公开(公告)号：US08593645B2

公开(公告)日：2013-11-26

申请号：US13330964

申请日：2011-12-20

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G01B11/24

CPC分类号： G03F7/7085 ,  G02B13/143 ,  G02B17/0663 ,  G02B26/0825 ,  G02B26/0833 ,  G03F7/70116

摘要： A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface.

摘要翻译： 微光刻投影曝光装置包括光学表面和测量与光学表面上的光学表面相关的参数在光学表面上的多个分离区域的测量装置。 测量装置包括照射单元，其将各个测量光束引向光学表面上的区域。 每个测量光束照亮与测量光束相关联的区域的至少一部分以及与测量光束不相关联的至少一部分相邻区域。 检测器单元在与光学表面相互作用后测量每个测量光束的性质。

公开(公告)号：US08373847B2

公开(公告)日：2013-02-12

申请号：US13281179

申请日：2011-10-25

申请人： Michael Patra ,  Martin Meier

发明人： Michael Patra ,  Martin Meier

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70141

摘要： The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams (4) arranged alongside one another, wherein provision is made of at least one optical element (5, 15, 25) which is movable transversely with respect to the light beams and by which the light beams can be influenced if the light beams pass through the optical element, and which has at least one light-absorbing region (9, 19, 29), wherein the apparatus comprises a drive device for the optical element, a measuring device for detecting the light of the light beam and a control unit, wherein the control unit is designed such that the drive device is controlled in a manner dependent on the position of the light-absorbing region. Furthermore, the present invention also relates to a projection exposure apparatus for microlithography comprising a multi-mirror array, in which the corresponding apparatus can be used, and to a method for operating the corresponding apparatus or the projection exposure apparatus.

摘要翻译： 一种用于影响包括沿着彼此并排布置的多个光束的光束布置的装置，其中设置有至少一个可相对于光束横向移动的光学元件，如果光线 光束通过光学元件，并且具有至少一个光吸收区域。 该装置包括用于光学元件的驱动装置，用于检测光束的光的测量装置和控制单元，其中控制单元被设计成使得驱动装置以取决于光的位置的方式被控制 吸收区域。

公开(公告)号：US20120105865A1

公开(公告)日：2012-05-03

申请号：US13330964

申请日：2011-12-20

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G01B11/24 ,  G01B11/00

CPC分类号： G03F7/7085 ,  G02B13/143 ,  G02B17/0663 ,  G02B26/0825 ,  G02B26/0833 ,  G03F7/70116

摘要： A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface.

摘要翻译： 微光刻投影曝光装置包括光学表面和测量与光学表面上的光学表面相关的参数在光学表面上的多个分离区域的测量装置。 测量装置包括照射单元，其将各个测量光束引向光学表面上的区域。 每个测量光束照亮与测量光束相关联的区域的至少一部分以及与测量光束不相关联的至少一部分相邻区域。 检测器单元在与光学表面相互作用后测量每个测量光束的性质。

公开(公告)号：US20110194090A1

公开(公告)日：2011-08-11

申请号：US13022265

申请日：2011-02-07

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G03B27/70 ,  G02B27/12

CPC分类号： G03F7/70075

摘要： An optical raster element for an illumination system of a microlithographic projection exposure apparatus includes an array of refractive optical elements extending on a planar or curved surface. At least two of the optical elements are arranged side by side along a reference direction with a pitch of less than 2 mm. They have a height perpendicular to the surface of less than 50 μm and a surface profile along the reference direction which includes a central section, two transition sections adjacent the central section and two end sections adjacent the transition sections. The curvatures in the two transition sections are greater than the curvatures in the central section and the end sections. The optical raster element is intended for being used as a first channel plate in an optical integrator (honeycomb condenser) and can reduce the maximum light intensities occurring in or behind the second channel plate.

摘要翻译： 用于微光刻投影曝光设备的照明系统的光栅元件包括在平面或曲面上延伸的折射光学元件的阵列。 至少两个光学元件沿着基准方向并排布置，间距小于2mm。 它们具有垂直于表面的小于50μm的高度以及沿着参考方向的表面轮廓，其包括中心部分，邻近中心部分的两个过渡部分和与过渡部分相邻的两个端部部分。 两个过渡部分中的曲率大于中央部分和端部部分的曲率。 光栅元件旨在用作光学积分器（蜂窝式聚光器）中的第一通道板，并且可以减少在第二通道板中或之后发生的最大光强度。