公开(公告)号：US07793671B2

公开(公告)日：2010-09-14

申请号：US11646540

申请日：2006-12-28

申请人： Jae-Hyung Jung

发明人： Jae-Hyung Jung

IPC分类号： B08B3/00 ,  B08B3/02 ,  B08B3/04

CPC分类号： H01L21/67051 ,  Y10S134/902

摘要： An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.

摘要翻译： 一种用于清洁基板的设备包括：基板支撑件，其被配置为水平地支撑多个基板，一个彼此间隔规则地间隔开，用于旋转基板支撑件的旋转装置和用于将清洁液体分配到基板上的液体供应系统。 基板支撑件具有基板和在基板上直立延伸的支撑杆。 支撑杆包括固定杆和至少一个活动杆。 可动杆可以在打开位置之间移动，以提供允许基板放置在支撑杆之间的通道，以及基板由支撑杆之间和之间保持的关闭位置。 一旦以这种方式支撑基板，则旋转基板。 然后，随着基板旋转，诸如化学溶液之后的清洗液体被清洗液分配到所有的基板上。

公开(公告)号：US6059986A

公开(公告)日：2000-05-09

申请号：US144254

申请日：1998-08-31

申请人： Jae-hyung Jung ,  Young-hwan Yun ,  Se-jong Ko ,  Min-sang Yun

发明人： Jae-hyung Jung ,  Young-hwan Yun ,  Se-jong Ko ,  Min-sang Yun

IPC分类号： H01L21/306 ,  H01L21/00 ,  H01L21/304 ,  C23F1/02 ,  G05D23/00 ,  H05B1/00

CPC分类号： H01L21/67086 ,  H01L21/67057

摘要： A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.

摘要翻译： 用于清洗和湿蚀半导体晶片的湿站装置包括用于保存化学溶液的化学容器，用于测量化学溶液的温度的温度测量装置，用于比较由温度测量装置测量的温度的温度控制单元 具有预定的参考温度值，并输出作为控制信号的结果，用于加热化学溶液的石英加热器，用于接收控制信号并调节供应到石英加热器的功率的电源控制器，以及连接到 电源控制器，用于接收加热启动信号和切换到石英加热器的电力，其中进一步提供加热器监控系统，用于监视石英加热器和电源控制器的运行状态，并通知操作者任何问题。

公开(公告)号：US07343922B2

公开(公告)日：2008-03-18

申请号：US11103802

申请日：2005-04-12

申请人： Jae-Hyung Jung ,  Young-Min Kwon ,  Jong-Jae Lee ,  Dong-Hoon Jung

发明人： Jae-Hyung Jung ,  Young-Min Kwon ,  Jong-Jae Lee ,  Dong-Hoon Jung

IPC分类号： B08B5/00 ,  F26B19/00

CPC分类号： H01L21/67034 ,  Y10S134/902

摘要： A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.

摘要翻译： 晶片干燥方法包括将晶片浸没在干燥室中的清洁溶液中。 来自有机液体的有机液体蒸气以第一体积供应速率供应到干燥室中，以在清洁溶液的表面上形成有机液体层，有机液体层至少具有规定浓度的有机液体。 有机液体蒸气以低于第一体积供应速率的第二体积供应速率供应到干燥室中。 在将有机液体蒸气供应到干燥室中和/或之后，晶片的至少一部分通过有机液体层从清洗溶液中除去。

公开(公告)号：US07398801B2

公开(公告)日：2008-07-15

申请号：US11292674

申请日：2005-12-02

申请人： Kun-Hyung Lee ,  Soo-Woong Lee ,  Hyun-Ho Cho ,  Hee-Sun Chae ,  Jae-Hyung Jung ,  Sun-Yong Lee

发明人： Kun-Hyung Lee ,  Soo-Woong Lee ,  Hyun-Ho Cho ,  Hee-Sun Chae ,  Jae-Hyung Jung ,  Sun-Yong Lee

IPC分类号： B65B1/20

CPC分类号： H01L21/67017 ,  H01L21/67772 ,  Y10S414/14

摘要： An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.

