公开(公告)号：US20160131978A1

公开(公告)日：2016-05-12

申请号：US15000966

申请日：2016-01-19

Applicant: JSR CORPORATION

Inventor： Shunsuke Kurita ,  Toru Kimura ,  Yoshio Takimoto ,  Kazunori Takanashi

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/32 ,  C09K13/00 ,  G03F7/0043 ,  G03F7/0757 ,  G03F7/20 ,  H01L21/3065 ,  H01L21/31122

Abstract: A pattern-forming method includes applying an inorganic film-forming composition on an upper face side of a substrate to provide an inorganic film, forming a resist pattern on an upper face side of the inorganic film; and dry-etching once or several times using the resist pattern as a mask such that the substrate has a pattern The inorganic film-forming composition includes a polyacid or a salt thereof, and an organic solvent. The step for forming a resist pattern may include the steps of: applying a resist composition on an upper face side of the inorganic film to provide a resist film; exposing the resist film; and developing the resist film exposed.

Abstract translation: 图案形成方法包括在基板的上表面侧施加无机成膜组合物以提供无机膜，在无机膜的上表面侧形成抗蚀剂图案; 并使用抗蚀剂图案作为掩模来干蚀刻一次或数次，使得基底具有图案。无机成膜组合物包括多酸或其盐和有机溶剂。 形成抗蚀剂图案的步骤可以包括以下步骤：在无机膜的上表面侧涂布抗蚀剂组合物以提供抗蚀剂膜; 曝光抗蚀膜; 并显影曝光的抗蚀剂膜。

公开(公告)号：US08927201B2

公开(公告)日：2015-01-06

申请号：US14038861

申请日：2013-09-27

Applicant: JSR Corporation

Inventor： Kazunori Takanashi ,  Yoshio Takimoto ,  Takashi Mori ,  Kazuo Nakahara ,  Masayuki Motonari

IPC: G03F7/26 ,  G03F7/11

CPC classification number: G03F7/11 ,  G03F7/0002 ,  G03F7/094 ,  G03F7/26

Abstract: A multilayer resist process pattern-forming method includes providing an inorganic film over a substrate. A protective film is provided on the inorganic film. A resist pattern is provided on the protective film. A pattern is provided on the substrate by etching that utilizes the resist pattern as a mask. A multilayer resist process inorganic film-forming composition includes a compound, an organic solvent, and a crosslinking accelerator. The compound includes a metal compound that includes a hydrolyzable group, a hydrolysate of a metal compound that includes a hydrolyzable group, a hydrolysis-condensation product of a metal compound that includes a hydrolyzable group, or a combination thereof. The compound includes at least one metal element belonging to Group 6, Group 12, or Group 13 of the Periodic Table of the Elements.

Abstract translation: 多层抗蚀剂工艺图案形成方法包括在衬底上提供无机膜。 在无机膜上设置保护膜。 在保护膜上设置抗蚀剂图案。 通过利用抗蚀剂图案作为掩模的蚀刻在衬底上提供图案。 多层抗蚀剂工艺无机成膜组合物包括化合物，有机溶剂和交联促进剂。 该化合物包括包含可水解基团的金属化合物，包含可水解基团的金属化合物的水解产物，包含可水解基团的金属化合物的水解缩合产物或其组合。 该化合物包括属于元素周期表第6族，第12族或第13族的至少一种金属元素。