COVALENT ORGANIC FRAMEWORK AND METHOD OF PREPARING THE SAME

    公开(公告)号:US20220194910A1

    公开(公告)日:2022-06-23

    申请号:US17643720

    申请日:2021-12-10

    Abstract: A covalent organic framework and a method of preparing the same are disclosed. The covalent organic framework is used to produce an electrode material and includes a repeating unit represented by the following chemical formula: In the formula, A1, A2, and A3 are the same or different, and are independently a monocyclic or polycyclic aromatic ring, and R1 and R2 are the same or different, and are independently selected from hydrogen, a functional group containing at least one nitrogen, phosphorus, or sulfur, an unsubstituted or substituted C1-C6 alkyl group, an unsubstituted or substituted C2-C6 alkenyl group, an unsubstituted or substituted C2-C6 alkynyl group, and an unsubstituted or substituted C1-C6 alkoxy group.

    METHOD OF EVALUATING ROBUSTNESS OF ARTIFICIAL NEURAL NETWORK WATERMARKING AGAINST MODEL STEALING ATTACKS

    公开(公告)号:US20220164417A1

    公开(公告)日:2022-05-26

    申请号:US17361994

    申请日:2021-06-29

    Abstract: Disclosed is a method of evaluating robustness of artificial neural network watermarking against model stealing attacks. The method of evaluating robustness of artificial neural network watermarking may include the steps of: training an artificial neural network model using training data and additional information for watermarking; collecting new training data for training a copy model of a structure the same as that of the trained artificial neural network model; training the copy model of the same structure by inputting the collected new training data into the copy model; and evaluating robustness of watermarking for the trained artificial neural network model through a model stealing attack executed on the trained copy model.

    NUCLEIC ACID-MEDIATED PATTERN REPLICATION AND METHOD OF MANUFACTURING 2-D MATERIAL USING THE SAME

    公开(公告)号:US20220127662A1

    公开(公告)日:2022-04-28

    申请号:US17510690

    申请日:2021-10-26

    Abstract: Provided are the nucleic acid-mediated pattern replication and a method of manufacturing a 2-D material using the same. A method of manufacturing a 2-D material according to an embodiment may include preparing a first material having a first nucleic acid patterned on a surface thereof, bonding a linker-nucleic acid to the first nucleic acid, bonding the first nucleic acid and a second nucleic acid attached to a surface of a second material through the linker-nucleic acid and replicating a pattern of the first material to the surface of the second material, separating the first material, and applying a third material on a pattern replicated to the surface of the second material.

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