Complex metal chalcogenides
    23.
    发明授权
    Complex metal chalcogenides 失效
    复合金属硫族化物

    公开(公告)号:US4545973A

    公开(公告)日:1985-10-08

    申请号:US502787

    申请日:1983-06-09

    Applicant: James P. King

    Inventor: James P. King

    Abstract: Complex metal chalcogenides which are useful for high temperature lubrication applications have the formula:M.sub.p (M'O.sub.x A.sub.4-x).sub.m.nH.sub.2 Owhere M is a metal selected from the group consisting of: Mg, V, Mn, Fe, Co, Al, Cu, Ga, In, Bi, As, Ni, Zn, Cd, Sb, Sn and Ce;where M' is a metal selected from the group consisting of Mo and W;where A is S or Se;where x ranges from 1 to 3;where p is 1 or 2 depending on the oxidation state of Mwhere m ranges from 1 to 5 depending on the oxidation state of M;and n ranges from 0 to 6.

    Abstract translation: 可用于高温润滑应用的复合金属硫族化物具有下式:Mp(M'OxA4-x)m.nH2O其中M是选自Mg,V,Mn,Fe,Co,Al, Cu,Ga,In,Bi,As,Ni,Zn,Cd,Sb,Sn和Ce; 其中M'是选自Mo和W的金属; 其中A是S或Se; 其中x的范围为1到3; 其中p为1或2,这取决于M的氧化态,其中m取决于M的氧化态,其范围为1至5; n范围为0〜6。

    Poly[tantalum phosphinates]
    24.
    发明授权
    Poly[tantalum phosphinates] 失效
    聚{8钽磷酸盐{9

    公开(公告)号:US4026830A

    公开(公告)日:1977-05-31

    申请号:US605796

    申请日:1975-08-18

    CPC classification number: C07F9/02 C07F9/304 C08G79/14 C08K5/5313

    Abstract: Tantalum phosphinates of the general formula: [Ta(OPRR'O).sub.p (Z).sub.5b.-p ].sub.n wherein 1.ltoreq.p.ltoreq.3; R and R' are aryl groups; Z may be a halo, alkoxy, or aryloxy group or a mixture thereof; and n may be any number. The preparation thereof is based on the reaction of a tantalum pentavalent compound (TaZ.sub.5) with a phosphinic acid (RR'P(O)OH) in a dry inert solvent at reflux temperature. Such compounds are useful in high temperature laminates as fillers. Oxide hydrates of these compounds may be prepared by hydrolysis and are similarly useful in high temperature laminates as fillers.

    Abstract translation: 具有以下通式的钽亚磷酸盐:[Ta(OPRR'O)p(Z)5-p] n其中1≤n≤3; R和R'是芳基; Z可以是卤素,烷氧基或芳氧基或其混合物; n可以是任何数字。 其制备方法是基于钽酸五价化合物(TaZ5)与次膦酸(RR'P(O)OH)在回流温度下在干惰性溶剂中的反应。 这些化合物可用作高温层压材料作为填料。 这些化合物的氧化物水合物可以通过水解制备,并且类似地用作高温层压体作为填料。

Patent Agency Ranking