日：2010-10-07

申请号：US12724570

申请日：2010-03-16

Applicant: Jun ENDO ,  Tatsuo Nagashima ,  Tetsuya Nakashima ,  Manuel Diaz Reyes

Inventor： Jun ENDO ,  Tatsuo Nagashima ,  Tetsuya Nakashima ,  Manuel Diaz Reyes

IPC: G11B5/73 ,  C03C3/085 ,  C03C3/087

CPC classification number: G11B5/7315 ,  C03C3/085 ,  C03C3/087

Abstract: To provide glass for an information recording medium substrate, which is excellent in the acid resistance and weather resistance.Glass for an information recording medium substrate, which comprises, as represented by mol % based on the following oxides, from 61 to 72% of SiO2, from 3 to 12% of Al2O3, from 0 to 14.3 of Li2O, from 0 to 22% of Na2O, from 0 to 22% of K2O, from 4 to 13% of MgO, from 0 to 6% of TiO2 and from 0 to 5% of ZrO2, provided that the total content of Li2O, Na2O and K2O (R2O) is from 8 to 22%, the ratio of the content of Li2O to R2O (Li2O/R2O) is at most 0.52, the ratio of the content of Na2O to R2O (Na2O/R2O) is at least 0.35, or the ratio of the content of K2O to R2O (K2O/R2O) is at least 0.45.

Abstract translation: 提供耐酸性和耐候性优异的信息记录介质基板用玻璃。 用于信息记录介质基板的玻璃，其以以下氧化物的摩尔％表示，SiO 2为61〜72％，Al 2 O 3为12〜12，Li 2 O 0〜14.3，0〜22重量％ 的Na2O，0〜22％的K2O，4〜13％的MgO，0〜6％的TiO2和0〜5％的ZrO2，条件是Li2O，Na2O和K2O（R2O）的总含量为 8〜22％，Li 2 O与R 2 O（Li 2 O / R 2 O）的含量比例为0.52以下，Na2O与R2O的含量比（Na2O / R2O）为0.35以上， 的K2O至R2O（K2O / R2O）为至少0.45。

公开(公告)号：US20100137122A1

公开(公告)日：2010-06-03

申请号：US12699944

申请日：2010-02-04

Applicant: Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda

Inventor： Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda

IPC: C03C3/087 ,  C03B18/02

CPC classification number: H01J5/04 ,  C03C3/087 ,  H01J2217/49264

Abstract: A glass composition for substrates excellent in productivity is provided by lowering the high temperature viscosity while securing characteristics and quality required for FPD substrates, particularly for PDP substrates. A glass composition for substrates, which is characterized by comprising, as represented by mass% based on oxides, from 55 to 75% of SiO2, from 5 to 15% of Al2O3, from 4 to 18% of MgO, from 3 to 12% of CaO, from 4 to 18% of SrO, from 0 to 20% of BaO, from 6 to 20% of Na2O+K2O, from 0.5 to 6% of ZrO2 and from 18 to 25% of MgO+CaO+SrO+BaO, as a glass matrix composition, and containing from 0.001 to 0.6% of SO3, and which is further characterized in that when the viscosity is represented by q, the temperature satisfying logη=2 is at most 1,545° C. and the devitrification temperature is at most the temperature satisfying logη=4, the thermal expansion coefficient is from 75×10−7 to 90×10−7/° C., the specific gravity is at most 2.8, and the glass transition point is at least 600° C.

Abstract translation: 通过在确保FPD基板，特别是对于PDP基板所需的特性和质量的同时降低高温粘度来提供生产率优异的基板用玻璃组合物。 一种基材用玻璃组合物，其特征在于，以质量％为基准，以氧化物计，55〜75％的SiO 2，5〜15％的Al 2 O 3，4〜18％的MgO，3〜12％ 的CaO，4〜18％的SrO，0〜20％的BaO，6〜20％的Na 2 O + K 2 O，0.5〜6％的ZrO 2和18〜25％的MgO + CaO + SrO + BaO 作为玻璃基质组合物，含有0.001〜0.6％的SO 3，其特征还在于当粘度由q表示时，满足log＆eggr = 2的温度为至多1,545℃，失透温度 至多满足log＆eegr = 4，热膨胀系数为75×10-7〜90×10-7 /℃，比重为2.8以下，玻璃化转变点为600以上 C。

