Synthesis of certain triazole compounds
    21.
    发明授权
    Synthesis of certain triazole compounds 失效
    某些三唑化合物的合成

    公开(公告)号:US06657066B1

    公开(公告)日:2003-12-02

    申请号:US10315631

    申请日:2002-12-10

    IPC分类号: C07D48704

    CPC分类号: C07D487/04

    摘要: Disclosed is a process for forming a 1H-pyrazolo (1,5-b)-[1,2,4]-triazole compound by ring closing a pyrazoloamidine compound comprising reacting the amidine with an oxidizing agent having a reduction potential vs Ag/AgCl that is more positive than −0.16V and less than +1.43V in the presence of a halogen atom. The invention also discloses certain triazole compounds that are successfully made by the conventional process. The process and compounds of the invention provide improved yields and reduce or eliminate unwanted side-reactions.

    摘要翻译: 公开了通过闭合吡唑并脒化合物形成1H-吡唑并(1,5-b) - [1,2,4] - 三唑化合物的方法,包括使脒与还原电位相对于Ag / AgCl的氧化剂反应 在存在卤素原子的情况下比-0.16V更正,小于+ 1.43V。 本发明还公开了通过常规方法成功制备的某些三唑化合物。 本发明的方法和化合物提供了提高的产率并减少或消除了不希望的副反应。

    Process for retouching photographic images containing a dye having a
cleavable ballast
    23.
    发明授权
    Process for retouching photographic images containing a dye having a cleavable ballast 失效
    用于修饰含有具有可切割镇流器的染料的照相图像的方法

    公开(公告)号:US5296337A

    公开(公告)日:1994-03-22

    申请号:US872473

    申请日:1992-04-23

    摘要: There are described a method for retouching photographic images, compositions adapted for such retouching, and photographic elements containing dye-forming couplers that yield dye images that particularly lend themselves to retouching by this method. The method comprises contacting a photographic element containing a dye image with a defined retouching composition to solubilize and remove selected areas or amounts of dye. The composition comprises an aqueous basic solution of a dinucleophile and a water-soluble organic co-solvent. The preferred photographic element for application of this retouching method comprises a dye image formed from a pyrazoloazole magenta dye forming coupler having a cleavable ballast group joined to the remainder of the molecule by one or two electrophilic cleavage groups. The retouching composition cleaves the ballast from the dye and solubilizes the dye, allowing it to be washed from the element.

    摘要翻译: 描述了修饰照相图像的方法,适用于这种修饰的组合物,以及含有染料形成成色剂的照相元件,其产生特别适合于通过该方法进行修饰的染料图像。 该方法包括将含有染料图像的照相元件与限定的润饰组合物接触以溶解并除去所选择的区域或数量的染料。 所述组合物包含双亲核苷酸水溶液和水溶性有机共溶剂。 用于这种修饰方法的优选的照相元件包括由具有可切割压载物的吡唑并噻唑品红色染料形成成色剂形成的染料图像,其通过一个或两个亲电裂解基团连接到分子的其余部分。 修饰组合物从染料中切割镇流物并溶解染料,使其从元件中洗涤。

    Dye derived from a pyrazolotriazole
    25.
    发明授权
    Dye derived from a pyrazolotriazole 失效
    衍生自吡唑并三唑的染料

    公开(公告)号:US5110942A

    公开(公告)日:1992-05-05

    申请号:US576031

    申请日:1990-08-31

    IPC分类号: G03C7/38 G03C11/04

    CPC分类号: G03C7/3835 G03C11/04

    摘要: A method of retouching a dye image comprises selective removal with an aqueous acidic organic solvent solution, as described in the application, of a portion of a dye image from an exposed and processed photographic silver halide element comprising a support bearing a dye image from a dye-forming coupler and a primary amine photographic color developing agent, wherein the dye-forming coupler: (a) contains so ionizable group that is retained as part of a dye formed upon oxidative coupling, (b) has a structure such that the Log P of the coupler is greater than 4 and is derived from a four-equivalent coupler that has a Log P less than 8, and (c) has a coupling reactivity that enables formation of maximum image density of at least 0.6. The method comprises the step of contacting the dye image with an aqueous acidic organic solvent solution, as described in the application, for a time and at a temperature sufficient to selectively dissolve and remove a portion of the dye image from the photographic element. A new photographic element designed for such retouching comprises new pyrazolotriazole couplers as described in the application.

    摘要翻译: 修饰染料图像的方法包括如本申请中所述的由酸性有机溶剂水溶液选择性地除去来自暴露和加工的照相卤化银元素的染料图像的一部分,其包含载体,染料图像来自染料 成色成色剂和伯胺照相彩色显影剂,其中染料形成成色剂:(a)含有作为在氧化偶合时形成的染料的一部分保留的可离子化基团,(b)具有使得Log P 的耦合器大于4并且衍生自具有Log P小于8的四等效成色剂,并且(c)具有能够形成至少0.6的最大图像密度的偶联反应性。 该方法包括如本申请中所述使染料图像与酸性有机溶剂水溶液接触的时间和温度足以从照相元件中选择性地溶解和除去一部分染料图像的步骤。 设计用于这种修饰的新的照相元件包括如本申请中所述的新的吡唑并三唑成色剂。