公开(公告)号：US20120092314A1

公开(公告)日：2012-04-19

申请号：US13102076

申请日：2011-05-06

Applicant: CHANG-SOO LEE ,  Jong Jae Lee

Inventor： CHANG-SOO LEE ,  Jong Jae Lee

IPC: G09G5/00

CPC classification number: G09G3/20 ,  G09G3/3266 ,  G09G3/3677 ,  G09G2310/0267

Abstract: A gate-off voltage generator provides a gate-off voltage to a gate line of a display panel. The gate-off voltage generator includes a transistor having a base terminal, a collector terminal, and an emitter terminal, the emitter terminal configured to output the gate-off voltage to the gate line. A controller is connected to the base terminal. A feedback circuit is connected between the gate line and the controller, the feedback circuit configured to provide to the controller a feedback voltage based upon the gate-off voltage outputted from the emitter terminal. The gate-off voltage from the emitter terminal is compared with a desired gate-off voltage in the controller and the voltage at the base terminal is controlled by the controller to provide the desired gate-off voltage to gate line.

Abstract translation: 栅极截止电压发生器向显示面板的栅极线提供栅极截止电压。 栅极截止电压发生器包括具有基极端子，集电极端子和发射极端子的晶体管，发射极端子被配置为将栅极截止电压输出到栅极线。 控制器连接到基本终端。 反馈电路连接在栅极线和控制器之间，反馈电路被配置为基于从发射极端子输出的栅极截止电压向控制器提供反馈电压。 将来自发射极端子的栅极截止电压与控制器中的期望栅极截止电压进行比较，并且由控制器控制基极端子处的电压，以向栅极线提供所需的栅极截止电压。

公开(公告)号：US20110250826A1

公开(公告)日：2011-10-13

申请号：US13081981

申请日：2011-04-07

Applicant: So Young YOON ,  Joo Han LEE ,  Jong Jae LEE

Inventor： So Young YOON ,  Joo Han LEE ,  Jong Jae LEE

IPC: B24B53/12 ,  B24D18/00 ,  B24D3/00

CPC classification number: B24B53/017 ,  B24B53/12 ,  B24D2203/00

Abstract: This invention relates to a conditioner for a chemical mechanical planarization pad, which is necessary for global planarization of a wafer in order to increase the degree of integration of a semiconductor device, and more particularly to a pad conditioner having a structure able to reduce friction with a pad so as to solve the problems caused by a lot of friction being generated upon conditioning, and to a method of manufacturing the same.

Abstract translation: 本发明涉及一种用于化学机械平面化焊盘的调节器，其是为了提高半导体器件的集成度而对于晶片的全局平面化所必需的，更具体地涉及具有能够降低与 衬垫，以解决在调节时产生的大量摩擦所引起的问题，以及其制造方法。

公开(公告)号：US20110175892A1

公开(公告)日：2011-07-21

申请号：US12874823

申请日：2010-09-02

Applicant: Jong-Jae Lee ,  Chang-Soo Lee

Inventor： Jong-Jae Lee ,  Chang-Soo Lee

IPC: G06F3/038 ,  G09G3/36 ,  G05F1/10

CPC classification number: G09G3/3696 ,  G09G2330/021 ,  H02M3/155

Abstract: A power source circuit includes an inductor, a reservoir capacitor, and a switching control part that generates ON/OFF control signals to each of first and second switches. The first switch is connected between a first power voltage terminal and a first node to form a first current path between the first power voltage terminal and the first node in response to a driving signal of the switching control part. The second switch is connected between the first node and a second power voltage terminal to form a second current path between the first node and the second power voltage terminal in response to the driving signal. The inductor is connected to the first node to provide an average voltage between the first power voltage terminal and the second power voltage terminal. The capacitor is connected in parallel with the inductor to store the average voltage.

Abstract translation: 电源电路包括电感器，储存电容器和切换控制部件，其对第一和第二开关中的每一个产生ON / OFF控制信号。 第一开关连接在第一电源电压端子和第一节点之间，以响应于开关控制部件的驱动信号而在第一电源电压端子和第一节点之间形成第一电流路径。 第二开关连接在第一节点和第二电源电压端子之间，以响应于驱动信号在第一节点和第二电源电压端子之间形成第二电流路径。 电感器连接到第一节点，以在第一电源电压端子和第二电源电压端子之间提供平均电压。 电容器与电感并联连接以存储平均电压。

公开(公告)号：US20110175541A1

公开(公告)日：2011-07-21

申请号：US12963801

申请日：2010-12-09

Applicant: Jong-Jae LEE ,  Hyeon-Yong JANG

Inventor： Jong-Jae LEE ,  Hyeon-Yong JANG

IPC: H05B37/02

CPC classification number: H05B41/2921 ,  H05B41/285 ,  Y02B20/183

Abstract: An arc discharge detecting circuit includes; a voltage dividing part which divides a driving voltage provided to a light source, a detecting part which includes a loop-shaped wiring spaced apart from the voltage dividing part and which detects a current corresponding to an arc discharge flowing through the voltage dividing part using a coupling capacitance generated between the loop-shaped wiring of the detecting part and a wiring of the voltage dividing part, and an output part connected to the detecting part to output a detection voltage corresponding to the arc discharge. Accordingly, the arc discharge detecting circuit may improve a sensitivity of detecting an arc discharge as a current source type using the coupling capacitors, a design may be simplified, and manufacturing costs may be decreased.

