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公开(公告)号:US20070290209A1
公开(公告)日:2007-12-20
申请号:US11753949
申请日:2007-05-25
申请人: Toshio Fujino , Akio Machida , Tadahiro Kono
发明人: Toshio Fujino , Akio Machida , Tadahiro Kono
IPC分类号: H01L29/04
CPC分类号: H01L21/02675 , H01L21/2026 , H01L27/1285 , H01L27/1296
摘要: A display including a driving substrate is provided. Arrayed on the driving substrate is a plurality of pixel electrodes and thin film transistors for driving the pixel electrodes. Each thin film transistor includes a semiconductor thin film having an active region made to be polycrystalline by irradiation with an energy beam, and a gate electrode provided so as to cross the active region. In a channel part of the active region overlapping with the gate electrode, the crystal state is varied periodically along the channel length direction, and substantially the same crystal state crosses the channel part.
摘要翻译: 提供包括驱动基板的显示器。 排列在驱动基板上的是用于驱动像素电极的多个像素电极和薄膜晶体管。 每个薄膜晶体管包括具有通过照射能量束而被制成多晶的有源区的半导体薄膜和设置成跨越有源区的栅电极。 在与栅极重叠的有源区的沟道部分中,晶体状态沿着沟道长度方向周期性变化,并且基本相同的晶体状态与沟道部分交叉。
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公开(公告)号:US20070241685A1
公开(公告)日:2007-10-18
申请号:US11697483
申请日:2007-04-06
IPC分类号: H01J17/49
摘要: A plasma display panel is provided. The plasma display panel includes a front panel including a front glass substrate, a plurality of pairs of discharge-maintaining electrodes disposed over the front glass substrate, and a first dielectric layer disposed in covering relation to the pairs of discharge-maintaining electrodes, and a rear panel disposed in confronting relation to the front panel with discharge spaces interposed therebetween, the front panel including a second dielectric layer disposed between the front glass substrate and the pairs of discharge-maintaining electrodes, the second dielectric layer including a cluster of fine particles of silica.
摘要翻译: 提供等离子体显示面板。 等离子体显示面板包括前面板,其包括前玻璃基板,设置在前玻璃基板上方的多对放电维持电极以及与成对的放电维持电极相对设置的第一电介质层, 后面板,与前面板相对地设置有放置空间的前面板,前面板包括设置在前玻璃基板和成对的放电维持电极之间的第二电介质层,第二电介质层包括: 二氧化硅。
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公开(公告)号:US20070212858A1
公开(公告)日:2007-09-13
申请号:US11683106
申请日:2007-03-07
申请人: Toshio Fujino , Akio Machida , Tadahiro Kono
发明人: Toshio Fujino , Akio Machida , Tadahiro Kono
IPC分类号: H01L21/428
CPC分类号: H01L21/268 , H01L21/02532 , H01L21/02675 , H01L21/02691 , H01L27/1203 , H01L27/1285 , H01L27/1296 , H01L29/04 , H01L29/66757 , H01L29/78675
摘要: A method for crystallizing a semiconductor thin film is provided. The method includes continuously irradiating an energy beam on a semiconductor thin film while scanning at a given speed. The energy beam is scanned in parallel lines while keeping pitches of not larger than an irradiation radius of the energy beam to grow band-shaped crystal grains in a direction different from a scanning direction of the energy beam.
摘要翻译: 提供了一种使半导体薄膜结晶的方法。 该方法包括在以给定速度扫描的同时在半导体薄膜上持续照射能量束。 能量束以平行线扫描,同时保持不大于能量束的照射半径的间距,以在与能量束的扫描方向不同的方向上生长带状晶粒。
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