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    FLOATING PLATFORM WITH CANTED COLUMNS
    1.
    发明申请
    FLOATING PLATFORM WITH CANTED COLUMNS 审中-公开

    公开(公告)号：US20200317306A1

    公开(公告)日：2020-10-08

    申请号：US16907152

    申请日：2020-06-19

    Applicant: Zhiyong YANG ,  Tingting LI ,  Nan FENG ,  Yumin YANG

    Inventor： Zhiyong YANG ,  Tingting LI ,  Nan FENG ,  Yumin YANG

    IPC: B63B35/44 ,  B63B75/00 ,  F03D9/30

    Abstract: This invention provides a floating platform with canted columns, and a new method of mooring line makeup and installation method that can be used for the canted columns. In one embodiment, the platform includes 3 columns having upper ends projecting above water surface. The columns are canted or inclined inward from the corner of hull toward the top of column. The 3 columns converge at the top of column such that each column will lean against the other 2 columns. Each column connects to the other 2 columns. Horizontally disposed pontoons interconnect adjacent columns at the lower ends. The columns and pontoons form a closed structure hull to support a foundation structure directly above the top of column.

    PRECISE POSITIONING SYSTEM FOR DUAL STAGE SWITCHING EXPOSURE
    2.
    发明申请
    PRECISE POSITIONING SYSTEM FOR DUAL STAGE SWITCHING EXPOSURE 有权
    精密定位系统，用于双级开关接触

    公开(公告)号：US20090219503A1

    公开(公告)日：2009-09-03

    申请号：US12299077

    申请日：2006-11-20

    Applicant: Yingsheng Li ,  Zhiyong Yang ,  Jun Guan ,  Shaowen Gao ,  Wenfeng Sun ,  Gang Li ,  Yanmin Cai

    Inventor： Yingsheng Li ,  Zhiyong Yang ,  Jun Guan ,  Shaowen Gao ,  Wenfeng Sun ,  Gang Li ,  Yanmin Cai

    IPC: G03B27/58

    CPC classification number: G03F7/70733

    Abstract: The present invention discloses a precise positioning system for dual stage switching exposure, which comprises at least a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units comprises at least a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation of the system both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other. The advantage of the present invention is that the switching paths of the wafer stages are short; the guide bars are equally forced; the size of the wafer stages are hardly restricted, thereby greatly improving the switching speed, operation accuracy and flexibility of the system. Besides, the present invention does not need to adopt additional collision-preventing apparatus, thus simplifying the system, reducing the cost, and effectively increasing the reliability.

    Abstract translation: 本发明公开了一种用于双级切换曝光的精确定位系统，其至少包括基座，设置在用于预处理工作站的基座上的第一晶片台定位单元和用于曝光工作站的第二晶片台定位单元。 每个晶片台定位单元至少包括晶片台，运动定位检测器，X方向导向杆和Y方向导向杆。 系统的预处理工作站和曝光工作站都具有位于Y方向导杆上并可沿Y方向导杆移动的两个X方向导杆。 相邻工作站的X方向导杆可以相互连接。 本发明的优点是晶片台的开关路径短; 导杆同样受到迫害; 晶片级的大小几乎不受限制，从而大大提高了系统的开关速度，操作精度和灵活性。 此外，本发明不需要采用附加的防撞装置，因此简化了系统，降低了成本，并且有效地提高了可靠性。

    Floating platform with canted columns
    4.
    发明授权
    Floating platform with canted columns 有权

    公开(公告)号：US11142291B2

    公开(公告)日：2021-10-12

    申请号：US16907152

    申请日：2020-06-19

    Applicant: Zhiyong Yang ,  Tingting Li ,  Nan Feng ,  Yumin Yang

    Inventor： Zhiyong Yang ,  Tingting Li ,  Nan Feng ,  Yumin Yang

    IPC: B63B35/44 ,  F03D9/30 ,  B63B75/00

    Abstract: This invention provides a floating platform with canted columns, and a new method of mooring line makeup and installation method that can be used for the canted columns. In one embodiment, the platform includes 3 columns having upper ends projecting above water surface. The columns are canted or inclined inward from the corner of hull toward the top of column. The 3 columns converge at the top of column such that each column will lean against the other 2 columns. Each column connects to the other 2 columns. Horizontally disposed pontoons interconnect adjacent columns at the lower ends. The columns and pontoons form a closed structure hull to support a foundation structure directly above the top of column.

