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公开(公告)号：US20190227393A1
公开(公告)日：2019-07-25
申请号：US15777829
申请日：2017-10-09
Inventor： Bingqiang GUI , Lianjie Qu , Yonglian QI , Hebin ZHAO , Yun QIU
IPC: G02F1/1343 , H01L27/12 , G02F1/1362 , G02F1/1368 , G03F7/16 , G03F7/20 , G03F7/26
Abstract: An array substrate and a manufacturing method thereof, and display panel are disclosed. The array substrate includes a substrate, a thin film transistor disposed on the substrate and a common electrode disposed on a side of the thin film transistor away from the substrate. The common electrode includes a first hollowed-out portion. An active layer of the thin film transistor includes a source electrode region, a drain electrode region and a channel region. An orthographic projection of the first hollowed-out portion on the substrate at least covers an orthographic projection of the channel region on the substrate.
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22.发明申请公开(公告)号：US20190196063A1
公开(公告)日：2019-06-27
申请号：US16329957
申请日：2018-05-23
Inventor： Bingqiang GUI , Lianjie QU , Yonglian QI , Meili WANG , Hebin ZHAO , Yun QIU
IPC: G02B1/11 , G02B1/14 , G02F1/1335
CPC classification number: G02B1/11 , G02B1/14 , G02F1/133502
Abstract: An anti-reflection structure, a display device and a fabrication method for the anti-reflection structure are provided. The anti-reflection structure comprises a substrate, a first microstructure and a second microstructure. The first microstructure comprises a plurality of first microstructure units periodically arranged on the substrate, a second microstructure is filled between the first microstructures so as to cover the substrate, and the anti-reflection structure has a flat surface. The refractive indices of the first microstructure and the second microstructure are different and are configured such that overall, the reflectivity of the anti-reflection structure to light of a predetermined wavelength is lower than the reflectivity of the substrate to light of the predetermined wavelength.
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公开(公告)号：US20190041746A1
公开(公告)日：2019-02-07
申请号：US15941920
申请日：2018-03-30
Inventor： Yonglian QI , Lianjie QU , Bingqiang GUI , Hebin ZHAO , Yun QIU
Abstract: The present disclosure proposes a manufacturing method for a metal grating, a metal grating, and a display device. The manufacturing method comprises: forming a metal layer, an antireflective layer and a deep UV photoresist layer sequentially on a base substrate; etching the deep UV photoresist layer by a photolithography process, so as to form a grating mask pattern; etching the antireflective layer by a dry etching process with the help of the grating mask pattern, so as to form an etch mask pattern identical to the grating mask pattern; peeling off the grating mask pattern; etching the metal layer by a dry etching process with the help of the etch mask pattern, so as to form metal grating strips; and removing the etch mask pattern, thus forming a metal grating.
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公开(公告)号：US20190013362A1
公开(公告)日：2019-01-10
申请号：US15745008
申请日：2017-06-30
Inventor： Yonglian QI , Lianjie QU , Bingqiang GUI , Hebin ZHAO
Abstract: A display substrate, a manufacture method thereof and a display panel are provided. The display substrate includes: a first substrate; a plurality of pixel units included in the first substrate, each of the pixel units at least including a first sub-pixel unit, a second sub-pixel unit and a third sub-pixel unit; a medium film laminated layer arranged on the first substrate, the medium film laminated layer at least covering the first sub-pixel unit and the second sub-pixel unit; the medium film laminated layer is configured to eliminate blue light in a first wavelength range passing the medium film laminated layer, the medium film laminated layer includes at least one first medium film layer and at least one second medium film layer which are laminated alternately, and a refractive index of the first medium film layer is greater than a refractive index of the second medium film layer.
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25.发明申请公开(公告)号：US20190006428A1
公开(公告)日：2019-01-03
申请号：US15735974
申请日：2017-06-30
Inventor： Yonglian QI , Lianjie QU , Bingqiang GUI , Hebin ZHAO
CPC classification number: H01L27/322 , H01L51/5253 , H01L51/5284 , H01L51/56
Abstract: An OLED display panel, a fabricating method, and a display apparatus are disclosed. The OLED display panel includes a base substrate; an anode layer, a cathode layer and an organic light emitting layer between the anode layer and the cathode layer arranged on the base substrate, the organic light emitting layer being configured to emit light having third color; and first light emitting unit, second light emitting unit and third light emitting unit arranged on a light emitting side of the organic light emitting layer and independent from each other, and configured to emit, under the action of the light having the third color, light having a first color, light having a second color and light having the third color, respectively, the light having the first color, the light having the second color and the light having the third color being configured to generate white light when being mixed.
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Patent Agency Ranking
26.发明申请公开(公告)号：US20160372522A1
公开(公告)日：2016-12-22
申请号：US14425488
申请日：2014-07-09
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Yonglian QI , Shi SHU , Guanbao HUI
CPC classification number: H01L27/322 , G02F1/1362 , G02F2001/136222 , H01L27/3213 , H01L27/3244 , H01L27/3246 , H01L51/0005 , H01L51/5012 , H01L51/5206 , H01L51/5221 , H01L51/5253 , H01L51/56 , H01L2227/323 , H01L2251/558
Abstract: The present disclosure provides a COA substrate, a display device and a method for manufacturing the COA substrate. The COA substrate includes a base substrate, a TFT array arranged on the base substrate, a protective layer covering the TFT array, and a color filter including a color pixel and a white pixel, wherein the white pixel is made of a photoresist material.
