公开(公告)号：US10110731B2

公开(公告)日：2018-10-23

申请号：US15240818

申请日：2016-08-18

Applicant: Chris Talbot

Inventor： Chris Talbot

IPC: H04N7/14 ,  H04M3/22 ,  H04M3/42 ,  H04L29/06 ,  H04L12/937 ,  H04N5/93 ,  G06T1/00 ,  H04N7/15 ,  H04N5/232 ,  H04N5/369

Abstract: Embodiments of the present invention are directed to a method and system for recording video relay service (VRS) calls. The method comprises providing a VRS call recorder, a VRS rules gateway, and a VRS video client connected to each other by means of a computer network; initiating a VRS call using the VRS video client; sending the VRS call to the VRS rules gateway; determining, by the VRS rules gateway, whether the VRS call is to be recorded; in response to a determination that the VRS call is to be recorded: modifying a property of the VRS call to indicate that the call is to be recorded; detecting, by the VRS call recorder, the modified VRS call property; and in response to detecting the modified VRS call property, trying the VRS call with recording enabled.

公开(公告)号：US10057256B1

公开(公告)日：2018-08-21

申请号：US15667583

申请日：2017-08-02

Applicant: Chris Talbot

Inventor： Chris Talbot

IPC: H04L29/06 ,  G09B21/06 ,  H04W12/06 ,  H04W12/12 ,  G09B21/00

CPC classification number: H04L63/0853 ,  G06F21/32 ,  G09B21/009 ,  H04L63/08 ,  H04W12/06 ,  H04W12/12

Abstract: A method and system are disclosed for enabling a real-time visual verification that a video relay service (VRS) call originates from a specific pre-authorized and pre-determined inmate at a corrections facility. The method comprises providing a VRS call recorder, a VRS rules gateway, and a VRS video client being used by the inmate to connect to another VRS client being used by a sign language interpreter (SLI). The display seen by the SLI has a picture-in-picture image showing the inmate (from a database of images of inmates stored in the rules gateway) who should be using the VRS client as well as a real-time video image of the inmate actually using the VRS client. If the picture-in-picture image does not match the live video image, then the audio call to the designated phone number may not be placed by the SLI.

公开(公告)号：US07476875B2

公开(公告)日：2009-01-13

申请号：US11779224

申请日：2007-07-17

Applicant: Alexander Kadyshevitch ,  Chris Talbot ,  Dmitry Shur ,  Andreas G. Hegedus

Inventor： Alexander Kadyshevitch ,  Chris Talbot ,  Dmitry Shur ,  Andreas G. Hegedus

IPC: H01J49/00 ,  A61N5/00

CPC classification number: H01J37/32935 ,  G01N23/00 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/34 ,  H01L2924/3011

Abstract: A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openings including a plurality of test openings having different, respective transverse dimensions. A beam of charged particles is directed to irradiate the test openings. In response to the beam, at least one of a specimen current flowing through the first layer and a total yield of electrons emitted from a surface of the sample is measured, thus producing an etch indicator signal. The etch indicator signal is analyzed as a function of the transverse dimensions of the test openings so as to assess a characteristic of the etch process.

Abstract translation: 一种用于过程监测的方法包括接收具有至少部分导电的第一层的样品和在第一层上形成的第二层，在通过蚀刻工艺生产第二层中的接触开口之后，接触开口包括多个 测试孔具有不同的相应的横向尺寸。 带电粒子的束被引导以照射测试孔。 响应于光束，测量流过第一层的样本电流和从样品表面发射的电子的总产率中的至少一个，从而产生蚀刻指示符信号。 作为测试开口的横向尺寸的函数分析蚀刻指示符信号，以便评估蚀刻工艺的特性。

公开(公告)号：US20060192904A1

公开(公告)日：2006-08-31

申请号：US10530157

申请日：2003-10-03

Applicant: Gilad Almogy ,  Chris Talbot ,  Lior Levin

Inventor： Gilad Almogy ,  Chris Talbot ,  Lior Levin

IPC: G02F1/1335 ,  G06K9/00

CPC classification number: G01R31/2812 ,  G01N21/956

Abstract: A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect.

Abstract translation: 用于缺陷定位的方法和系统包括：（i）接收包括至少部分被电光活性材料覆盖的导体的测试结构; （ii）向导体提供电信号，例如对导体的至少一部分充电; 和（iii）对测试结构进行成像以定位缺陷。

公开(公告)号：US06914443B2

公开(公告)日：2005-07-05

申请号：US10426205

申请日：2003-04-29

Applicant: Alon Litman ,  Chris Talbot

Inventor： Alon Litman ,  Chris Talbot

IPC: G01R31/311 ,  G01R31/305

CPC classification number: G01R31/307

Abstract: A system and method is provided for testing the resistance of a test wafer having multiple conductors. Embodiments include a method having the steps of providing a signal that is substantially larger than a signal threshold to a test structure; and scanning at least two conductors of the test structure, that are electrically couplet to each other, by a limited voltage resolution SEM. Charged particles emitted from the at least two conductors as a result of the scanning are collected, thus providing an indication about a resistance of the at least two conductors.

Abstract translation: 提供了一种用于测试具有多个导体的测试晶片的电阻的系统和方法。 实施例包括具有以下步骤的方法：向测试结构提供基本上大于信号阈值的信号; 并且通过有限的电压分辨率SEM扫描测试结构的至少两个导体彼此电耦合。 收集由扫描结果从至少两个导体发射的带电粒子，从而提供关于至少两个导体的电阻的指示。