中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

1064 records (took 0.03 seconds)

    BUFFER COMPONENT AND PRESSING DEVICE
    21.
    发明申请
    BUFFER COMPONENT AND PRESSING DEVICE 有权

    公开(公告)号：US20220212457A1

    公开(公告)日：2022-07-07

    申请号：US17702772

    申请日：2022-03-23

    Applicant: HKC Corporation Limited ,  Chongqing HKC Optoelectronics Technology Co., Ltd.

    Inventor： Guanghui Zhang

    IPC: B32B37/00 ,  B32B37/10

    Abstract: Disclosed is a buffer component and a pressing device, the buffer component is applied to the pressing device. The pressing device includes an anisotropic conductive film pressure knife, the buffer component includes an inserting part, which is made of a first elastic material, and the inserting part is configured to insert into a lower end of the anisotropic conductive film pressure knife; and a buffering part, which is made of a second elastic material, the buffering part is configured to closely attach to a lower end surface of the lower end of the anisotropic conductive film pressure knife.

    Wearable device and 3D display system and method
    23.
    发明授权
    Wearable device and 3D display system and method 有权

    公开(公告)号：US11366335B2

    公开(公告)日：2022-06-21

    申请号：US16628395

    申请日：2017-08-31

    Applicant: HKC Corporation Limited ,  Chongqing HKC Optoelectronics Technology Co., Ltd.

    Inventor： Yu-Jen Chen

    IPC: G02B30/25 ,  G02B26/08

    Abstract: A wearable device, a 3D display system, and a 3D image displaying method are provided. The 3D image displaying method includes acquiring a curvature information of the 3D display device when the 3D display device is turned on; adjusting a curvature of the wearable device according to the curvature information; determining whether an adjusted curvature of the wearable device and a curvature of the 3D display device satisfy a predetermined relationship; and sending a control signal to the 3D display device to control the 3D display device to display a 3D image when the adjusted curvature of the wearable device and the curvature of the 3D display device satisfy the predetermined relationship.

    Array substrate
    24.
    发明授权
    Array substrate 有权

    公开(公告)号：US11362119B2

    公开(公告)日：2022-06-14

    申请号：US17133667

    申请日：2020-12-24

    Applicant: HKC CORPORATION LIMITED ,  CHONGQING HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.

    Inventor： Chuan Wu

    IPC: H01L27/12 ,  H01L27/02

    Abstract: The present disclosure provides a method of manufacturing array substrate, including: providing a substrate; and forming a metal layer, a gate layer, an insulation layer, and a protective layer on the substrate sequentially. Wherein, the metal layer is formed on a drive line on the substrate, and the metal layer is arranged in at least one of a position between the substrate and the insulation layer and a position between the insulation layer and the protective layer. In the present disclosure, an electrostatic discharge path is increased through the floating metal layer. Even though the floating metal layer is burned down, a display quality would not be affected, the product yield is improved. Besides, it only needs to adjust a photomask pattern. Therefore, a production procedure needs not to be adjusted.

    Manufacturing method for array substrate and array substrate
    26.
    发明授权
    Manufacturing method for array substrate and array substrate 有权

    公开(公告)号：US11348947B2

    公开(公告)日：2022-05-31

    申请号：US16331288

    申请日：2018-05-22

    Applicant: HKC Corporation Limited ,  CHONGQING HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.

    Inventor： En-tsung Cho ,  Yiqun Tian

    IPC: H01L27/12 ,  H01L29/45 ,  H01L29/786 ,  H01L29/66

    Abstract: The present disclosure discloses a manufacturing method for an array substrate and an array substrate. The method includes: forming a gate electrode, a gate insulating layer, a semiconductor layer, a source drain electrode layer and a photoresist layer on a substrate; patterning the photoresist layer to form a patterned photoresist layer; performing at least one wet etching on the source drain electrode layer and performing at least one dry etching on the semiconductor layer; performing an ashing processing between the steps of the wet etching and the dry etching. A ratio of a lateral etching rate to a longitudinal etching rate in the at least one ashing processing ranges from 1:0.9 to 1:1.5.

    TIMING CONTROLLER CONTROL METHOD AND TIMING CONTROLLER
    27.
    发明申请
    TIMING CONTROLLER CONTROL METHOD AND TIMING CONTROLLER 有权

    公开(公告)号：US20220157266A1

    公开(公告)日：2022-05-19

    申请号：US17421280

    申请日：2020-06-10

    Applicant: BEIHAI HKC OPTOELECTRONICS TECHNOLOGY CO., LTD. ,  Chongqing HKC Optoelectronics Technology Co., ltd.

    Inventor： Mingliang WANG

    IPC: G09G3/36

    Abstract: The present disclosure relates to a method for controlling a timing controller and a timing controller. The method for controlling the timing controller includes: acquiring a bus address in a bus signal transmitted over an I2C bus, the I2C bus being connected to the timing controller; if the timing controller determining that the bus address matches an address of the timing controller, acquiring data information in the bus signal; acquiring an address of a target function circuit according to the data information; generating and transmitting a query instruction to a memory according to the address of the target function circuit, and receiving switch control data corresponding to the target function circuit fed back by the memory; controlling, according to the switch control data, a switch connected to the target function circuit to be turned on.

Patent Agency Ranking