利索-全球专利检索

  1. Login
  2. Sign Up

Search Results

21 records (took 0.015 seconds)

    Active spectral control of optical source
    2.
    发明授权
    Active spectral control of optical source 有权
    光源的有源光谱控制

    公开(公告)号：US08520186B2

    公开(公告)日：2013-08-27

    申请号：US12860288

    申请日：2010-08-20

    Applicant: Nakgeuon Seong ,  Ivan B. Lalovic ,  Nigel R. Farrar ,  Robert J. Rafac ,  Joseph J. Bendik

    Inventor： Nakgeuon Seong ,  Ivan B. Lalovic ,  Nigel R. Farrar ,  Robert J. Rafac ,  Joseph J. Bendik

    IPC: G03B27/68 ,  G03B27/42

    CPC classification number: G03F7/70575 ,  G03F7/70525

    Abstract: A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.

    Abstract translation: 控制光束的光谱特性的方法包括将光束引导到被配置为在晶片上产生图案的光刻曝光装置; 接收表示光束的光谱特性的信息; 接收表示所述光刻曝光装置的光学成像条件的信息; 基于所接收的光谱特性信息和所接收的光学成像条件信息来估计光束的特征值; 确定所估计的光束特性值是否与目标光束特性值匹配; 并且如果确定估计光束特性值与目标光束特性值不匹配，则调整光束的光谱特性。

    Fast method to model photoresist images using focus blur and resist blur
    5.
    发明申请
    Fast method to model photoresist images using focus blur and resist blur 有权
    使用聚焦模糊和抵抗模糊来快速模拟光刻胶图像

    公开(公告)号：US20070224526A1

    公开(公告)日：2007-09-27

    申请号：US11378536

    申请日：2006-03-17

    Applicant: Timothy Brunner ,  Gregg Gallatin ,  Ronald Gordon ,  Kafai Lai ,  Alan Rosenbluth ,  Nakgeuon Seong

    Inventor： Timothy Brunner ,  Gregg Gallatin ,  Ronald Gordon ,  Kafai Lai ,  Alan Rosenbluth ,  Nakgeuon Seong

    IPC: G03C5/00

    CPC classification number: G03F7/70441 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70575

    Abstract: A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns for the object, a spectrum of the radiation source to be used in the lithographic projection system, an intensity and polarization distribution of the radiation source, and a lens impulse response in the spatial domain or in the spatial frequency domain of the image. The method then includes forming a polychromatic 4D bilinear vector kernel comprising a partially coherent polychromatic joint response between pairs of points in the spatial domain or in the spatial frequency domain, determining the dominant polychromatic 2D kernels of the polychromatic 4D bilinear vector kernel, and determining the image of the patterned object from convolutions of the object patterns with the dominant polychromatic 2D kernels.

    Abstract translation: 一种用于确定由具有有限光谱带宽的激光辐射源的多色光刻投影系统形成的图案化物体的图像的方法和用于将图案化物体成像到抗蚀剂层内的图像平面的透镜。 该方法包括提供对象的图案，在光刻投影系统中使用的辐射源的光谱，辐射源的强度和偏振分布以及在空间域或空间频域中的透镜脉冲响应 图片。 该方法然后包括形成多色4D双线性矢量核，其包括在空间域或空间频域中的点对之间的部分相干多色联合响应，确定多色4D双线性向量核的显性多色2D内核，并确定 图形对象的图像与目标图案与显性多色2D内核的卷积。

    Fast method to model photoresist images using focus blur and resist blur
    7.
    发明授权
    Fast method to model photoresist images using focus blur and resist blur 有权
    使用聚焦模糊和抵抗模糊来快速模拟光刻胶图像

    公开(公告)号：US08238644B2

    公开(公告)日：2012-08-07

    申请号：US11378536

    申请日：2006-03-17

    Applicant: Timothy A. Brunner ,  Gregg M. Gallatin ,  Ronald L. Gordon ,  Kafai Lai ,  Alan E. Rosenbluth ,  Nakgeuon Seong

    Inventor： Timothy A. Brunner ,  Gregg M. Gallatin ,  Ronald L. Gordon ,  Kafai Lai ,  Alan E. Rosenbluth ,  Nakgeuon Seong

    IPC: G06K9/00

    CPC classification number: G03F7/70441 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70575

    Abstract: A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns for the object, a spectrum of the radiation source to be used in the lithographic projection system, an intensity and polarization distribution of the radiation source, and a lens impulse response in the spatial domain or in the spatial frequency domain of the image. The method then includes forming a polychromatic 4D bilinear vector kernel comprising a partially coherent polychromatic joint response between pairs of points in the spatial domain or in the spatial frequency domain, determining the dominant polychromatic 2D kernels of the polychromatic 4D bilinear vector kernel, and determining the image of the patterned object from convolutions of the object patterns with the dominant polychromatic 2D kernels.

    Abstract translation: 一种用于确定由具有有限光谱带宽的激光辐射源的多色光刻投影系统形成的图案化物体的图像的方法和用于将图案化物体成像到抗蚀剂层内的图像平面的透镜。 该方法包括提供对象的图案，在光刻投影系统中使用的辐射源的光谱，辐射源的强度和偏振分布以及在空间域或空间频域中的透镜脉冲响应 图片。 该方法然后包括形成多色4D双线性矢量核，其包括在空间域或空间频域中的点对之间的部分相干多色联合响应，确定多色4D双线性向量核的显性多色2D内核，并确定 图形对象的图像与目标图案与显性多色2D内核的卷积。

    Active Spectral Control of Optical Source
    9.
    发明申请
    Active Spectral Control of Optical Source 有权
    光源的主动光谱控制

    公开(公告)号：US20110205512A1

    公开(公告)日：2011-08-25

    申请号：US12860288

    申请日：2010-08-20

    Applicant: Nakgeuon Seong ,  Ivan B. Lalovic ,  Nigel R. Farrar ,  Robert J. Rafac ,  Joseph J. Bendik

    Inventor： Nakgeuon Seong ,  Ivan B. Lalovic ,  Nigel R. Farrar ,  Robert J. Rafac ,  Joseph J. Bendik

    IPC: G03B27/54

    CPC classification number: G03F7/70575 ,  G03F7/70525

    Abstract: A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.

    Abstract translation: 控制光束的光谱特性的方法包括将光束引导到被配置为在晶片上产生图案的光刻曝光装置; 接收表示光束的光谱特性的信息; 接收表示所述光刻曝光装置的光学成像条件的信息; 基于所接收的光谱特性信息和所接收的光学成像条件信息来估计光束的特征值; 确定所估计的光束特性值是否与目标光束特性值匹配; 并且如果确定估计光束特性值与目标光束特性值不匹配，则调整光束的光谱特性。

Patent Agency Ranking