公开(公告)号：US20110091810A1

公开(公告)日：2011-04-21

申请号：US12980914

申请日：2010-12-29

申请人： Daiju SHIONO ,  Taku Hirayama ,  Toshiyuki OGATA ,  Shogo MATSUMARU ,  Hideo HADA

发明人： Daiju SHIONO ,  Taku Hirayama ,  Toshiyuki OGATA ,  Shogo MATSUMARU ,  Hideo HADA

IPC分类号： G03F7/004

CPC分类号： G03F7/0392 ,  C07J9/00 ,  G03F7/0045 ,  Y10S430/106

摘要： A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.

摘要翻译： 提供了用于形成高分辨抗蚀剂图案的正型抗蚀剂组合物和形成抗蚀剂图案的方法，其使用低分子量材料作为基础组分，并且化合物和溶解抑制剂各自适用于阳性 型抗蚀剂组合物。 这里，该化合物是分子量为500〜3000的非聚合物，在酸的作用下分解，生成分子量为200以上的分解产物的2个以上分子; 该溶解抑制剂包含该化合物; 正型抗蚀剂组合物包含化合物和酸产生剂组分; 并且形成抗蚀剂图案的方法使用正型抗蚀剂组合物。