Abstract translation: 本公开提供了COA基板，显示装置和制造COA基板的方法。 COA基板包括基底基板，布置在基底基板上的TFT阵列，覆盖TFT阵列的保护层和包括彩色像素和白色像素的滤色器，其中白色像素由光致抗蚀剂材料制成。
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公开(公告)号：US20160036005A1
公开(公告)日：2016-02-04
申请号：US14429372
申请日：2014-05-27
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Yonglian QI , Shi SHU
CPC classification number: H01L51/5262 , H01L27/322 , H01L27/3246 , H01L27/3248 , H01L51/5206 , H01L51/5237 , H01L51/5284
Abstract: The present invention relates to the field of display technology, and particularly to a display panel and a display device comprising the display panel. The display panel comprises a substrate, which is divided into a plurality of sub-pixel areas, each of which comprises a thin film transistor and an organic light-emitting diode device provided above the thin film transistor, wherein, a pixel define layer and a conductive layer are provided above the thin film transistor and below the organic light-emitting diode device, the pixel define layer is used for defining a light-transmissive region and a non-light-transmissive region of the sub-pixel area, an upper surface of the conductive layer and an upper surface of the pixel define layer are in the same plane, and the conductive layer is electrically connected to a drain of the thin film transistor.
Abstract translation: 本发明涉及显示技术领域，特别涉及一种显示面板和包括该显示面板的显示装置。 显示面板包括被分成多个子像素区域的衬底，每个子像素区域包括薄膜晶体管和设置在薄膜晶体管上方的有机发光二极管器件，其中，像素限定层和 导电层设置在薄膜晶体管的上方并且在有机发光二极管器件的下方，像素限定层用于限定子像素区域的透光区域和非透光区域，上表面 的导电层和像素限定层的上表面在同一平面中，并且导电层电连接到薄膜晶体管的漏极。
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28.发明申请METHOD FOR FABRICATING COA ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE 有权用于制造COA阵列基板，阵列基板和显示装置的方法公开(公告)号：US20150340415A1
公开(公告)日：2015-11-26
申请号：US14351639
申请日：2013-06-19
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Yonglian QI , Shi SHU , Guanbao HUI
IPC: H01L27/32 , H01L23/535 , H01L27/12 , H01L21/768 , G02F1/1368 , H01L51/56
CPC classification number: H01L27/3248 , G02F1/1362 , G02F1/1368 , G02F2001/136222 , H01L21/76802 , H01L21/76877 , H01L23/535 , H01L27/1259 , H01L27/322 , H01L51/56 , H01L2227/323 , H01L2924/0002 , H01L2924/00
Abstract: A method for fabricating a COA array substrate, an array substrate and a display device are provided. The fabrication method comprises the following steps: forming a protection layer (12) on the TFT substrate (11); coating a photoresist layer (21) on the protection layer (12), the photoresist layer (12) functioning as a planarized layer (14), wherein the TFT substrate (11) comprises a substrate (111) and a TFT (112); forming a color filter receiving hole (32) in the photoresist layer (21) through a photolithography process; fabricating the color filter layer (31) in the color filter receiving hole (32). The above fabrication method can reduce the complexity and cost of conventional method for fabricating the array substrate.
Abstract translation: 提供了制造COA阵列基板，阵列基板和显示装置的方法。 该制造方法包括以下步骤：在TFT基板（11）上形成保护层（12）; 在所述保护层（12）上涂覆光致抗蚀剂层（21），所述光致抗蚀剂层（12）用作平坦化层（14），其中所述TFT基板（11）包括基板（111）和TFT（112）; 通过光刻工艺在光致抗蚀剂层（21）中形成滤色器接收孔（32）; 在滤色器容纳孔（32）中制造滤色器层（31）。 上述制造方法可以降低用于制造阵列基板的常规方法的复杂性和成本。
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公开(公告)号：US20220037198A1
公开(公告)日：2022-02-03
申请号：US17278855
申请日：2020-07-24
Inventor： Shan ZHANG , Lianjie QU , Yonglian QI , Hebin ZHAO
IPC: H01L21/762 , H01L27/12 , H01L29/66 , H01L29/786 , H01L21/683
Abstract: A method of manufacturing thin film transistor(s) includes: providing a monocrystalline silicon wafer, the monocrystalline silicon wafer including a first surface and a second surface that are opposite to each other; forming a bubble layer between the first surface and the second surface of the monocrystalline silicon wafer, the bubble layer dividing the monocrystalline silicon wafer into two portions arranged side by side in a direction perpendicular to the second surface, and a portion of the monocrystalline silicon wafer that is located between the bubble layer and the second surface being a monocrystalline silicon film having a target thickness; providing a substrate, and transferring the monocrystalline silicon film onto the substrate by breaking the monocrystalline silicon wafer at the bubble layer; and patterning the monocrystalline silicon film transferred to the substrate to form active layer(s) of the thin film transistor(s).
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公开(公告)号：US20210202899A1
公开(公告)日：2021-07-01
申请号：US17058114
申请日：2020-04-20
Inventor： Yonglian QI , Lianjie QU , Shan ZHANG , Hebin ZHAO , Xiaoling XU , Guangdong SHI , Zhiyong LIU
Abstract: An OLED display screen, a display panel and a manufacturing method thereof are disclosed in the present disclosure, the method includes: fabricating a TFT array substrate and an OLED component on a substrate, where the OLED component includes a first electrode, a light-emitting layer, and a second electrode; and fabricating a first organic layer on a side of the second electrode away from the substrate, where the first organic layer is capable of chemically reacting with the second electrode.
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