摘要翻译： 公开了一种用于制造半导体器件的设备和方法。 根据本发明，用于将晶片从晶片储存容器转移到晶片加工设备的晶片转移装置包括设计成减少可进入晶片容器的污染物量的流动室。 晶片传送装置提供两个气体入口，用于允许两种气体流过传送装置的流动室。 这导致能够进入晶片容器的污染物量减少，这进而导致具有更可靠的性能特征以及高制造产量的装置的制造。

公开(公告)号：US20070181164A1

公开(公告)日：2007-08-09

申请号：US11646540

申请日：2006-12-28

申请人： Jae-Hyung Jung

发明人： Jae-Hyung Jung

IPC分类号： C23G1/00 ,  B08B3/00 ,  B08B7/00

CPC分类号： H01L21/67051 ,  Y10S134/902

摘要： An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.

摘要翻译： 一种用于清洁基板的设备包括：基板支撑件，其被配置为水平地支撑多个基板，一个彼此间隔规则地间隔开，用于旋转基板支撑件的旋转装置和用于将清洁液体分配到基板上的液体供应系统。 基板支撑件具有基板和在基板上直立延伸的支撑杆。 支撑杆包括固定杆和至少一个活动杆。 可动杆可以在打开位置之间移动，以提供允许基板放置在支撑杆之间的通道，以及基板由支撑杆之间和之间保持的关闭位置。 一旦以这种方式支撑基板，则旋转基板。 然后，随着基板旋转，诸如化学溶液之后的清洗液体被清洗液分配到所有的基板上。

公开(公告)号：US20060104750A1

公开(公告)日：2006-05-18

申请号：US11292674

申请日：2005-12-02

申请人： Kun-Hyung Lee ,  Soo-Woong Lee ,  Hyun-Ho Cho ,  Hee-Sun Chae ,  Jae-Hyung Jung ,  Sun-Yong Lee

发明人： Kun-Hyung Lee ,  Soo-Woong Lee ,  Hyun-Ho Cho ,  Hee-Sun Chae ,  Jae-Hyung Jung ,  Sun-Yong Lee

IPC分类号： H01L21/677

CPC分类号： H01L21/67017 ,  H01L21/67772 ,  Y10S414/14

摘要： An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.

摘要翻译： 公开了一种用于制造半导体器件的设备和方法。 根据本发明，用于将晶片从晶片储存容器转移到晶片加工设备的晶片转移装置包括设计成减少可进入晶片容器的污染物量的流动室。 晶片传送装置提供两个气体入口，用于允许两种气体流过传送装置的流动室。 这导致能够进入晶片容器的污染物量减少，这进而导致具有更可靠的性能特征以及高制造产量的装置的制造。

公开(公告)号：US5715851A

公开(公告)日：1998-02-10

申请号：US506760

申请日：1995-07-26

申请人： Jae-hyung Jung ,  Young-hwan Yun ,  Ho-seung Chang

发明人： Jae-hyung Jung ,  Young-hwan Yun ,  Ho-seung Chang

IPC分类号： H01L21/673 ,  B08B3/12 ,  B08B11/02 ,  H01L21/00 ,  H01L21/304 ,  B08B3/10

CPC分类号： H01L21/67023 ,  B08B11/02 ,  B08B3/12 ,  Y10S134/902

摘要： A wafer cassette through which a sonic wave is evenly transferred to a substrate in a quartz bath, and a cleaning system adopting the wafer cassette are provided. In the wafer cassette, a hole for evenly transferring the sonic wave to the substrate is formed. The cleaning system includes a vibration plate for generating a sonic wave, placed at the lowest portion of the cleaning system, a sink placed on the vibration plate, a quartz bath placed in the sink and spaced from the bottom of the sink, in which a wafer cassette is placed, a plurality of water supplies for supplying a cleaning solution, placed in the bottom of the quartz bath and a water drain for draining the cleaning solution overflown from the quartz bath, placed on the bottom of the sink, opposite to the water supplies, wherein the vibration plate is placed between the water drain and the water supplies. As a result, the oscillation frequency does not deviate from the setting value and air bubbles are not formed at the lower portion of the quartz bath, so that the irregular reflection of the sonic wave is restricted. Thus, the sonic wave is evenly transferred to the wafer, thereby enhancing the capability of removing the particles from the substrate.