公开(公告)号：US06940220B2

公开(公告)日：2005-09-06

申请号：US10756508

申请日：2004-01-14

Applicant: Tetsuya Nakashima ,  Kei Maeda

Inventor： Tetsuya Nakashima ,  Kei Maeda

IPC: C03C3/062 ,  C03C8/02 ,  H01J9/24 ,  H01J29/86 ,  H01J1/62 ,  C03C3/076 ,  C03C3/078 ,  C03C3/095

CPC classification number: C03C8/02 ,  C03C3/062 ,  H01J9/242 ,  H01J29/864 ,  H01J2329/864

Abstract: Glass comprises essentially 20-70% SiO2, 10-50% TiO2+Nb2O5+SnO2+Ta2O5+WO3+CeO2, 0-50% MgO+CaO+SrO+BaO+ZnO, and 0-30% B2O3+Al2O3, in molar percentage terms based on the oxides; and has a resistivity of at most 1015 Ω·cm at 20° C. A method for production of glass is to produce the glass under such a condition that a redox represented by [Fe2+]/([Fe2+]+[Fe3+]) where Fe is present in the glass, is at least 0.6.

Abstract translation: 玻璃包含基本上为20-70％的SiO 2，10-50％TiO 2 + Nb 2 O 5+ + 2 O + 2 + O 2 + O 3 + C 2 O 2，O 0 -50％MgO + CaO + SrO + BaO + ZnO和0-30％B 2 O 3 + 3 + 2 O 2 3摩尔百分数，基于氧化物; 并且在20℃下具有至多10±15cm的电阻率。玻璃的制造方法是在这样的条件下制造玻璃，即由[Fe 2+ +（Fe 2+ + + Fe 3+）]其中Fe存在于玻璃中的至少为0.6。

公开(公告)号：US06297182B1

公开(公告)日：2001-10-02

申请号：US09358421

申请日：1999-07-22

Applicant: Kei Maeda ,  Seiki Ohara ,  Tetsuya Nakashima ,  Yasumasa Nakao

Inventor： Kei Maeda ,  Seiki Ohara ,  Tetsuya Nakashima ,  Yasumasa Nakao

IPC: C03C3091

CPC classification number: C03C3/091 ,  C03C3/093

Abstract: A glass for a substrate consisting essentially of: SiO2 45 to 65 wt %, Al2O3 6 to 20 wt %, B2O3 0.5 to 6 wt %, MgO 2 to 5 wt %, CaO 1 to 10 wt %, SrO 0 to 6.5 wt %, BaO 0 to 2 wt %, MgO + CaO + SrO + BaO 10 to 17 wt %, ZrO2 0 to 7 wt %, and Na2O + K2O 7 to 15 wt %.

Abstract translation: 用于基材组成的基材的玻璃

公开(公告)号：US08563149B2

公开(公告)日：2013-10-22

申请号：US12716467

申请日：2010-03-03

Applicant: Tatsuo Nagashima ,  Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda

Inventor： Tatsuo Nagashima ,  Kensuke Nagai ,  Tetsuya Nakashima ,  Kei Maeda

IPC: G11B5/706 ,  C03C3/23

CPC classification number: G11B5/7315 ,  C03C3/095

Abstract: To provide glass for a data storage medium substrate, whereby high heat resistance can be obtained.Glass for a data storage medium substrate, which comprises, as represented by mol percentage based on the following oxides, from 55 to 70% of SiO2, from 2.5 to 9% of Al2O3, from 0 to 10% of MgO, from 0 to 7% of CaO, from 0.5 to 10% of SrO, from 0 to 12.5% of BaO, from 0 to 2.5% of TiO2, from 0.5 to 3.7% of ZrO2, from 0 to 2.5% of Li2O, from 0 to 8% of Na2O, from 2 to 8% of K2O and from 0.5 to 5% of La2O3, provided that the total content of Al2O3 and ZrO2 (Al2O3+ZrO2) is at most 12%, and the total content of Li2O, Na2O and K2O (R2O) is at most 12%.

Abstract translation: 为了提供用于数据存储介质基板的玻璃，由此可以获得高耐热性。 用于数据存储介质衬底的玻璃，其以由以下氧化物的摩尔百分数表示的SiO 2为55至70％，Al 2 O 3为2.5至9％，MgO为0至10％，0至7 CaO的0.5〜10％，BaO 0〜12.5％，TiO 2 0〜2.5％，ZrO 2 0.5〜3.7％，Li 2 O 2〜2.5％，Li 2 O 0〜8％ Na 2 O，2〜8％的K 2 O和0.5〜5％的La 2 O 3，条件是Al 2 O 3和ZrO 2（Al 2 O 3 + ZrO 2）的总含量至多为12％，Li 2 O，Na 2 O和K 2 O（R 2 O）的总含量 ）至多12％。

