公开(公告)号：US20150277233A1

公开(公告)日：2015-10-01

申请号：US14435450

申请日：2013-09-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Bernard Plechelmus Van Schoot ,  Sven Antoin Johan Hol ,  Edwin Johan Buis ,  Erik Maria Rekkers ,  Gosse Charles De Vries ,  Hako Botma ,  Marinus Johannes Maria Van Dam ,  Ramon Pascal Van Gorkom

IPC: G03F7/20 ,  H01F7/20 ,  G01C9/06 ,  H01F7/02

CPC classification number: G03F7/70091 ,  G01C9/06 ,  G01C2009/066 ,  G02B7/1821 ,  G03F7/70116 ,  H01F7/0231 ,  H01F7/206 ,  H01H2051/2218 ,  H02K41/00

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Abstract translation: 移位的致动器，例如镜子，通过改变两个电磁体中的电流，提供具有至少两个自由度的运动。 移动部件包括具有被限制在基本上位于垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面的永磁体。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面，每个极面基本上填充由移动磁体的表面穿过的区域的象限。 光学位置传感器可以通过电磁体之间的中心空间来引导移动磁体上的辐射束。 瞳孔镜装置中的小平面的尺寸可以在外围区域中较小，但在中心区域较大，从而放松聚焦要求。

公开(公告)号：US20150253679A1

公开(公告)日：2015-09-10

申请号：US14428023

申请日：2013-09-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Christiaan Louis Valentin ,  Antonius Johannes Josephus Van Dijsseldonk

IPC: G03F7/20

CPC classification number: G03F7/70425 ,  G03F7/7045 ,  G03F7/70466 ,  G03F7/70475

Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between centre points of the first and second patterned areas corresponds with a dimension of a conventional exposure.

Abstract translation: 公开了一种使用EUV光刻设备将基板上的图案化区域曝光的方法，该光刻设备具有约5×的平均值和约0.4的数值孔径。 该方法包括使用第一曝光将基板上的图案化区域的第一部分曝光，第一部分尺寸明显小于常规曝光的尺寸，并且使用一个或多个曝光将基板上的图案化区域的一个或多个附加部分曝光 或更多额外的曝光，附加部分的尺寸明显小于常规曝光的尺寸。 该方法还包括重复上述步骤以暴露衬底上的第二图案化区域，第二图案化区域设置有与第一图案化区域相同的图案，其中第一和第二图案化区域的中心点之间的距离对应于尺寸 的常规曝光。