摘要翻译： 提供了将声波在石英槽中均匀地转移到基板的晶片盒，以及采用该晶片盒的清洁系统。 在晶片盒中，形成用于将声波均匀地传递到基板的孔。 清洁系统包括用于产生声波的振动板，放置在清洁系统的最低部分，放置在振动板上的水槽，放置在水槽中并与水槽底部间隔开的石英浴，其中 放置晶片盒，放置在石英池底部的多个用于供应清洗液的供水装置，以及放置在与水槽相对的水槽底部的用于排出从石英池溢出的清洗液的排水口 水源，其中振动板放置在排水口和水源之间。 结果，振荡频率并没有偏离设定值，并且在石英槽的下部没有形成气泡，从而限制了声波的不规则反射。 因此，声波被均匀地转移到晶片，从而增强了从基底去除颗粒的能力。

公开(公告)号：US20070181148A1

公开(公告)日：2007-08-09

申请号：US11642893

申请日：2006-12-21

申请人： Min-Sang Yun ,  Kwon Son ,  Jae-Hyung Jung ,  Hee-Chan Jung ,  Ki-Ryong Choi ,  Byung-Joo Park ,  Kang-Young Kim

发明人： Min-Sang Yun ,  Kwon Son ,  Jae-Hyung Jung ,  Hee-Chan Jung ,  Ki-Ryong Choi ,  Byung-Joo Park ,  Kang-Young Kim

IPC分类号： C23G1/00 ,  B08B3/00 ,  B08B7/00

CPC分类号： H01L21/67051 ,  H01L21/02052

摘要： Embodiments of the invention provide a semiconductor wafer cleaning apparatus and a related method. In one embodiment, the invention provides a semiconductor wafer cleaning apparatus comprising a wafer stage adapted to support a wafer; a first cleaning unit adapted to spray a first cleaning solution onto the wafer to remove particles from the wafer, wherein the first cleaning solution prevents static electricity from being generated on the surface of the wafer; and a second cleaning unit adapted to provide a second cleaning solution onto the wafer and oscillate a quartz rod to remove particles from the wafer, wherein the second cleaning solution makes a surface of the wafer hydrophilic.

摘要翻译： 本发明的实施例提供一种半导体晶片清洗装置及相关方法。 在一个实施例中，本发明提供一种半导体晶片清洁设备，其包括适于支撑晶片的晶片台; 第一清洁单元，其适于将第一清洁溶液喷射到所述晶片上以从所述晶片去除颗粒，其中所述第一清洁溶液防止在所述晶片的表面上产生静电; 以及第二清洁单元，其适于将第二清洁溶液提供到所述晶片上并振荡石英棒以从所述晶片去除颗粒，其中所述第二清洁溶液使所述晶片的表面具有亲水性。

公开(公告)号：US06896743B2

公开(公告)日：2005-05-24

申请号：US10041227

申请日：2002-01-08

申请人： Jae-Hyung Jung ,  Young-Min Kwon ,  Jong-Jae Lee ,  Dong-Hoon Jung

发明人： Jae-Hyung Jung ,  Young-Min Kwon ,  Jong-Jae Lee ,  Dong-Hoon Jung

IPC分类号： H01L21/304 ,  H01L21/00 ,  B08B3/00 ,  F26B3/06

CPC分类号： H01L21/67034 ,  Y10S134/902

摘要： A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.

摘要翻译： 晶片干燥方法包括将晶片浸没在干燥室中的清洁溶液中。 来自有机液体的有机液体蒸气以第一体积供应速率供应到干燥室中，以在清洁溶液的表面上形成有机液体层，有机液体层至少具有规定浓度的有机液体。 有机液体蒸气以低于第一体积供应速率的第二体积供应速率供应到干燥室中。 在将有机液体蒸气供应到干燥室中和/或之后，晶片的至少一部分通过有机液体层从清洗溶液中除去。

公开(公告)号：US06430840B1

公开(公告)日：2002-08-13

申请号：US09801636

申请日：2001-03-09

申请人： Jae-Hyung Jung

发明人： Jae-Hyung Jung

IPC分类号： F26B300

CPC分类号： H01L21/67028 ,  H01L21/02063 ,  Y10S134/902

摘要： A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.

摘要翻译： 使用Marangoni效应干燥晶片的方法和装置在其中浸没晶片的清洗液上快速形成异丙醇层。 首先将异丙醇加热，然后以流体状态供给到清洗液上。 异丙醇液体迅速扩散形成异丙醇层。 通过异丙醇从清洗液中除去晶片，彻底干燥晶片，同时仅将更多的加热氮气供应到清洁液体上方的环境中。