Parts procurement system and method
    12.
    发明授权
    Parts procurement system and method 失效
    零件采购系统和方法

    公开(公告)号:US07251539B2

    公开(公告)日:2007-07-31

    申请号:US09902667

    申请日:2001-07-12

    IPC分类号: G06F19/00

    摘要: A virtual production line indicating an object (e.g., a vehicle) sequence for an actual production line and objects (e.g., vehicles) planned in the future is updated based on a long-term production plan, a fixed production plan, and actual production results. Then, the ordering timings for the parts necessary for the respective objects in the virtual production line are calculated based on the timing for using the parts and the delivery lead time, and the orders are placed according to those timings.

    摘要翻译: 根据长期生产计划,固定生产计划和实际生产结果,更新一条虚拟生产线,指示实际生产线和未来计划的对象(如车辆)的物体(如车辆)序列 。 然后,根据使用部件的定时和交货提前期计算虚拟生产线中的各个对象所需的部件的订购定时,并根据这些定时放置订单。

    Optical information recording medium and production method thereof
    15.
    发明授权
    Optical information recording medium and production method thereof 失效
    光学信息记录介质及其制造方法

    公开(公告)号:US06258432B1

    公开(公告)日:2001-07-10

    申请号:US09284312

    申请日:1999-04-27

    IPC分类号: B32B302

    摘要: An optical information recording medium comprising a thin plastic substrate of 0.6 mm or thinner, wherein the substrate is protected against strain without being limited by a film structure and a film formation condition. A single-layer or multilayer thin film (70) is formed on a plastic disk-like substrate having a center hole (10). This thin film (70) has a strain relief area (72) inside a recording area (71). This strain relief area (72) is formed by setting an outer diameter of an undeposited inner portion (5) to a value satisfying the following formula (1), for example: A0≦AX≦−0.172P+0.163 where A0: diameter of center hole, AX: outer diameter of undeposited inner portion, P: total strain occurring in thin film when film depositing.

    摘要翻译: 一种光学信息记录介质,包括0.6mm或更薄的薄塑料基板,其中所述基板被保护而不受薄膜结构和成膜条件的限制。 在具有中心孔(10)的塑料盘状基板上形成单层或多层薄膜(70)。 该薄膜(70)在记录区域(71)的内部具有应变消除区域(72)。 通过将未沉积的内部部分(5)的外径设定为满足下面的公式(1)的值来形成该应变消除区域(例如):A0 <= AX <= - 0.172P + 0.163其中A0: 中心孔直径,AX:未沉积内部部分的外径,P:膜沉积时在薄膜中产生的总应变。