Abstract translation: 电弧放电检测电路包括： 分压部，其对提供给光源的驱动电压进行分压;检测部，其包括与分压部分间隔开的环状布线，并且检测与通过分压部的电弧放电相对应的电流，使用 在检测部的环状布线与分压部的布线之间产生的耦合电容以及与检测部连接的输出部，输出与电弧放电对应的检测电压。 因此，电弧放电检测电路可以提高使用耦合电容器作为电流源的电弧放电检测的灵敏度，可以简化设计，并且可以降低制造成本。

公开(公告)号：US20100277099A1

公开(公告)日：2010-11-04

申请号：US12564826

申请日：2009-09-22

Applicant: Kyung-Uk CHOI ,  Jong-Jae LEE ,  Seung-Hwan MOON

Inventor： Kyung-Uk CHOI ,  Jong-Jae LEE ,  Seung-Hwan MOON

IPC: H05B37/02 ,  H05B39/04

CPC classification number: H05B33/0815 ,  H05B33/0827

Abstract: A light source power supply part generates a first output voltage close to a light source input voltage or a second output voltage close to a reference voltage by comparing the reference voltage and the light source input voltage in accordance with an embodiment of the present invention. A light source driving part may drive a light source based on the first output voltage or the second output voltage. Therefore, the light source may be driven with a stable voltage regardless of the level of the light source input voltage.

Abstract translation: 根据本发明的实施例，光源电源部分通过比较参考电压和光源输入电压来产生接近光源输入电压的第一输出电压或接近参考电压的第二输出电压。 光源驱动部可以基于第一输出电压或第二输出电压来驱动光源。 因此，与光源输入电压的电平无关地，可以以稳定的电压来驱动光源。

公开(公告)号：US20060174913A1

公开(公告)日：2006-08-10

申请号：US11322389

申请日：2006-01-03

Applicant: Dong-hoon Jung ,  Jong-jae Lee ,  Seung-kun Lee ,  Man-young Lee

Inventor： Dong-hoon Jung ,  Jong-jae Lee ,  Seung-kun Lee ,  Man-young Lee

IPC: C23G1/00 ,  B08B9/20 ,  B08B3/00

CPC classification number: H01L21/67057

Abstract: A wet processing apparatus includes a bath in which a plurality of semiconductor substrates are to be seated, and which bath has drain valves defining drain openings between a bottom wall and the lower portions of side walls of the bath. Each of the drain valves also includes a gate mounted on the lower portion of one of the side walls. The gates of the drain valves are movable to selectively open and close the drain openings. A plurality of substrates are transferred into the bath and are held under a body of liquid contained in a bath while the substrates are oriented vertically as disposed generally parallel to one another. In this state, the side walls of the baths face the peripheral edges of the substrates at both sides of the substrates. Thus, the substrates are prevented from moving toward and becoming stuck to one another when the liquid is drained from the bath.

Abstract translation: 湿处理设备包括其中要安置多个半导体衬底的浴，以及哪个浴具有排泄阀，该排水阀在底壁和浴的侧壁的下部之间形成排水开口。 每个排水阀还包括安装在一个侧壁的下部上的门。 排水阀的闸门可移动以选择性地打开和关闭排水口。 将多个基板转移到浴中并且被保持在包含在浴中的液体的主体下，同时基板垂直定向，大体上彼此平行地设置。 在这种状态下，浴的侧壁在基板的两侧面对基板的周边边缘。 因此，当液体从浴中排出时，防止基板移动并相互粘合。

公开(公告)号：US20050211266A1

公开(公告)日：2005-09-29

申请号：US11103802

申请日：2005-04-12

Applicant: Jae-Hyung Jung ,  Young-Min Kwon ,  Jong-Jae Lee ,  Dong-Hoon Jung

Inventor： Jae-Hyung Jung ,  Young-Min Kwon ,  Jong-Jae Lee ,  Dong-Hoon Jung

IPC: H01L21/304 ,  H01L21/00 ,  B08B3/04

CPC classification number: H01L21/67034 ,  Y10S134/902

Abstract: A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.

Abstract translation: 晶片干燥方法包括将晶片浸没在干燥室中的清洁溶液中。 来自有机液体的有机液体蒸气以第一体积供应速率供应到干燥室中，以在清洁溶液的表面上形成有机液体层，有机液体层至少具有规定浓度的有机液体。 有机液体蒸气以低于第一体积供应速率的第二体积供应速率供应到干燥室中。 在将有机液体蒸气供应到干燥室中和/或之后，晶片的至少一部分通过有机液体层从清洗溶液中除去。