HIGH SPEED EPI SYSTEM AND CHAMBER CONCEPTS
    21.
    发明申请
    HIGH SPEED EPI SYSTEM AND CHAMBER CONCEPTS 审中-公开
    高速EPI系统和机箱概念

    公开(公告)号:US20160348240A1

    公开(公告)日:2016-12-01

    申请号:US15111541

    申请日:2015-01-06

    Abstract: Embodiments described herein generally relate to a batch processing chamber. The batch processing chamber includes a lid, a chamber wall and a bottom that define a processing region. A cassette including a stack of susceptors for supporting substrates is disposed in the processing region. The edge of the cassette is coupled to a plurality of shafts and the shafts are coupled to a rotor. During operation, the rotor rotates the cassette to improve deposition uniformity. A heating element is disposed on the chamber wall and a plurality of gas inlets is disposed through the heating element on the chamber wall. Each gas inlet is substantially perpendicular to the chamber wall.

    Abstract translation: 本文描述的实施例通常涉及批处理室。 批处理室包括盖,室壁和限定处理区域的底部。 包括用于支撑衬底的一堆基座的盒子被设置在处理区域中。 盒的边缘联接到多个轴,并且轴联接到转子。 在操作期间,转子旋转盒子以改善沉积均匀性。 加热元件设置在室壁上,并且多个气体入口通过加热元件设置在室壁上。 每个气体入口基本上垂直于室壁。

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