公开(公告)号：US20110091810A1

公开(公告)日：2011-04-21

申请号：US12980914

申请日：2010-12-29

申请人： Daiju SHIONO ,  Taku Hirayama ,  Toshiyuki OGATA ,  Shogo MATSUMARU ,  Hideo HADA

发明人： Daiju SHIONO ,  Taku Hirayama ,  Toshiyuki OGATA ,  Shogo MATSUMARU ,  Hideo HADA

IPC分类号： G03F7/004

CPC分类号： G03F7/0392 ,  C07J9/00 ,  G03F7/0045 ,  Y10S430/106

摘要： A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.

摘要翻译： 提供了用于形成高分辨抗蚀剂图案的正型抗蚀剂组合物和形成抗蚀剂图案的方法，其使用低分子量材料作为基础组分，并且化合物和溶解抑制剂各自适用于阳性 型抗蚀剂组合物。 这里，该化合物是分子量为500〜3000的非聚合物，在酸的作用下分解，生成分子量为200以上的分解产物的2个以上分子; 该溶解抑制剂包含该化合物; 正型抗蚀剂组合物包含化合物和酸产生剂组分; 并且形成抗蚀剂图案的方法使用正型抗蚀剂组合物。

公开(公告)号：US20080081281A1

公开(公告)日：2008-04-03

申请号：US11838951

申请日：2007-08-15

申请人： Kyoko KOJIMA ,  Hideo HADA ,  Daiju SHIONO

发明人： Kyoko KOJIMA ,  Hideo HADA ,  Daiju SHIONO

IPC分类号： G03C1/10 ,  C07C39/12 ,  G03F7/20 ,  C07C59/52

CPC分类号： C07C39/17 ,  C07C39/15 ,  G03F7/0382 ,  Y10S430/106

摘要： To overcome the problem that a device performance is degraded by the edge roughness of a photoresist pattern, a mixture of polynuclear phenol compounds having, in one molecule, 0 to 6 functional groups which are chemically converted due to actions of an acid with the solubility in an alkaline developer reduced is used as a material for photoresist. In the mixture, two or more triphenyl methane structures are bonded to portions other than the functional group in the nonconjugated state. Furthermore, the mixture comprises polynuclear compounds with the average number of functional groups of 2.5 or below and includes the polynuclear compounds not having any functional group per molecule by 15% or less in the term of weight ratio, and the polynuclear phenol compounds having 3 or more functional groups per molecule by 40% or less.

摘要翻译： 为了克服由光致抗蚀剂图案的边缘粗糙度降低器件性能的问题，在一分子中具有0至6个官能团的多核酚化合物的混合物，其由于酸的作用而具有溶解度而化学转化 还原的碱性显影剂被用作光致抗蚀剂的材料。 在该混合物中，在非共轭状态下，将两个以上的三苯基甲烷结构键合至官能团以外的部分。 此外，该混合物包含平均官能团数为2.5或更低的多核化合物，并且包括在重量比方面每分子不具有15％或更少的任何官能团的多核化合物，并且多核苯酚化合物具有3或 每个分子更多的官能团减少40％以下。

公开(公告)号：US20110008728A1

公开(公告)日：2011-01-13

申请号：US12788160

申请日：2010-05-26

申请人： Tsuyoshi NAKAMURA ,  Masaru TAKESHITA ,  Jiro YOKOYA ,  Hideo HADA ,  Kensuke MATSUZAWA ,  Kazushige DOHTANI

发明人： Tsuyoshi NAKAMURA ,  Masaru TAKESHITA ,  Jiro YOKOYA ,  Hideo HADA ,  Kensuke MATSUZAWA ,  Kazushige DOHTANI

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/19 ,  C08F220/18 ,  C08F220/24 ,  C08F2220/281 ,  C08F2220/285 ,  G03F7/0035 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/2041 ,  C08F220/28

摘要： A resist composition including: a base component which exhibits changed solubility in an alkali developing solution under the action of acid; and an acid-generator component containing an acid generator (B1) consisting of a compound represented by general formula (b1); dissolved in an organic solvent containing an alcohol-based organic solvent having a boiling point of at least 150° C., wherein R7″ to R9″ represents an aryl group or an alkyl group, provided that at least one of R7″ to R9″ represents a substituted aryl group which has been substituted with a group represented by the formula: —O—R70 (R70 represents an organic group), and two of R7″ to R9″ may be mutually bonded to form a ring with the sulfur atom; X represents a hydrocarbon group of 3 to 30 carbon atoms; Q1 represents a divalent linking group containing an oxygen atom; and Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms.

摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中显示出改变的溶解度的碱成分; 以及含有由通式（b1）表示的化合物构成的酸发生剂（B1）的酸发生剂成分。 溶解在含有沸点至少为150℃的醇类有机溶剂的有机溶剂中，其中R7“至R9”表示芳基或烷基，条件是R7“至R9”中的至少一个 表示被由下式表示的基团取代的取代的芳基：-R-70（R70表示有机基团），并且R7“至R9”中的两个可以相互键合形成具有硫原子的环; X表示3〜30个碳原子的烃基; Q1表示含有氧原子的二价连接基团; Y1表示碳原子数为1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。

公开(公告)号：US20120264061A1

公开(公告)日：2012-10-18

申请号：US13478291

申请日：2012-05-23

申请人： Hideo HADA ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

发明人： Hideo HADA ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

IPC分类号： C07C69/753 ,  G03F7/20 ,  G03F7/027

CPC分类号： G03F7/027 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分（A）和包含（b1-1）表示的化合物的酸产生剂成分（B），由（b1- 1'）和/或（b1-1“）表示的化合物（R1”-R3“表示芳基或烷基，条件是R1”-R3“中的至少一个表示被 由（b1-1-0）表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价 连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C（= O） - 或-SO2-; Y11表示C1-C10烷基或氟化烷基 ：Q2表示单键或亚烷基; W表示C2-C10亚烷基）。