公开(公告)号：US20070224526A1

公开(公告)日：2007-09-27

申请号：US11378536

申请日：2006-03-17

申请人： Timothy Brunner ,  Gregg Gallatin ,  Ronald Gordon ,  Kafai Lai ,  Alan Rosenbluth ,  Nakgeuon Seong

发明人： Timothy Brunner ,  Gregg Gallatin ,  Ronald Gordon ,  Kafai Lai ,  Alan Rosenbluth ,  Nakgeuon Seong

IPC分类号： G03C5/00

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70575

摘要： A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns for the object, a spectrum of the radiation source to be used in the lithographic projection system, an intensity and polarization distribution of the radiation source, and a lens impulse response in the spatial domain or in the spatial frequency domain of the image. The method then includes forming a polychromatic 4D bilinear vector kernel comprising a partially coherent polychromatic joint response between pairs of points in the spatial domain or in the spatial frequency domain, determining the dominant polychromatic 2D kernels of the polychromatic 4D bilinear vector kernel, and determining the image of the patterned object from convolutions of the object patterns with the dominant polychromatic 2D kernels.

摘要翻译： 一种用于确定由具有有限光谱带宽的激光辐射源的多色光刻投影系统形成的图案化物体的图像的方法和用于将图案化物体成像到抗蚀剂层内的图像平面的透镜。 该方法包括提供对象的图案，在光刻投影系统中使用的辐射源的光谱，辐射源的强度和偏振分布以及在空间域或空间频域中的透镜脉冲响应 图片。 该方法然后包括形成多色4D双线性矢量核，其包括在空间域或空间频域中的点对之间的部分相干多色联合响应，确定多色4D双线性向量核的显性多色2D内核，并确定 图形对象的图像与目标图案与显性多色2D内核的卷积。

公开(公告)号：US20060271905A1

公开(公告)日：2006-11-30

申请号：US11138172

申请日：2005-05-26

申请人： Maharaj Mukherjee ,  Scott Mansfield ,  Alan Rosenbluth ,  Kafai Lai

发明人： Maharaj Mukherjee ,  Scott Mansfield ,  Alan Rosenbluth ,  Kafai Lai

IPC分类号： G06F17/50 ,  G03F1/00

CPC分类号： G06F17/5068 ,  G03F1/36 ,  G03F7/70441 ,  G06F2217/12 ,  Y02P90/265

摘要： A method, program product and system is disclosed for performing optical proximity correction (OPC) wherein mask shapes are fragmented based on the effective image processing influence of neighboring shapes on the shape to be fragmented. Neighboring shapes are smoothed prior to determining their influence on the fragmentation of the shape of interest, where the amount of smoothing of a neighboring shape increases as the influence of the neighboring shape on the image process of the shape of interest decreases. A preferred embodiment includes the use of multiple regions of interactions (ROls) around the shape of interest, and assigning a smoothing parameter to a given ROI that increases as the influence of shapes in that ROI decreases with respect to the shape to be fragmented. The invention provides for accurate OPC that is also efficient.

摘要翻译： 公开了一种用于执行光学邻近校正（OPC）的方法，程序产品和系统，其中基于相邻形状对要分段的形状的有效图像处理影响，掩模形状被分段。 相邻形状在确定其对感兴趣的形状的碎片的影响之前被平滑，其中相邻形状的平滑化量随着相关形状对感兴趣形状的图像处理的影响而增加。 优选实施例包括围绕感兴趣的形状使用多个交互区域（RO1），并且将给定的ROI分配平滑参数，随着该ROI中的形状的影响相对于待分割的形状而减小。 本发明提供了也是有效的精确OPC。

公开(公告)号：US20050257187A1

公开(公告)日：2005-11-17

申请号：US10844794

申请日：2004-05-13

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Dov Remm ,  Alan Rosenbluth ,  Shlomo Shlafman ,  Zheng Chen ,  Maharaj Mukherjee

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Dov Remm ,  Alan Rosenbluth ,  Shlomo Shlafman ,  Zheng Chen ,  Maharaj Mukherjee

IPC分类号： G03F1/14 ,  G06F17/50

CPC分类号： G03F1/36 ,  G03F1/70

摘要： A method is described for performing model-based optical proximity corrections on a mask layout used in an optical lithography process having a plurality of mask shapes. Model-based optical proximity correction is performed by computing the image intensity on selected evaluation points on the mask layout. The image intensity to be computed includes optical flare and stray light effects due to the interactions between the shapes on the mask layout. The computation of the image intensity involves sub-dividing the mask layout into a plurality of regions, each region at an increasing distance from the evaluation point. The contributions of the optical flare and stray light effects due to mask shapes in each of the regions are then determined. Finally, all the contributions thus obtained are combined to obtain the final computation of the image intensity at the selected point.

摘要翻译： 描述了一种用于在具有多个掩模形状的光学光刻工艺中使用的掩模布局上执行基于模型的光学邻近校正的方法。 基于模型的光学邻近校正通过在掩模布局上的所选评估点上计算图像强度来执行。 要计算的图像强度由于掩模布局上的形状之间的相互作用而包括光学耀斑和杂散光效应。 图像强度的计算涉及将掩模布局分成多个区域，每个区域距离评估点增加的距离。 然后确定由于每个区域中的掩模形状引起的光学耀斑和杂散光效应的贡献。 最后，将所得到的所有贡献结合起来，以获得所选点处图像强度的最终计算。

公开(公告)号：US20050001958A1

公开(公告)日：2005-01-06

申请号：US10897456

申请日：2004-07-23

申请人： Kenneth Ho ,  Minhua Lu ,  Alan Rosenbluth ,  Kei-Hsiung Yang

发明人： Kenneth Ho ,  Minhua Lu ,  Alan Rosenbluth ,  Kei-Hsiung Yang

IPC分类号： G09G3/36 ,  G02B27/28 ,  G02F1/13 ,  G02F1/1335 ,  G02F1/1343 ,  G02F1/139 ,  G03B21/28 ,  G09G3/20 ,  H04N9/31

CPC分类号： H04N9/3105 ,  G02B27/283 ,  G02F1/134336 ,  G02F1/1396

摘要： A liquid crystal (LC) lightvalve comprising a twisted nematic LC layer whose molecules are aligned with pixel edges at the mirror backplane, thereby providing improved contrast and efficiency, and reduced visibility of post spacers in black state. The present invention is directed to an LC structure wherein the backplane is rubbed in a direction rectilinear with pixel edges. The LC layer is given the same twist rotation and birefringence as in the conventional TN lightvalve. Polarization control is maintained by illuminating the lightvalve with light whose polarization is rotated by the twist angle relative to the x,y, pixel axes, and by collecting the orthogonally polarized component of the reflected light. The lightvalve top glass is thus rubbed in a direction which is rotated by the twist angle from the horizontal or vertical direction at which the backplane is rubbed.

摘要翻译： 一种液晶（LC）光阀，其包括扭曲向列LC层，其分子与镜面背板上的像素边缘对准，从而提供改善的对比度和效率，并降低后隔片在黑色状态下的可视性。 本发明涉及一种LC结构，其中背板沿着具有像素边缘的直线方向摩擦。 给出LC层与常规TN光阀相同的扭转旋转和双折射。 通过用偏振相对于x，y，像素轴旋转扭转角的光并通过收集反射光的正交偏振分量来照射光阀来维持极化控制。 因此，光阀顶玻璃沿着背板被摩擦的水平或垂直方向旋转扭转角的方向摩擦。