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21.发明授权公开(公告)号：US10274651B1
公开(公告)日：2019-04-30
申请号：US15875848
申请日：2018-01-19
发明人： Nihar Ranjan Mohanty , Giuseppe Calafiore , Matthew E. Colburn , Austin Lane , Matthieu Charles Raoul Leibovici
摘要： A three-dimensional diffraction grating is generated by selective deposition and/or selective etching. The three-dimensional diffraction grating includes a substrate and a plurality of structures located at different positions on the substrate. The structures have different materials. Edges of at least some of the structures are aligned. The three-dimensional diffraction grating includes different materials and aligned edges in all three dimensions. With the different materials and aligned edges, the three-dimensional diffraction gratings is configured to eliminate display artifacts, such as ghost, rainbow, etc.
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22.发明授权公开(公告)号：US11249393B2
公开(公告)日：2022-02-15
申请号：US16252563
申请日：2019-01-18
摘要： A method is described for modifying the mechanical properties of NIL materials. The method includes applying an imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, with the NIL material layer comprised of a NIL material. The method further includes detaching the imprinted NIL material layer from the imprint mask, with the modulus level of the NIL material below a flexibility threshold to cause a shape of the imprinted NIL material layer to remain unchanged after detachment. The modulus level of the NIL material of the imprinted NIL material layer is increased beyond a strength threshold to create a first imprint layer, with the imprint layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a master mold pattern.
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公开(公告)号：US20220026799A1
公开(公告)日：2022-01-27
申请号：US17408070
申请日：2021-08-20
摘要： A method is described for creating a modified mask with low surface energies for a nano-imprint lithography (NIL) imprinting process. The method includes applying a master mold to an imprint mask material to create an imprint mask. The method further includes modifying the imprint mask by applying a treatment to the imprint mask to cause a surface energy level of the imprint mask to fall below a sticking threshold. The modified imprint mask is applied to a nano-imprint lithography (NIL) material to create an imprinted NIL material layer. The surface energy level of the imprint mask causes a shape of the imprinted NIL material layer to be remain unchanged when the imprinted NIL material layer is detached from the modified imprint mask.
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公开(公告)号：US10914944B1
公开(公告)日：2021-02-09
申请号：US16044042
申请日：2018-07-24
摘要： A system comprises a plurality of laser generators, each generating a coherent beam, the plurality of laser generators arranged such that at least two of the generated coherent beams intersect with each other. The system further comprises an anti-refraction prism. The anti-refraction prism has a plurality of incident surfaces. The anti-refraction prism also has an egress surface facing a photosensitive film layer, with the coherent beams interfering within the anti-refraction prism and exiting at the egress surface to create an interference exposure pattern at an exposure region of the photosensitive film layer. Furthermore, the anti-refraction prism has a refraction index within a threshold range of the refraction index of the photosensitive film layer, and wherein the anti-refraction prism reduces a change in angle of each coherent beam in the photosensitive film layer due to refraction.
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公开(公告)号：US10823887B1
公开(公告)日：2020-11-03
申请号：US15878227
申请日：2018-01-23
摘要： An inkjet is used to fabricate an optical device having a varying refractive index. The inkjet deposits a first material having a first refractive index and a second material having a second refractive index in a pattern on a substrate. The first material and/or the second material are processed to form an optical device having a refractive index that varies in one or two dimensions. The optical device is used in a virtual-reality system or augmented-reality system to provide angular selectivity from display to a user's eye.
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公开(公告)号：US10684482B2
公开(公告)日：2020-06-16
申请号：US15943546
申请日：2018-04-02
发明人： Ying Geng , Jacques Gollier , Alexander Sohn , Matthew E. Colburn
IPC分类号： G02B27/01 , H04N13/332 , H01L27/32 , H04N13/344 , H04N13/324
摘要： An electronic display assembly includes a display element and a corrective element coupled to the display element. The display element has a first plurality of sub-pixels of a first type and a second plurality of sub-pixels of a second type. Two adjacent sub-pixels of the first plurality of sub-pixel are separated by a sub-pixel distance. The corrective element has a plurality of features configured to diffuse light emitted by the first plurality of sub-pixels such that an apparent distance between the two adjacent sub-pixels of the first type, viewed at a viewing distance away from the electronic display assembly, is less than the sub-pixel distance.
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公开(公告)号：US10649141B1
公开(公告)日：2020-05-12
申请号：US15960312
申请日：2018-04-23
发明人： Matthew E. Colburn , Giuseppe Calafiore , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty
IPC分类号： G02B6/124 , G02B6/34 , G02B5/18 , G02B27/01 , H01L21/027 , H01J37/305 , G02B27/42 , G02B6/12
摘要： A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of etch heights relative to the substrate. The manufacturing system performs a lithographic patterning of a photoresist deposited over the created profile in the etch-compatible film to obtain the plurality of etch heights and one or more duty cycles corresponding to the etch-compatible film deposited over the substrate.
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公开(公告)号：US10569449B1
公开(公告)日：2020-02-25
申请号：US15703926
申请日：2017-09-13
摘要： A method for transferring a pattern from a template to a nanoimprint object. A perimeter portion of the nanoimprint object is supported by a perimeter support structure. A gas pressure induced force is applied to the nanoimprint object to facilitate bending of a central portion of the nanoimprint object in a direction toward a surface of the template until the central portion of the nanoimprint object is brought into contact with the surface of the template. While the nanoimprint object is held in contact with the surface of the template, the pattern from the template is transferred to a surface of the nanoimprint object thereby creating a patterned surface on the nanoimprint object.
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公开(公告)号：US10509327B1
公开(公告)日：2019-12-17
申请号：US16044046
申请日：2018-07-24
摘要： A system comprises a variable neutral density (ND) filter that has a first surface and a second surface that is opposite the first surface. The second surface is closer to an exposure region of a photosensitive film layer than the first surface. The photosensitive film layer is disposed on a surface of a substrate layer, and the variable ND filter has an attenuation profile that modulates transmittance of light passing through the variable ND filter to the exposure region. The system also includes one or more laser generators, each generating a coherent beam of light. The plurality of laser generators are arranged such that at least two of the generated coherent beams of light intersect with each other and form an intermediate interference exposure pattern that is modulated by the variable ND filter to form a target interference exposure pattern at the exposure region of the photosensitive film layer.
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公开(公告)号：US11262495B1
公开(公告)日：2022-03-01
申请号：US16152411
申请日：2018-10-04
摘要： A manufacturing system for creating waveguides that include optical gratings having high coupling efficiencies is described herein. The waveguides are used to guide image light from a source assembly to an eye of a user. The optical gratings are used to couple light into an optical waveguide element and/or decouple light from the optical waveguide element. The manufacturing system creates optical gratings by patterning and adjusts refractive indexes of the optical gratings by infusion and post-processing. A refractive index of an optical grating can be uniform or non-uniform. In-coupling efficiencies of light into a waveguide via the optical gratings and/or out-coupling efficiencies of light out of a waveguide via the optical gratings can be increased. The manufacturing system includes a patterning system, an infusion system, and a post-processing system.
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