Abstract:
Embodiments of the present invention provide a multiple description audio coding and decoding method, apparatus, and system. The audio coding method includes: dividing residual signals indicating current audio signal information into multiple frequency band parts having different frequencies; respectively coding the multiple frequency band parts by using multiple description coding (MDC) methods with different speech quality; and combining each of description signal parts that are generated after coding is performed by using different MDC methods to form multiple description bit streams of the residual signals. According to the present invention, multiple description coding and decoding methods with different speech quality are used for different frequency bands, which reduces the bit rate of multiple description coding and decoding, improves the effect of multiple description coding and decoding, and hence enhances the quality of audio transmission.
Abstract:
Embodiments of the present invention provide a multiple description audio coding and decoding method, apparatus, and system. The audio coding method includes: dividing residual signals indicating current audio signal information into multiple frequency band parts having different frequencies; respectively coding the multiple frequency band parts by using multiple description coding (MDC) methods with different speech quality; and combining each of description signal parts that are generated after coding is performed by using different MDC methods to form multiple description bit streams of the residual signals. According to the present invention, multiple description coding and decoding methods with different speech quality are used for different frequency bands, which reduces the bit rate of multiple description coding and decoding, improves the effect of multiple description coding and decoding, and hence enhances the quality of audio transmission.
Abstract:
A precise positioning system for dual stage switching exposure, which includes a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units includes a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other.