公开(公告)号：US20210260826A1

公开(公告)日：2021-08-26

申请号：US17256628

申请日：2019-05-09

Applicant: APPLIED MATERIALS, INC.

Inventor： Wei-Sheng LEI ,  Mahendran CHIDAMBARAM ,  Visweswaren SIVARAMAKRISHNAN ,  Kashif MAQSOOD

IPC: B29C64/268 ,  B29C64/153 ,  B29C64/393 ,  B22F10/28 ,  B22F12/41 ,  B22F10/366 ,  B22F12/49 ,  B28B1/00 ,  B28B17/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B23K26/082 ,  B23K26/06 ,  B23K26/342 ,  B23K26/70

Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one light source configured to generate a first light beam and a second light beam, a polygon minor scanner, an actuator, and a galvo minor scanner. The polygon minor scanner is configured to receive the first light beam and reflect the first light beam towards the platform. Rotation of the first polygon mirror causes the light beam to move in a first direction along a path on a layer of feed material on the platform. The actuator is configured to cause the path to move along a second direction at a non-zero angle relative to the first direction. The galvo mirror scanner system is configured to receive the second light beam and reflect the second light beam toward the platform.

公开(公告)号：US20170221751A1

公开(公告)日：2017-08-03

申请号：US15501148

申请日：2015-08-21

Applicant: Applied Materials, Inc.

Inventor： Brian H. BURROWS ,  Lance A. SCUDDER ,  David K. CARLSON ,  Kashif MAQSOOD

IPC: H01L21/687

CPC classification number: H01L21/68785 ,  C23C14/50 ,  C23C16/4585 ,  C30B25/12 ,  H01L21/68721 ,  H01L21/68771

Abstract: A substrate carrier for an epitaxy chamber is described that has an elongated base member supporting two substrate supports in an angled relationship and a center substrate support between the two substrate supports. The center substrate support has one or more openings at which a substrate is positioned for processing, enabling both sides of the substrate to be processed concurrently.

公开(公告)号：US20160348240A1

公开(公告)日：2016-12-01

申请号：US15111541

申请日：2015-01-06

Applicant: APPLIED MATERIALS, INC

Inventor： Brian H. BURROWS ,  Lance A. SCUDDER ,  Kashif MAQSOOD ,  Roger N. ANDERSON ,  Sumedh Dattatraya ACHARYA

IPC: C23C16/458 ,  C23C16/48 ,  C23C16/24 ,  H01L21/677 ,  H01L21/67

CPC classification number: C23C16/4584 ,  C23C16/24 ,  C23C16/45502 ,  C23C16/45578 ,  C23C16/46 ,  C23C16/482 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/67757

Abstract: Embodiments described herein generally relate to a batch processing chamber. The batch processing chamber includes a lid, a chamber wall and a bottom that define a processing region. A cassette including a stack of susceptors for supporting substrates is disposed in the processing region. The edge of the cassette is coupled to a plurality of shafts and the shafts are coupled to a rotor. During operation, the rotor rotates the cassette to improve deposition uniformity. A heating element is disposed on the chamber wall and a plurality of gas inlets is disposed through the heating element on the chamber wall. Each gas inlet is substantially perpendicular to the chamber wall.

Abstract translation: 本文描述的实施例通常涉及批处理室。 批处理室包括盖，室壁和限定处理区域的底部。 包括用于支撑衬底的一堆基座的盒子被设置在处理区域中。 盒的边缘联接到多个轴，并且轴联接到转子。 在操作期间，转子旋转盒子以改善沉积均匀性。 加热元件设置在室壁上，并且多个气体入口通过加热元件设置在室壁上。 每个气体入口基本上垂直于室壁。