公开(公告)号：US20130011650A1

公开(公告)日：2013-01-10

申请号：US13619290

申请日：2012-09-14

Applicant: Shusaku Akiba ,  Kazutaka Ono ,  Jun Endo ,  Shigeki Sawamura ,  Tetsuya Nakashima ,  Yuichi Kuroki

Inventor： Shusaku Akiba ,  Kazutaka Ono ,  Jun Endo ,  Shigeki Sawamura ,  Tetsuya Nakashima ,  Yuichi Kuroki

IPC: C03C3/083 ,  C03C3/087 ,  B32B17/06 ,  C03C3/085

CPC classification number: C03C3/087 ,  C03C3/085 ,  C03C21/002 ,  C03C23/007 ,  G02F2001/133302

Abstract: To provide glass to be used for chemically tempered glass which is hardly broken even when flawed.Glass for chemical tempering, which comprises, as represented by mole percentage based on the following oxides, from 65 to 85% of SiO2, from 3 to 15% of Al2O3, from 5 to 15% of Na2O, from 0 and less than 2% of K2O, from 0 to 15% of MgO and from 0 to 1% of ZrO2, and has a total content SiO2+Al2O3 of SiO2 and Al2O3 of at most 88%.

Abstract translation: 提供用于化学钢化玻璃的玻璃，即使有缺陷也难以破损。 用于化学回火的玻璃，其包含以下列氧化物的摩尔百分数表示，65％至85％的SiO 2，3至15％的Al 2 O 3，5至15％的Na 2 O，0和小于2％ 的K 2 O，0〜15％的MgO和0〜1％的ZrO 2，SiO 2和Al 2 O 3的SiO 2 + Al 2 O 3的总含量为88％以下。

公开(公告)号：US08328602B2

公开(公告)日：2012-12-11

申请号：US12833410

申请日：2010-07-09

Applicant: Masahiko Tamura ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

Inventor： Masahiko Tamura ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

IPC: C03B27/00 ,  B24C3/08 ,  G11B9/04

CPC classification number: G11B5/8404 ,  B24B37/042 ,  B24B37/08 ,  C03C19/00 ,  G11B5/7315

Abstract: The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.

Abstract translation: 本发明涉及一种用于信息记录介质的玻璃基板的制造方法，该方法包括：研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤，用含有氧化铈磨料的浆料研磨圆形玻璃板，其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异（SiO 2 -Al 2 O 3）为62％ 摩尔或更少; 该方法还包括：随后的氧化铈抛光步骤，用硫酸浓度为20质量％以上且80质量％以下的清洗液清洗圆形玻璃板的清洗工序， 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量％以上且10质量％以下，在清洗工序后，对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。

公开(公告)号：US20120264585A1

公开(公告)日：2012-10-18

申请号：US13419115

申请日：2012-03-13

Applicant: Seiki OHARA ,  Kazutaka Ono ,  Tetsuya Nakashima

Inventor： Seiki OHARA ,  Kazutaka Ono ,  Tetsuya Nakashima

IPC: C03C3/085 ,  C03C21/00 ,  C03C3/087

CPC classification number: C03C3/087 ,  C03C3/085 ,  C03C4/18 ,  C03C21/002 ,  C03C2204/00

Abstract: To provide a method for producing chemically tempered glass, whereby the chemical tempering can be done at a low temperature and in a short time. A method for producing chemically tempered glass, which comprises chemically tempering glass for chemical tempering, comprising, as represented by mole percentage based on the following oxides, from 60 to 75% of SiO2, from 5 to 15% of Al2O3, from 1 to 12% of MgO, from 0 to 3% of CaO, from 0 to 3% of ZrO2, from 10 to 20% of Li2O, from 0 to 8% of Na2O and from 0 to 5% of K2O, and having a total content R2O of Li2O, Na2O and K2O of at most 25%, and a ratio Li2O/R2O of the Li2O content to R2O of from 0.5 to 1.0.

Abstract translation: 为了提供一种生产化学钢化玻璃的方法，由此化学回火可以在低温和短时间内进行。 一种生产化学钢化玻璃的方法，其包括用于化学回火的化学回火玻璃，其包含以下列氧化物的摩尔百分比表示：60至75％的SiO 2，5至15％的Al 2 O 3，1至12 0％〜3％的CaO，0〜3％的ZrO 2，10〜20％的Li 2 O，0〜8％的Na 2 O和0〜5％的K 2 O，总含量为R2O 的Li 2 O，Na 2 O和K 2 O的含量为25％以下，Li 2 O的含量与R 2 O的比Li2O / R2O为0.5〜1.0。