公开(公告)号：US20090219503A1

公开(公告)日：2009-09-03

申请号：US12299077

申请日：2006-11-20

申请人： Yingsheng Li ,  Zhiyong Yang ,  Jun Guan ,  Shaowen Gao ,  Wenfeng Sun ,  Gang Li ,  Yanmin Cai

发明人： Yingsheng Li ,  Zhiyong Yang ,  Jun Guan ,  Shaowen Gao ,  Wenfeng Sun ,  Gang Li ,  Yanmin Cai

IPC分类号： G03B27/58

CPC分类号： G03F7/70733

摘要： The present invention discloses a precise positioning system for dual stage switching exposure, which comprises at least a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units comprises at least a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation of the system both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other. The advantage of the present invention is that the switching paths of the wafer stages are short; the guide bars are equally forced; the size of the wafer stages are hardly restricted, thereby greatly improving the switching speed, operation accuracy and flexibility of the system. Besides, the present invention does not need to adopt additional collision-preventing apparatus, thus simplifying the system, reducing the cost, and effectively increasing the reliability.

摘要翻译： 本发明公开了一种用于双级切换曝光的精确定位系统，其至少包括基座，设置在用于预处理工作站的基座上的第一晶片台定位单元和用于曝光工作站的第二晶片台定位单元。 每个晶片台定位单元至少包括晶片台，运动定位检测器，X方向导向杆和Y方向导向杆。 系统的预处理工作站和曝光工作站都具有位于Y方向导杆上并可沿Y方向导杆移动的两个X方向导杆。 相邻工作站的X方向导杆可以相互连接。 本发明的优点是晶片台的开关路径短; 导杆同样受到迫害; 晶片级的大小几乎不受限制，从而大大提高了系统的开关速度，操作精度和灵活性。 此外，本发明不需要采用附加的防撞装置，因此简化了系统，降低了成本，并且有效地提高了可靠性。

公开(公告)号：US08027028B2

公开(公告)日：2011-09-27

申请号：US12299077

申请日：2006-11-20

申请人： Yingsheng Li ,  Xiaoping Li ,  Zhiyong Yang ,  Jun Guan ,  Shaowen Gao ,  Wenfeng Sun ,  Gang Li ,  Yanmin Cai

发明人： Yingsheng Li ,  Xiaoping Li ,  Zhiyong Yang ,  Jun Guan ,  Shaowen Gao ,  Wenfeng Sun ,  Gang Li ,  Yanmin Cai

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70733

摘要： A precise positioning system for dual stage switching exposure, which includes a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units includes a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other.

摘要翻译： 一种用于双级切换曝光的精确定位系统，其包括基座，设置在用于预处理工作站的基座上的第一晶片台定位单元和用于曝光工作站的第二晶片台定位单元。 每个晶片台定位单元包括晶片台，运动定位检测器，X方向导向杆和Y方向导向杆。 预处理工作站和曝光工作站都具有位于Y方向导杆上并可沿Y方向导杆移动的两个X方向导杆。 相邻工作站的X方向导杆可以相互连接。