公开(公告)号：US20140212797A1

公开(公告)日：2014-07-31

申请号：US14228486

申请日：2014-03-28

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi KAWABATA ,  Hideaki TSUBAKI

IPC: C08F28/06 ,  C08F28/02 ,  G03F7/038

CPC classification number: C08F28/06 ,  C08F8/10 ,  C08F28/02 ,  C08F212/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) as defined in the specification, wherein a polydispersity of the resin (P) is 1.20 or less.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括：（P）含有（A）能够在光化学射线或辐射照射下分解以在树脂的侧链中产生酸的重复单元的树脂（P） ）和（C）由说明书中定义的下式（I）表示的重复单元，其中树脂（P）的多分散性为1.20以下。