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公开(公告)号：US10001709B2
公开(公告)日：2018-06-19
申请号：US15432698
申请日：2017-02-14
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Antonius Johannes Josephus Van Dijsseldonk , Wilhelmus Petrus De Boeij
CPC classification number: G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
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公开(公告)号：US09989863B2
公开(公告)日：2018-06-05
申请号：US15119100
申请日：2015-01-23
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70433 , G03F7/70033 , G03F7/70066 , G03F7/70091 , G03F7/70241 , G03F7/7025 , G03F7/70425 , G03F7/70483 , H05G2/005 , H05G2/008
Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.
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公开(公告)号：US20170160646A1
公开(公告)日：2017-06-08
申请号：US15432698
申请日：2017-02-14
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich BANINE , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Antonius Johannes Josephus Van Dijsseldonk , Wilhelmus Petrus De Boeij
CPC classification number: G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
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4.发明授权Source-collector device, lithographic apparatus, and device manufacturing method 有权源极集电极器件，光刻设备和器件制造方法公开(公告)号：US09411238B2
公开(公告)日：2016-08-09
申请号：US14372950
申请日：2013-01-10
Applicant: ASML Netherlands B.V.
Inventor： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Michel Riepen , Hendrikus Gijsbertus Schimmel , Viacheslav Medvedev
CPC classification number: G03F7/70033 , G03F7/70166 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G21K1/067 , G21K2201/064 , H05G2/008
Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
Abstract translation: 源极 - 集电极器件包括具有等离子体形成材料的靶表面的靶单元和用于产生被引导到靶表面上的辐射束以形成来自所述等离子体形成材料的等离子体的激光单元。 提供污染物阱以减少由等离子体产生的颗粒污染物的传播。 辐射收集器包括一个或多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束，并且滤光器被配置为衰减光束的至少一个波长范围。
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公开(公告)号：US20150296602A1
公开(公告)日：2015-10-15
申请号：US14440934
申请日：2013-10-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Andrey Nikipelov , Edgar Alberto Osorio Oliveros , Alexander Matthijs Struycken , Bert Pieter Van Drieënhuizen , Jan Bernard Plechelmus Van Schoot
IPC: H05G2/00
CPC classification number: H05G2/006 , G03F7/70033 , G03F7/7085 , G21K1/062 , G21K2201/067 , H01S3/073 , H01S3/08059 , H01S3/0815 , H01S3/1307 , H01S3/2232 , H01S3/2383 , H05G2/008
Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.
Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置（12）处提供连续更新的燃料靶（50）并且引导等离子体形成位置处的连续波激发束（6），使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。
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Patent Agency Ranking
6.发明授权公开(公告)号：US09785051B2
公开(公告)日：2017-10-10
申请号：US14435450
申请日：2013-09-17
Applicant: ASML Netherlands B.V.
Inventor： Jan Bernard Plechelmus Van Schoot , Sven Antoin Johan Hol , Edwin Johan Buis , Erik Maria Rekkers , Gosse Charles De Vries , Hako Botma , Marinus Johannes Maria Van Dam , Ramon Pascal Van Gorkom
CPC classification number: G03F7/70091 , G01C9/06 , G01C2009/066 , G02B7/1821 , G03F7/70116 , H01F7/0231 , H01F7/206 , H01H2051/2218 , H02K41/00
Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.
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公开(公告)号：US09363879B2
公开(公告)日：2016-06-07
申请号：US14532897
申请日：2014-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van de Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC classification number: H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
Abstract translation: 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。
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公开(公告)号：US10248027B2
公开(公告)日：2019-04-02
申请号：US15525610
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Raoul Maarten Simon Knops , Bob Streefkerk , Christiaan Louis Valentin , Jan Bernard Plechelmus Van Schoot , Wilhelmus Franciscus Johannes Simons , Leon Leonardus Franciscus Merkx , Robertus Johannes Marinus De Jongh , Roel Johannes Elisabeth Merry , Michael Frederik Ypma
IPC: G03F7/20
Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.
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公开(公告)号：US09958787B2
公开(公告)日：2018-05-01
申请号：US14428023
申请日：2013-09-17
Applicant: ASML Netherlands B.V.
Inventor： Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Christiaan Louis Valentin , Antonius Johannes Josephus Van Dijsseldonk
CPC classification number: G03F7/70425 , G03F7/7045 , G03F7/70466 , G03F7/70475
Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.
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公开(公告)号：US09285685B2
公开(公告)日：2016-03-15
申请号：US14261208
申请日：2014-04-24
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GmbH
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Gräupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
CPC classification number: G03F7/70341 , G03F7/70333
Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Abstract translation: 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
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