    Immersion flow field maintenance system for an immersion lithography machine
    7.
    发明授权
    Immersion flow field maintenance system for an immersion lithography machine 有权
    浸没式光刻机浸入式流场维护系统

    公开(公告)号：US08130365B2

    公开(公告)日：2012-03-06

    申请号：US12304189

    申请日：2006-12-25

    Applicant: Zhiyong Yang

    Inventor： Zhiyong Yang

    IPC: G03B27/42 ,  G03B27/52 ,  G03B27/58

    CPC classification number: G03F7/70341 ,  G03F7/70733

    Abstract: An immersion flow field maintenance system for an immersion lithography machine. The machine includes a projection objective lens, a wafer stage for supporting the wafer, and an immersion supplying system distributed around the lens for producing an immersion flow field under the lens. The system includes a horizontal guideway, a flat board connected with the horizontal guideway through a cantilever, and drivers for moving the board. When the wafer is unloading and the wafer stage is moving out of the exposure area under the lens, the board connects to and moves synchronously with the wafer stage to transfer the flow field from above the wafer stage to above the board. When the wafer is loaded and the wafer stage is moving into the exposure area, the board connects to and moves synchronously with the wafer stage to transfer the flow field from above the board to above the wafer stage.

    Abstract translation: 浸没式光刻机浸渍流场维护系统。 该机器包括投影物镜，用于支撑晶片的晶片台和分布在透镜周围的用于在透镜下方产生浸没流场的浸入式供给系统。 该系统包括水平导轨，通过悬臂与水平导轨连接的平板以及用于移动板的驱动器。 当晶片卸载并且晶片载物台从透镜下方的曝光区域移出时，板与晶片台连接并与晶片台同步移动，以将流场从晶片台上方传递到板上方。 当晶片被加载并且晶片台移动到曝光区域中时，板与晶片台连接并同步移动，以将流场从板上方转移到晶片台上方。

    IMMERSION FLOW FIELD MAINTENANCE SYSTEM FOR AN IMMERSION LITHOGRAPHY MACHINE
    10.
    发明申请
    IMMERSION FLOW FIELD MAINTENANCE SYSTEM FOR AN IMMERSION LITHOGRAPHY MACHINE 有权
    静态流平衡机的静态流场维护系统

    公开(公告)号：US20090273765A1

    公开(公告)日：2009-11-05

    申请号：US12304189

    申请日：2006-12-25

    Applicant: Zhiyong Yang

    Inventor： Zhiyong Yang

    IPC: G03B27/52

    CPC classification number: G03F7/70341 ,  G03F7/70733

    Abstract: The present invention provides an immersion flow field maintenance system for an immersion lithography machine, the lithography machine including a projection objective lens, at least a wafer stage for supporting the wafer, and an immersion supplying system distributed around the projection objective lens for producing an immersion flow field under the projection objective lens. The immersion maintenance system includes a horizontal guideway, a flat board connected with the horizontal guideway through the cantilever, and plural drivers for driving the flat board to move. When the wafer is unloading and the wafer stage is moving out of the exposure area under the projection objective lens, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the wafer stage to above the flat board. When the wafer is loaded and the wafer stage is moving into the exposure area, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the flat board to above the wafer stage. The system of the present invention eliminates the removing and establishing processes of the flow field when the wafer stage leaves and enters the exposal position, thus saving much time and improving the throughput of the lithography machine.

    Abstract translation: 本发明提供了一种用于浸没式光刻机的浸渍流场维护系统，该光刻机包括一个投影物镜，至少一个用于支撑晶片的晶片台，以及分布在该投影物镜周围的用于产生浸没 投影物镜下的流场。 浸入式维护系统包括水平导轨，通过悬臂与水平导轨连接的平板，以及用于驱动平板移动的多个驱动器。 当晶片卸载并且晶片载物台从投影物镜下方的曝光区域移出时，平板与晶片台连接并与晶片台同步移动，以将浸没流场从晶片台上方传递到平板上方 。 当晶片被加载并且晶片台移动到曝光区域中时，平板与晶片台连接并与晶片台同步移动，以将浸没流场从平板上方转移到晶片台上方。 本发明的系统消除了当晶片台离开并进入曝光位置时移除和建立流场的过程，从而节省了大量时间并提高了光刻机的生产量。

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