公开(公告)号：US08593645B2

公开(公告)日：2013-11-26

申请号：US13330964

申请日：2011-12-20

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G01B11/24

CPC分类号： G03F7/7085 ,  G02B13/143 ,  G02B17/0663 ,  G02B26/0825 ,  G02B26/0833 ,  G03F7/70116

摘要： A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface.

摘要翻译： 微光刻投影曝光装置包括光学表面和测量与光学表面上的光学表面相关的参数在光学表面上的多个分离区域的测量装置。 测量装置包括照射单元，其将各个测量光束引向光学表面上的区域。 每个测量光束照亮与测量光束相关联的区域的至少一部分以及与测量光束不相关联的至少一部分相邻区域。 检测器单元在与光学表面相互作用后测量每个测量光束的性质。

公开(公告)号：US08467031B2

公开(公告)日：2013-06-18

申请号：US12795014

申请日：2010-06-07

申请人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

发明人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

IPC分类号： G03B27/68 ,  G03B27/32

CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

摘要： An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

摘要翻译： 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。

公开(公告)号：US20120105865A1

公开(公告)日：2012-05-03

申请号：US13330964

申请日：2011-12-20

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G01B11/24 ,  G01B11/00

CPC分类号： G03F7/7085 ,  G02B13/143 ,  G02B17/0663 ,  G02B26/0825 ,  G02B26/0833 ,  G03F7/70116

摘要： A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface.

摘要翻译： 微光刻投影曝光装置包括光学表面和测量与光学表面上的光学表面相关的参数在光学表面上的多个分离区域的测量装置。 测量装置包括照射单元，其将各个测量光束引向光学表面上的区域。 每个测量光束照亮与测量光束相关联的区域的至少一部分以及与测量光束不相关联的至少一部分相邻区域。 检测器单元在与光学表面相互作用后测量每个测量光束的性质。

公开(公告)号：US20110194090A1

公开(公告)日：2011-08-11

申请号：US13022265

申请日：2011-02-07

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G03B27/70 ,  G02B27/12

CPC分类号： G03F7/70075

摘要： An optical raster element for an illumination system of a microlithographic projection exposure apparatus includes an array of refractive optical elements extending on a planar or curved surface. At least two of the optical elements are arranged side by side along a reference direction with a pitch of less than 2 mm. They have a height perpendicular to the surface of less than 50 μm and a surface profile along the reference direction which includes a central section, two transition sections adjacent the central section and two end sections adjacent the transition sections. The curvatures in the two transition sections are greater than the curvatures in the central section and the end sections. The optical raster element is intended for being used as a first channel plate in an optical integrator (honeycomb condenser) and can reduce the maximum light intensities occurring in or behind the second channel plate.

摘要翻译： 用于微光刻投影曝光设备的照明系统的光栅元件包括在平面或曲面上延伸的折射光学元件的阵列。 至少两个光学元件沿着基准方向并排布置，间距小于2mm。 它们具有垂直于表面的小于50μm的高度以及沿着参考方向的表面轮廓，其包括中心部分，邻近中心部分的两个过渡部分和与过渡部分相邻的两个端部部分。 两个过渡部分中的曲率大于中央部分和端部部分的曲率。 光栅元件旨在用作光学积分器（蜂窝式聚光器）中的第一通道板，并且可以减少在第二通道板中或之后发生的最大光强度。